FR2829507B1 - Appareil et procede de depot en phase gazeuse par processus chimique - Google Patents
Appareil et procede de depot en phase gazeuse par processus chimiqueInfo
- Publication number
- FR2829507B1 FR2829507B1 FR0211137A FR0211137A FR2829507B1 FR 2829507 B1 FR2829507 B1 FR 2829507B1 FR 0211137 A FR0211137 A FR 0211137A FR 0211137 A FR0211137 A FR 0211137A FR 2829507 B1 FR2829507 B1 FR 2829507B1
- Authority
- FR
- France
- Prior art keywords
- gas phase
- chemical process
- phase deposition
- deposition
- chemical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001311 chemical methods and process Methods 0.000 title 1
- 230000008021 deposition Effects 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/4557—Heated nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/950,013 US6793966B2 (en) | 2001-09-10 | 2001-09-10 | Chemical vapor deposition apparatus and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2829507A1 FR2829507A1 (fr) | 2003-03-14 |
| FR2829507B1 true FR2829507B1 (fr) | 2006-06-09 |
Family
ID=25489831
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR0211137A Expired - Lifetime FR2829507B1 (fr) | 2001-09-10 | 2002-09-09 | Appareil et procede de depot en phase gazeuse par processus chimique |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US6793966B2 (enExample) |
| JP (1) | JP4327427B2 (enExample) |
| CA (1) | CA2402040C (enExample) |
| DE (1) | DE10241964B4 (enExample) |
| FR (1) | FR2829507B1 (enExample) |
| GB (1) | GB2379450B (enExample) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6986814B2 (en) * | 2001-12-20 | 2006-01-17 | General Electric Company | Gas distributor for vapor coating method and container |
| US7390535B2 (en) | 2003-07-03 | 2008-06-24 | Aeromet Technologies, Inc. | Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings |
| US7153586B2 (en) * | 2003-08-01 | 2006-12-26 | Vapor Technologies, Inc. | Article with scandium compound decorative coating |
| FR2882064B1 (fr) * | 2005-02-17 | 2007-05-11 | Snecma Propulsion Solide Sa | Procede de densification de substrats poreux minces par infiltration chimique en phase vapeur et dispositif de chargement de tels substrats |
| US20070026205A1 (en) | 2005-08-01 | 2007-02-01 | Vapor Technologies Inc. | Article having patterned decorative coating |
| US7597797B2 (en) * | 2006-01-09 | 2009-10-06 | Alliance Process Partners, Llc | System and method for on-line spalling of a coker |
| US20090134035A1 (en) * | 2007-08-02 | 2009-05-28 | United Technologies Corporation | Method for forming platinum aluminide diffusion coatings |
| US20090035485A1 (en) * | 2007-08-02 | 2009-02-05 | United Technologies Corporation | Method for forming active-element aluminide diffusion coatings |
| US20090136664A1 (en) * | 2007-08-02 | 2009-05-28 | United Technologies Corporation | Method for forming aluminide diffusion coatings |
| US20090317547A1 (en) * | 2008-06-18 | 2009-12-24 | Honeywell International Inc. | Chemical vapor deposition systems and methods for coating a substrate |
| DE102008034330A1 (de) * | 2008-07-23 | 2010-01-28 | Ionbond Ag Olten | CVD-Reaktor zur Abscheidung von Schichten aus einem Reaktionsgasgemisch auf Werkstücken |
| US9353625B2 (en) * | 2009-01-13 | 2016-05-31 | General Electric Technology Gmbh | Device for cleaning oxidized or corroded components in the presence of a halogenous gas mixture |
| US10689753B1 (en) * | 2009-04-21 | 2020-06-23 | Goodrich Corporation | System having a cooling element for densifying a substrate |
| PL2432916T3 (pl) | 2009-05-20 | 2019-02-28 | Howmet Corporation | Powłoki Pt-Al-Hf/Zr i sposób nakładania |
| CN102485953B (zh) * | 2010-12-01 | 2014-07-30 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 托盘装置及结晶膜生长设备 |
| US8541069B2 (en) | 2011-04-11 | 2013-09-24 | United Technologies Corporation | Method of guided non-line of sight coating |
| US9068260B2 (en) | 2012-03-14 | 2015-06-30 | Andritz Iggesund Tools Inc. | Knife for wood processing and methods for plating and surface treating a knife for wood processing |
| PL2796593T3 (pl) | 2013-04-26 | 2021-07-26 | Howmet Corporation | Galwanizacja elementu wewnętrznego płata |
| CA2866479C (en) | 2013-12-20 | 2021-08-17 | Will N. Kirkendall | Internal turbine component electroplating |
| US11427904B2 (en) | 2014-10-20 | 2022-08-30 | Raytheon Technologies Corporation | Coating system for internally-cooled component and process therefor |
| MY190445A (en) | 2015-08-21 | 2022-04-21 | Flisom Ag | Homogeneous linear evaporation source |
| TWI624554B (zh) * | 2015-08-21 | 2018-05-21 | 弗里松股份有限公司 | 蒸發源 |
| JP7090035B2 (ja) * | 2016-06-02 | 2022-06-23 | アプライド マテリアルズ インコーポレイテッド | 連続化学気相堆積(cvd)マルチゾーン処理キット |
| DE102018202297A1 (de) * | 2018-02-15 | 2019-08-22 | MTU Aero Engines AG | Vorrichtung und Verfahren zum Gasphasenbeschichten von Werkstücken |
| US20220025519A1 (en) * | 2018-10-26 | 2022-01-27 | Lpe S.P.A. | Deposition reactor with inductors and electromagnetic shields |
| DE102018130139A1 (de) | 2018-11-28 | 2020-05-28 | Aixtron Se | Gaseinlassvorrichtung für einen CVD-Reaktor |
| DE102018221579A1 (de) * | 2018-12-13 | 2020-06-18 | MTU Aero Engines AG | Vorrichtung und Verfahren zum Gasphasenbeschichten von Werkstücken |
| DE102018133362A1 (de) * | 2018-12-21 | 2020-06-25 | Eisenmann Se | Injektionseinrichtung zum Abgeben eines Gases, Prozessgassystem zum Zuführen eines Prozessgases, sowie Vorrichtung und Verfahren zum thermischen oder thermo-chemischen Behandeln von Material |
| US20250263832A1 (en) * | 2024-02-15 | 2025-08-21 | Rtx Corporation | Local part masking for improved uniformity in ceramic matrix composites |
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| US3492097A (en) | 1966-10-14 | 1970-01-27 | Nat Lead Co | Metal halide generator |
| US3764371A (en) | 1970-11-18 | 1973-10-09 | Alloy Surfaces Co Inc | Formation of diffusion coatings on nickel containing dispersed thoria |
| US4108106A (en) | 1975-12-29 | 1978-08-22 | Tylan Corporation | Cross-flow reactor |
| US4132816A (en) | 1976-02-25 | 1979-01-02 | United Technologies Corporation | Gas phase deposition of aluminum using a complex aluminum halide of an alkali metal or an alkaline earth metal as an activator |
| US4052530A (en) * | 1976-08-09 | 1977-10-04 | Materials Technology Corporation | Co-deposited coating of aluminum oxide and titanium oxide and method of making same |
| GB1586959A (en) | 1976-08-11 | 1981-03-25 | Dunlop Ltd | Method and apparatus for the production of carbon/carbon composite material |
| US4264682A (en) * | 1978-10-27 | 1981-04-28 | Hitachi Metals, Ltd. | Surface hafnium-titanium compound coated hard alloy material and method of producing the same |
| US4401689A (en) | 1980-01-31 | 1983-08-30 | Rca Corporation | Radiation heated reactor process for chemical vapor deposition on substrates |
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| FR2508063A1 (fr) | 1981-06-18 | 1982-12-24 | Snecma | Procede, en phase vapeur, pour le depot d'un revetement protecteur sur une piece metallique, dispositif pour sa mise en oeuvre et pieces obtenues selon ledit procede |
| FR2526141B1 (fr) * | 1982-04-30 | 1988-02-26 | Electricite De France | Procede et installation de chauffage d'un lit fluidise par injection de plasma |
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| JPS60110475A (ja) | 1983-11-21 | 1985-06-15 | Konishiroku Photo Ind Co Ltd | 感熱記録ヘッド |
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| JPS61191015A (ja) * | 1985-02-20 | 1986-08-25 | Hitachi Ltd | 半導体の気相成長方法及びその装置 |
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| US4890574A (en) | 1987-01-20 | 1990-01-02 | Gte Laboratories Incorporated | Internal reactor for chemical vapor deposition |
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| US6689422B1 (en) | 1994-02-16 | 2004-02-10 | Howmet Research Corporation | CVD codeposition of A1 and one or more reactive (gettering) elements to form protective aluminide coating |
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| FR2733254B1 (fr) | 1995-04-18 | 1997-07-18 | Europ Propulsion | Procede d'infiltration chimique en phase vapeur pour la densification de substrats poreux disposes en piles annulaires |
| DE19514663A1 (de) * | 1995-04-20 | 1996-10-24 | Kronos Titan Gmbh | Metallchloridgenerator |
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| KR100783841B1 (ko) | 2000-05-31 | 2007-12-10 | 동경 엘렉트론 주식회사 | 열처리 시스템 |
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| JP5186366B2 (ja) | 2005-06-20 | 2013-04-17 | スーチュラ,インコーポレイテッド | 縫合糸に結び目を作る装置 |
-
2001
- 2001-09-10 US US09/950,013 patent/US6793966B2/en not_active Expired - Lifetime
-
2002
- 2002-09-09 CA CA2402040A patent/CA2402040C/en not_active Expired - Lifetime
- 2002-09-09 JP JP2002262406A patent/JP4327427B2/ja not_active Expired - Lifetime
- 2002-09-09 FR FR0211137A patent/FR2829507B1/fr not_active Expired - Lifetime
- 2002-09-09 GB GB0220898A patent/GB2379450B/en not_active Expired - Lifetime
- 2002-09-10 DE DE10241964.7A patent/DE10241964B4/de not_active Expired - Lifetime
-
2004
- 2004-05-24 US US10/852,079 patent/US6911234B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003113473A (ja) | 2003-04-18 |
| CA2402040A1 (en) | 2003-03-10 |
| GB2379450A (en) | 2003-03-12 |
| US6793966B2 (en) | 2004-09-21 |
| CA2402040C (en) | 2011-05-10 |
| US20050000439A1 (en) | 2005-01-06 |
| FR2829507A1 (fr) | 2003-03-14 |
| JP4327427B2 (ja) | 2009-09-09 |
| US6911234B2 (en) | 2005-06-28 |
| DE10241964A1 (de) | 2003-03-27 |
| GB0220898D0 (en) | 2002-10-16 |
| GB2379450B (en) | 2005-06-15 |
| US20030049374A1 (en) | 2003-03-13 |
| DE10241964B4 (de) | 2019-06-27 |
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