FR2765894B1 - Procede et dispositif pour la surveillance analytique d'un bain de traitement galvanotechnique de surfaces de substrats - Google Patents

Procede et dispositif pour la surveillance analytique d'un bain de traitement galvanotechnique de surfaces de substrats

Info

Publication number
FR2765894B1
FR2765894B1 FR9808971A FR9808971A FR2765894B1 FR 2765894 B1 FR2765894 B1 FR 2765894B1 FR 9808971 A FR9808971 A FR 9808971A FR 9808971 A FR9808971 A FR 9808971A FR 2765894 B1 FR2765894 B1 FR 2765894B1
Authority
FR
France
Prior art keywords
substrate surfaces
treatment bath
analytical monitoring
galvanotechnical
galvanotechnical treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9808971A
Other languages
English (en)
Other versions
FR2765894A1 (fr
Inventor
Marjan Bele
Jurgen Otto Besenhard
Stane Pejovnik
Heinrich Meyer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
Original Assignee
Atotech Deutschland GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Publication of FR2765894A1 publication Critical patent/FR2765894A1/fr
Application granted granted Critical
Publication of FR2765894B1 publication Critical patent/FR2765894B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/60Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrostatic variables, e.g. electrographic flaw testing
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N31/00Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
    • G01N31/16Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
    • G01N31/162Determining the equivalent point by means of a discontinuity
    • G01N31/164Determining the equivalent point by means of a discontinuity by electrical or electrochemical means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0085Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/381Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/423Plated through-holes or plated via connections characterised by electroplating method
    • H05K3/424Plated through-holes or plated via connections characterised by electroplating method by direct electroplating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Molecular Biology (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
  • Investigating Or Analysing Biological Materials (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemically Coating (AREA)
FR9808971A 1997-07-10 1998-07-08 Procede et dispositif pour la surveillance analytique d'un bain de traitement galvanotechnique de surfaces de substrats Expired - Fee Related FR2765894B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1997131184 DE19731184C2 (de) 1997-07-10 1997-07-10 Vorrichtung zur analytischen Überwachung eines Bades zur galvanotechnischen Behandlung von Substratoberflächen

Publications (2)

Publication Number Publication Date
FR2765894A1 FR2765894A1 (fr) 1999-01-15
FR2765894B1 true FR2765894B1 (fr) 2000-10-13

Family

ID=7836349

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9808971A Expired - Fee Related FR2765894B1 (fr) 1997-07-10 1998-07-08 Procede et dispositif pour la surveillance analytique d'un bain de traitement galvanotechnique de surfaces de substrats

Country Status (5)

Country Link
JP (1) JPH1171700A (fr)
DE (1) DE19731184C2 (fr)
FR (1) FR2765894B1 (fr)
GB (1) GB2327126B (fr)
TW (1) TW445308B (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003005012A1 (fr) * 2001-07-06 2003-01-16 Metso Field Systems Oy Procede de mesure du potentiel d'ecoulement d'une solution aqueuse, et appareil pour l'application de ce procede
US6913686B2 (en) 2002-12-10 2005-07-05 Advanced Technology Materials, Inc. Methods for analyzing solder plating solutions
WO2003076694A2 (fr) * 2002-03-08 2003-09-18 Advanced Technology Materials, Inc. Procedes et appareils d'analyse de solutions d'electrodeposition de brasure
JP2008537782A (ja) * 2005-04-08 2008-09-25 ザ トラスティーズ オブ コロンビア ユニヴァーシティ イン ザ シティ オブ ニューヨーク めっき浴およびエッチング浴を監視する方法
EP1955061A1 (fr) * 2005-11-28 2008-08-13 BTG Instruments GmbH Dispositif pour analyser un echantillon de liquide
DE102005061638B4 (de) * 2005-12-22 2007-09-20 BTG Mütek GmbH Vorrichtung zur Analyse von Probeflüssigkeiten
DE102014001759B4 (de) * 2014-02-10 2016-01-07 Particle Metrix Gmbh Verfahren und Vorrichtung zur schnellen Analyse der Ladungscharakteristik und der Größenverteilung von Partikeln

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3369984A (en) * 1966-03-04 1968-02-20 Dow Chemical Co Control apparatus
DE2337165C3 (de) * 1973-07-21 1979-11-29 Felix Schoeller Jr. Gmbh & Co Kg, 4500 Osnabrueck Verfahren und Vorrichtung zur Messung des elektrokinetischen Potentials (Z-Potentials)
EP0059726B1 (fr) * 1980-09-12 1987-03-11 The Commonwealth Of Australia Mesure de la purete de l'eau
US4969979A (en) * 1989-05-08 1990-11-13 International Business Machines Corporation Direct electroplating of through holes
GB8919513D0 (en) * 1989-08-29 1989-10-11 Lasertrim Ltd Streaming current detector
US4961147A (en) * 1989-09-28 1990-10-02 Moore Zack J Apparatus for measuring the electric charge condition of non-conductive particles in a liquid medium
DE4008916C1 (fr) * 1990-03-20 1991-05-23 Muetek Gmbh, 8036 Herrsching, De
DE4025558A1 (de) * 1990-08-11 1992-02-13 Basf Magnetics Gmbh Verfahren zur herstellung eines magnetischen aufzeichnungstraegers
DE4141416A1 (de) * 1991-12-11 1993-06-17 Schering Ag Verfahren zur beschichtung von oberflaechen mit feinteiligen feststoff-partikeln
EP0581816A1 (fr) * 1991-04-22 1994-02-09 ATOTECH Deutschland GmbH Procede de revetement selectif de materiaux non conducteurs par des particules de carbone et utilisation de solutions a base de cuivre au cours du procede
GB9110318D0 (en) * 1991-05-13 1991-07-03 Wiggins Teape Group Ltd Streaming potential measurement cell
US5220283A (en) * 1991-06-11 1993-06-15 Milton Roy Company Calibration of streaming current detection
AU1648092A (en) * 1992-03-19 1993-10-21 Cancer Research Campaign Technology Limited Defective recombinant adenoviruses expressing characteristic epstein-barr virus proteins
ATE261117T1 (de) * 1994-05-03 2004-03-15 Muetek Analytic Gmbh Vorrichtung zur polyelektrolytbestimmung
DE4442685C1 (de) * 1994-11-30 1996-03-07 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Bestimmung eines Strömungspotentials
WO1997036173A1 (fr) * 1996-03-22 1997-10-02 Dr. W. Kolb Ag Dispositif pour la determination d'une charge

Also Published As

Publication number Publication date
GB9813732D0 (en) 1998-08-26
FR2765894A1 (fr) 1999-01-15
TW445308B (en) 2001-07-11
GB2327126B (en) 1999-09-08
DE19731184A1 (de) 1999-01-14
GB2327126A (en) 1999-01-13
DE19731184C2 (de) 1999-10-07
JPH1171700A (ja) 1999-03-16

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Legal Events

Date Code Title Description
ST Notification of lapse