FR2591002B1 - Dispositif de commande d'ecoulement pour un courant de particules fines - Google Patents
Dispositif de commande d'ecoulement pour un courant de particules finesInfo
- Publication number
- FR2591002B1 FR2591002B1 FR8615848A FR8615848A FR2591002B1 FR 2591002 B1 FR2591002 B1 FR 2591002B1 FR 8615848 A FR8615848 A FR 8615848A FR 8615848 A FR8615848 A FR 8615848A FR 2591002 B1 FR2591002 B1 FR 2591002B1
- Authority
- FR
- France
- Prior art keywords
- current
- control device
- fine particles
- flow control
- fine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
- H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
- H05H1/18—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields wherein the fields oscillate at very high frequency, e.g. in the microwave range, e.g. using cyclotron resonance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25484185A JPS62115826A (ja) | 1985-11-15 | 1985-11-15 | 微粒子の流れ制御装置 |
JP25483985A JPS62115824A (ja) | 1985-11-15 | 1985-11-15 | 微粒子の流れ制御装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2591002A1 FR2591002A1 (fr) | 1987-06-05 |
FR2591002B1 true FR2591002B1 (fr) | 1995-10-27 |
Family
ID=26541873
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8615848A Expired - Lifetime FR2591002B1 (fr) | 1985-11-15 | 1986-11-14 | Dispositif de commande d'ecoulement pour un courant de particules fines |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE3638942A1 (fr) |
FR (1) | FR2591002B1 (fr) |
GB (1) | GB2185129B (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3926023A1 (de) * | 1988-09-06 | 1990-03-15 | Schott Glaswerke | Cvd-beschichtungsverfahren zur herstellung von schichten und vorrichtung zur durchfuehrung des verfahrens |
US5043548A (en) * | 1989-02-08 | 1991-08-27 | General Electric Company | Axial flow laser plasma spraying |
WO1991019016A1 (fr) * | 1990-05-19 | 1991-12-12 | Institut Teoreticheskoi I Prikladnoi Mekhaniki Sibirskogo Otdelenia Akademii Nauk Sssr | Procede et dispositif de revetement |
FR2664294B1 (fr) * | 1990-07-06 | 1992-10-23 | Plasmametal | Procede de metallisation d'une surface. |
DE19513918C1 (de) * | 1995-04-12 | 1996-11-07 | Fraunhofer Ges Forschung | Verfahren zur Beschichtung von sub-Mikrometerstrukturen und seine Anwendung |
JP6109796B2 (ja) | 2014-09-16 | 2017-04-05 | 三菱日立パワーシステムズ株式会社 | 粉体搬送装置及びチャー回収装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1775964C3 (de) * | 1965-08-23 | 1974-08-08 | Hans Clearwater Fla. Ernst (V.St.A.) | Ventil zur Steuerung eines Stromes eines fließfähigen, magnetisierbare Teilchen enthaltenden Materials. Ausscheidung aus: 1553038 |
US3508564A (en) * | 1967-04-10 | 1970-04-28 | Trw Inc | Electro-fluidic active devices |
US3547074A (en) * | 1967-04-13 | 1970-12-15 | Block Engineering | Apparatus for forming microelements |
US3904505A (en) * | 1970-03-20 | 1975-09-09 | Space Sciences Inc | Apparatus for film deposition |
JPS523583A (en) * | 1975-06-27 | 1977-01-12 | Toshinori Takagi | Crystal film forming process |
CA1109545A (fr) * | 1976-05-08 | 1981-09-22 | Nissan Motor Co., Ltd. | Appareil electrostatique pour la regulation de debit des liquides |
GB1582641A (en) * | 1976-06-01 | 1981-01-14 | Nissan Motor | Fluid flow rate control apparatus |
JPS52147325A (en) * | 1976-06-01 | 1977-12-07 | Nissan Motor | Flow quantity control equipment |
US4175029A (en) * | 1978-03-16 | 1979-11-20 | Dmitriev Jury A | Apparatus for ion plasma coating of articles |
US4393333A (en) * | 1979-12-10 | 1983-07-12 | Hitachi, Ltd. | Microwave plasma ion source |
US4395440A (en) * | 1980-10-09 | 1983-07-26 | Matsushita Electric Industrial Co., Ltd. | Method of and apparatus for manufacturing ultrafine particle film |
AU8288282A (en) * | 1981-05-04 | 1982-11-11 | Optical Coating Laboratory, Inc. | Production and utilization of activated molecular beams |
JPS6130036A (ja) * | 1984-07-23 | 1986-02-12 | Fujitsu Ltd | マイクロ波プラズマ処理装置 |
JPS61177366A (ja) * | 1985-01-31 | 1986-08-09 | Sharp Corp | 超微粒子分散基板の製造装置 |
-
1986
- 1986-11-14 GB GB8627258A patent/GB2185129B/en not_active Expired
- 1986-11-14 FR FR8615848A patent/FR2591002B1/fr not_active Expired - Lifetime
- 1986-11-14 DE DE19863638942 patent/DE3638942A1/de active Granted
Also Published As
Publication number | Publication date |
---|---|
FR2591002A1 (fr) | 1987-06-05 |
GB8627258D0 (en) | 1986-12-17 |
DE3638942C2 (fr) | 1988-05-26 |
GB2185129A (en) | 1987-07-08 |
DE3638942A1 (de) | 1987-05-21 |
GB2185129B (en) | 1989-10-11 |
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