FR2508707A1 - Transistor balistique a multiples heterojonctions - Google Patents
Transistor balistique a multiples heterojonctions Download PDFInfo
- Publication number
- FR2508707A1 FR2508707A1 FR8112613A FR8112613A FR2508707A1 FR 2508707 A1 FR2508707 A1 FR 2508707A1 FR 8112613 A FR8112613 A FR 8112613A FR 8112613 A FR8112613 A FR 8112613A FR 2508707 A1 FR2508707 A1 FR 2508707A1
- Authority
- FR
- France
- Prior art keywords
- layer
- layers
- base
- contact
- transistor according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 27
- 230000000694 effects Effects 0.000 claims abstract description 22
- 239000000463 material Substances 0.000 claims abstract description 18
- 239000002784 hot electron Substances 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 claims description 22
- 230000004888 barrier function Effects 0.000 claims description 15
- 238000005036 potential barrier Methods 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 5
- 229910052785 arsenic Inorganic materials 0.000 claims description 4
- 238000002347 injection Methods 0.000 claims description 4
- 239000007924 injection Substances 0.000 claims description 4
- 238000001465 metallisation Methods 0.000 claims description 4
- 230000005641 tunneling Effects 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims 8
- 239000000956 alloy Substances 0.000 claims 8
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 238000005468 ion implantation Methods 0.000 claims 1
- 230000000149 penetrating effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 11
- 230000010287 polarization Effects 0.000 description 5
- 230000006978 adaptation Effects 0.000 description 2
- 238000000407 epitaxy Methods 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/36—Unipolar devices
- H10D48/362—Unipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions, e.g. hot electron transistors [HET], metal base transistors [MBT], resonant tunnelling transistors [RTT], bulk barrier transistors [BBT], planar doped barrier transistors [PDBT] or charge injection transistors [CHINT]
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8112613A FR2508707A1 (fr) | 1981-06-26 | 1981-06-26 | Transistor balistique a multiples heterojonctions |
| EP82401122A EP0070211A1 (fr) | 1981-06-26 | 1982-06-18 | Transistor balistique à multiples hétérojonctions |
| JP57110561A JPS589371A (ja) | 1981-06-26 | 1982-06-26 | トランジスタ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8112613A FR2508707A1 (fr) | 1981-06-26 | 1981-06-26 | Transistor balistique a multiples heterojonctions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2508707A1 true FR2508707A1 (fr) | 1982-12-31 |
| FR2508707B1 FR2508707B1 (OSRAM) | 1984-10-12 |
Family
ID=9259917
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8112613A Granted FR2508707A1 (fr) | 1981-06-26 | 1981-06-26 | Transistor balistique a multiples heterojonctions |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0070211A1 (OSRAM) |
| JP (1) | JPS589371A (OSRAM) |
| FR (1) | FR2508707A1 (OSRAM) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61121359A (ja) * | 1984-11-19 | 1986-06-09 | Fujitsu Ltd | 高速半導体装置の製造方法 |
| JPH0680675B2 (ja) * | 1984-03-06 | 1994-10-12 | 富士通株式会社 | 半導体装置の製造方法 |
| JPS6158268A (ja) * | 1984-08-30 | 1986-03-25 | Fujitsu Ltd | 高速半導体装置 |
| JPS61158172A (ja) * | 1984-12-29 | 1986-07-17 | Fujitsu Ltd | 高速半導体装置 |
| JPS61226961A (ja) * | 1985-04-01 | 1986-10-08 | Fujitsu Ltd | 高速半導体装置 |
| JPS624366A (ja) * | 1985-07-01 | 1987-01-10 | Fujitsu Ltd | ホツトエレクトロントランジスタ |
| JPS624365A (ja) * | 1985-07-01 | 1987-01-10 | Fujitsu Ltd | 半導体装置 |
| JPS62211948A (ja) * | 1986-03-13 | 1987-09-17 | Fujitsu Ltd | ヘテロ接合半導体装置 |
| JPS63310167A (ja) * | 1987-06-12 | 1988-12-19 | Agency Of Ind Science & Technol | 半導体装置 |
| US4958208A (en) * | 1987-08-12 | 1990-09-18 | Nec Corporation | Bipolar transistor with abrupt potential discontinuity in collector region |
| US5045296A (en) * | 1989-10-30 | 1991-09-03 | Fmc Corporation | Sodium carbonate perhydrate process |
| CA2072173C (en) * | 1991-06-24 | 2002-06-04 | Takayoshi Imoto | Lining material for pipe lines and a process for providing pipe lines therewith |
| JP2558383Y2 (ja) * | 1992-06-19 | 1997-12-24 | 三菱マテリアル株式会社 | サーミスタセンサ |
| US5442194A (en) * | 1994-01-07 | 1995-08-15 | Texas Instruments Incorporated | Room-temperature tunneling hot-electron transistor |
| WO2005109519A1 (en) * | 2004-05-01 | 2005-11-17 | Cristopher Croft Jones | Charge carrier flow apparatus and methods |
| KR101235760B1 (ko) * | 2010-12-27 | 2013-02-28 | 재단법인 포항산업과학연구원 | 스틸 커튼월 장착구조 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2394174A1 (fr) * | 1977-06-09 | 1979-01-05 | Ibm | Dispositif a semi-conducteur du type transistor a heterojonctions a grande vitesse |
| EP0033876A2 (en) * | 1980-02-04 | 1981-08-19 | International Business Machines Corporation | Three-terminal semiconductor device |
-
1981
- 1981-06-26 FR FR8112613A patent/FR2508707A1/fr active Granted
-
1982
- 1982-06-18 EP EP82401122A patent/EP0070211A1/fr not_active Withdrawn
- 1982-06-26 JP JP57110561A patent/JPS589371A/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2394174A1 (fr) * | 1977-06-09 | 1979-01-05 | Ibm | Dispositif a semi-conducteur du type transistor a heterojonctions a grande vitesse |
| EP0033876A2 (en) * | 1980-02-04 | 1981-08-19 | International Business Machines Corporation | Three-terminal semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2508707B1 (OSRAM) | 1984-10-12 |
| JPS589371A (ja) | 1983-01-19 |
| EP0070211A1 (fr) | 1983-01-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |