FR2498815A1 - Dispositif semi-conducteur de deviation d'electrons du type " a transport balistique ", et procede de fabrication d'un tel dispositif - Google Patents
Dispositif semi-conducteur de deviation d'electrons du type " a transport balistique ", et procede de fabrication d'un tel dispositif Download PDFInfo
- Publication number
- FR2498815A1 FR2498815A1 FR8101466A FR8101466A FR2498815A1 FR 2498815 A1 FR2498815 A1 FR 2498815A1 FR 8101466 A FR8101466 A FR 8101466A FR 8101466 A FR8101466 A FR 8101466A FR 2498815 A1 FR2498815 A1 FR 2498815A1
- Authority
- FR
- France
- Prior art keywords
- contacts
- layer
- semiconductor
- row
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 26
- 238000000034 method Methods 0.000 title claims description 10
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims description 15
- 238000000151 deposition Methods 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 10
- 230000008021 deposition Effects 0.000 claims description 8
- 238000001465 metallisation Methods 0.000 claims description 6
- 230000010287 polarization Effects 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- 238000000407 epitaxy Methods 0.000 claims description 4
- 239000012212 insulator Substances 0.000 claims description 4
- 230000008030 elimination Effects 0.000 claims description 3
- 238000003379 elimination reaction Methods 0.000 claims description 3
- 239000002019 doping agent Substances 0.000 claims description 2
- 239000011810 insulating material Substances 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims 4
- 230000005669 field effect Effects 0.000 abstract description 4
- 239000004020 conductor Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 16
- 238000010894 electron beam technology Methods 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000013043 chemical agent Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 241000920340 Pion Species 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- 229910001245 Sb alloy Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- MDPILPRLPQYEEN-UHFFFAOYSA-N aluminium arsenide Chemical compound [As]#[Al] MDPILPRLPQYEEN-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000002140 antimony alloy Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
- H10D30/873—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET] having multiple gate electrodes
Landscapes
- Junction Field-Effect Transistors (AREA)
- Bipolar Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8101466A FR2498815A1 (fr) | 1981-01-27 | 1981-01-27 | Dispositif semi-conducteur de deviation d'electrons du type " a transport balistique ", et procede de fabrication d'un tel dispositif |
| DE8282400033T DE3260213D1 (en) | 1981-01-27 | 1982-01-08 | Semiconductor device with deviation of "ballistic transport" type electrons, and method of making the same |
| EP82400033A EP0058577B1 (fr) | 1981-01-27 | 1982-01-08 | Dispositif semiconducteur de déviation d'électrons du type "à transport balistique", et procédé de fabrication d'un tel dispositif |
| US06/340,965 US4563696A (en) | 1981-01-27 | 1982-01-20 | Ballistic transport-type semiconductor device for deflecting electrons |
| CA000394852A CA1177583A (en) | 1981-01-27 | 1982-01-25 | Ballistic transport-type semiconductor device for detecting electrons and production process for such a device |
| JP57009620A JPS57143870A (en) | 1981-01-27 | 1982-01-26 | Trajectory transport type semiconductor device and method of producing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8101466A FR2498815A1 (fr) | 1981-01-27 | 1981-01-27 | Dispositif semi-conducteur de deviation d'electrons du type " a transport balistique ", et procede de fabrication d'un tel dispositif |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2498815A1 true FR2498815A1 (fr) | 1982-07-30 |
| FR2498815B1 FR2498815B1 (enExample) | 1983-02-18 |
Family
ID=9254548
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8101466A Granted FR2498815A1 (fr) | 1981-01-27 | 1981-01-27 | Dispositif semi-conducteur de deviation d'electrons du type " a transport balistique ", et procede de fabrication d'un tel dispositif |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4563696A (enExample) |
| EP (1) | EP0058577B1 (enExample) |
| JP (1) | JPS57143870A (enExample) |
| CA (1) | CA1177583A (enExample) |
| DE (1) | DE3260213D1 (enExample) |
| FR (1) | FR2498815A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5298787A (en) * | 1979-08-10 | 1994-03-29 | Massachusetts Institute Of Technology | Semiconductor embedded layer technology including permeable base transistor |
| US4712122A (en) * | 1984-07-26 | 1987-12-08 | Research Development Corp. | Heterojunction gate ballistic JFET with channel thinner than Debye length |
| DE3432901C1 (de) * | 1984-09-07 | 1986-01-16 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Halbleiteranordnung |
| US4866660A (en) * | 1988-02-29 | 1989-09-12 | Amp Incorporated | Optoelectraulic devices based on interference induced carrier modulation |
| EP0416198A1 (en) * | 1989-08-30 | 1991-03-13 | International Business Machines Corporation | Electron wave deflection in modulation doped and other doped semiconductor structures |
| JPH05315598A (ja) * | 1992-05-08 | 1993-11-26 | Fujitsu Ltd | 半導体装置 |
| US7440227B2 (en) * | 2005-02-28 | 2008-10-21 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic head having a hall effect sensor and circuit for detecting recorded bits from magnetic recording media |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3560963A (en) * | 1968-06-27 | 1971-02-02 | Theodore R Trilling | Field effect a/d converter |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3593045A (en) * | 1969-12-29 | 1971-07-13 | Bell Telephone Labor Inc | Multiaddress switch using a confined electron beam in a semiconductor |
| US4129880A (en) * | 1977-07-01 | 1978-12-12 | International Business Machines Incorporated | Channel depletion boundary modulation magnetic field sensor |
| DE2804165C2 (de) * | 1978-02-01 | 1982-11-11 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Halbleiteranordnung mit einem für die Stromführung geeigneten Kanal und Verfahren zum Betrieb dieser Halbleiteranordnung |
| US4366493A (en) * | 1980-06-20 | 1982-12-28 | International Business Machines Corporation | Semiconductor ballistic transport device |
-
1981
- 1981-01-27 FR FR8101466A patent/FR2498815A1/fr active Granted
-
1982
- 1982-01-08 DE DE8282400033T patent/DE3260213D1/de not_active Expired
- 1982-01-08 EP EP82400033A patent/EP0058577B1/fr not_active Expired
- 1982-01-20 US US06/340,965 patent/US4563696A/en not_active Expired - Fee Related
- 1982-01-25 CA CA000394852A patent/CA1177583A/en not_active Expired
- 1982-01-26 JP JP57009620A patent/JPS57143870A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3560963A (en) * | 1968-06-27 | 1971-02-02 | Theodore R Trilling | Field effect a/d converter |
Non-Patent Citations (1)
| Title |
|---|
| EXBK/80 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US4563696A (en) | 1986-01-07 |
| CA1177583A (en) | 1984-11-06 |
| JPS57143870A (en) | 1982-09-06 |
| EP0058577B1 (fr) | 1984-06-13 |
| DE3260213D1 (en) | 1984-07-19 |
| EP0058577A1 (fr) | 1982-08-25 |
| FR2498815B1 (enExample) | 1983-02-18 |
| JPH0261146B2 (enExample) | 1990-12-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |