FR2455304A1 - Composition de reserve photographique - Google Patents
Composition de reserve photographiqueInfo
- Publication number
- FR2455304A1 FR2455304A1 FR8008140A FR8008140A FR2455304A1 FR 2455304 A1 FR2455304 A1 FR 2455304A1 FR 8008140 A FR8008140 A FR 8008140A FR 8008140 A FR8008140 A FR 8008140A FR 2455304 A1 FR2455304 A1 FR 2455304A1
- Authority
- FR
- France
- Prior art keywords
- bopi
- reserve
- composition
- photographic
- photographic reserve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
COMPOSITION DE RESERVE PHOTOGRAPHIQUE COMPRENANT UN PRODUIT CYCLISE OBTENU PAR MISE EN CONTACT D'UN POLYMERE OU COPOLYMERE DE DIENE CONJUGE AYANT DES INSATURATIONS DANS LA CHAINE PRINCIPALE OU LES CHAINES LATERALES, AVEC UN ACIDE SULFONIQUE DE FORMULE: (CF DESSIN DANS BOPI) (DANS LAQUELLE R EST DE L'HYDROGENE, UN GROUPE ALKYLE OU CFHSO, X EST UN HALOGENE, ET N EST EGAL A 1, 2 OU 3) DANS UN SOLVANT INERTE, ET UN AGENT DE RETICULATION PHOTOSENSIBLE SOLUBLE DANS UN SOLVANT ORGANIQUE. LE DESSIN DE RESERVE OBTENU A PARTIR DE CETTE COMPOSITION A UNE EXCELLENTE RESISTANCE A LA CHALEUR. DE MEME, LORSQU'ON ATTAQUE UNE PELLICULE D'OXYDE DE SILICIUM PRESENTANT CE DESSIN DE RESERVE, LE NOMBRE DE TROUS D'EPINGLES FORMES EST TRES FAIBLE.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54050694A JPS6057584B2 (ja) | 1979-04-24 | 1979-04-24 | ホトレジスト組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2455304A1 true FR2455304A1 (fr) | 1980-11-21 |
FR2455304B1 FR2455304B1 (fr) | 1986-11-21 |
Family
ID=12866022
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8008140A Expired FR2455304B1 (fr) | 1979-04-24 | 1980-04-11 | Composition de reserve photographique |
Country Status (5)
Country | Link |
---|---|
US (1) | US4294908A (fr) |
JP (1) | JPS6057584B2 (fr) |
DE (1) | DE3014261C2 (fr) |
FR (1) | FR2455304B1 (fr) |
GB (1) | GB2049211B (fr) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3807929A1 (de) * | 1988-03-10 | 1989-09-28 | Basf Ag | Verfahren zur herstellung von reliefformen |
DE3908764C2 (de) * | 1989-03-17 | 1994-08-11 | Basf Ag | Entwickler für die Herstellung photopolymerisierter flexographischer Reliefdruckformen |
US5308888A (en) * | 1989-09-20 | 1994-05-03 | Hitachi, Ltd. | Fluorine-containing curable resin composition and use thereof |
EP0616701B1 (fr) * | 1991-12-10 | 2002-02-13 | The Dow Chemical Company | Compositions photodurcissantes de butarene cyclique |
JPWO2016017762A1 (ja) * | 2014-07-30 | 2017-05-18 | 日産化学工業株式会社 | フッ酸エッチング用樹脂薄膜形成用組成物およびフッ酸エッチング用樹脂薄膜 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2084996A5 (fr) * | 1970-03-26 | 1971-12-17 | Eastman Kodak Co | |
US3669662A (en) * | 1970-10-15 | 1972-06-13 | Ibm | Cyclic polyisoprene photoresist compositions |
US3948667A (en) * | 1971-06-21 | 1976-04-06 | Japan Synthetic Rubber Company Limited | Photosensitive compositions |
JPS54127996A (en) * | 1978-03-29 | 1979-10-04 | Japan Synthetic Rubber Co Ltd | Preparation of cyclized conjugated diene polymer |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3842019A (en) * | 1969-04-04 | 1974-10-15 | Minnesota Mining & Mfg | Use of sulfonic acid salts in cationic polymerization |
US3808155A (en) * | 1971-04-23 | 1974-04-30 | Western Electric Co | Additives to negative photoresists which increase the sensitivity thereof |
GB1392236A (en) * | 1971-06-21 | 1975-04-30 | Japan Synthetic Rubber Co Ltd | Photosensitive compositions |
-
1979
- 1979-04-24 JP JP54050694A patent/JPS6057584B2/ja not_active Expired
-
1980
- 1980-04-02 US US06/136,477 patent/US4294908A/en not_active Expired - Lifetime
- 1980-04-11 FR FR8008140A patent/FR2455304B1/fr not_active Expired
- 1980-04-11 GB GB8012114A patent/GB2049211B/en not_active Expired
- 1980-04-14 DE DE3014261A patent/DE3014261C2/de not_active Expired
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2084996A5 (fr) * | 1970-03-26 | 1971-12-17 | Eastman Kodak Co | |
US3669662A (en) * | 1970-10-15 | 1972-06-13 | Ibm | Cyclic polyisoprene photoresist compositions |
US3948667A (en) * | 1971-06-21 | 1976-04-06 | Japan Synthetic Rubber Company Limited | Photosensitive compositions |
JPS54127996A (en) * | 1978-03-29 | 1979-10-04 | Japan Synthetic Rubber Co Ltd | Preparation of cyclized conjugated diene polymer |
Non-Patent Citations (3)
Title |
---|
CA1980 * |
EXBK/73 * |
EXBK/79 * |
Also Published As
Publication number | Publication date |
---|---|
GB2049211B (en) | 1983-03-30 |
DE3014261C2 (de) | 1983-10-27 |
JPS6057584B2 (ja) | 1985-12-16 |
FR2455304B1 (fr) | 1986-11-21 |
DE3014261A1 (de) | 1980-10-30 |
JPS55142333A (en) | 1980-11-06 |
US4294908A (en) | 1981-10-13 |
GB2049211A (en) | 1980-12-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6042997A (en) | Copolymers and photoresist compositions comprising copolymer resin binder component | |
FI905491A0 (fi) | Sturenkopolymer och foerfarande foer dess framstaellning. | |
TW201221527A (en) | Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same | |
KR940005709A (ko) | 중합체 전해질 및 이의 제조방법 | |
JPS55142339A (en) | Photographic element | |
FR2455304A1 (fr) | Composition de reserve photographique | |
KR920012134A (ko) | 알킬리덴노르보르넨 중합체 및 그의 제조방법 | |
EP0033721B1 (fr) | Polymères à groupes thioxanthone et imidyle latéraux, réticulables sous l'action de la lumière et procédé pour leur préparation | |
KR900016102A (ko) | 공액 디엔 술폰화물 및 그의 중합체 | |
KR880009056A (ko) | 스티렌계 공중합체 및 그 제조방법 | |
JPS6465123A (en) | Electroconductive polymer and its production | |
JPS5483989A (en) | Preparation of hydrophilic polymer | |
TWI312907B (en) | Bisimide compound, acid generator and resist composition using same, and pattern formation method using same composition | |
KR920016900A (ko) | 나프토퀴논-2-디아지드-4-설포닐 그룹을 함유하는 방사선-감수성 중합체 및 포지티브-작용 기록 물질에서의 이의 용도 | |
JPS5433584A (en) | Preparation of polymer latex | |
FR2440941A1 (fr) | Procede de preparation de derives de n-(phenylcycloalkyl) acetamide, nouveaux produits ainsi obtenus et leur utilisation comme herbicides | |
JPS6234923A (ja) | 新規な重合体 | |
GB2180242A (en) | Polymeric sulfoxide based on the polymer and copolymer of vinylalcohol and the method for preparation thereof | |
JP3932664B2 (ja) | カンファー系ジスルホン誘導体、その中間体、製法および用途 | |
KR101439951B1 (ko) | 설포닐기를 포함하는 포토레지스트 모노머, 폴리머 및 이를 포함하는 포토레지스트 조성물 | |
SU651409A1 (ru) | Св зующее вещество рабочего сло носител магнитной записи | |
SU626091A1 (ru) | Диакрилатные или диметакрилатные производные диоксифениленоксидов в качестве сшивающих агентов полимерных материалов | |
KR100197999B1 (ko) | 신규한 포토레지스트 중합체 | |
JPS61126547A (ja) | 電子線レジスト材料 | |
JPS6120031A (ja) | レジスト材料およびその製造方法 |