GB1392236A - Photosensitive compositions - Google Patents

Photosensitive compositions

Info

Publication number
GB1392236A
GB1392236A GB2899772A GB2899772A GB1392236A GB 1392236 A GB1392236 A GB 1392236A GB 2899772 A GB2899772 A GB 2899772A GB 2899772 A GB2899772 A GB 2899772A GB 1392236 A GB1392236 A GB 1392236A
Authority
GB
United Kingdom
Prior art keywords
photo
june
solvent
azidobenzal
trichloroethylene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2899772A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP46044731A external-priority patent/JPS5011284B1/ja
Priority claimed from JP46044991A external-priority patent/JPS5011285B1/ja
Priority claimed from JP7685771A external-priority patent/JPS5010725B2/ja
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Publication of GB1392236A publication Critical patent/GB1392236A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
    • C08C19/00—Chemical modification of rubber
    • C08C19/10—Isomerisation; Cyclisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

1392236 Photo-resist materials JAPAN SYNTHETIC RUBBER CO Ltd 21 June 1972 [21 June 1971 22 June 1971 1 Oct 1971] 28997/72 Heading G2C [Also in Division C3] Photo-sensitive compositions comprise a cyclization product of a butadiene polymer, a solvent, and a photo-sensitizer and/or photo-sensitive cross-linking agent. In Examples, the polymer is a cyclization product of 1, 2-polybytadiene, 1, 4- cis-polybutadiene, 1,2-1, 4-polybutadiene or SBR; the solvent is toluene, xylene, trichloroethylene tetrachloroethane, carbon tetrachloride or chlorobenzene; the photo-sensitizer is p, p'-tetramethyl-diaminobenzophenone, p, p'-dimethylamino-benzophenone, or benzanthrone; and the photo-sensitive cross-linking agent is 2, 6-di (4'- azidobenzal) cyclohexanone, 2, 6-di (4'-azidobenzal)-4-methylcyclohexanone, azidostilbene, a phenyl azide or azidobenzophenone. The compositions may be coated on to a substrate, e.g. an aluminium plate or a silicon wafer having a silica surface layer; imagewise exposed to electron beams or U./V. radiation, e.g. through a pattern; developed by a suitable solvent, e.g. toluene, xylene or trichloroethylene, to remove unexposed portions thus forming an image; and if desired baking and etching the image, e.g. with hydrofluoric acid. All these steps are illustrated in one or other of the Examples.
GB2899772A 1971-06-21 1972-06-21 Photosensitive compositions Expired GB1392236A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP46044731A JPS5011284B1 (en) 1971-06-21 1971-06-21
JP46044991A JPS5011285B1 (en) 1971-06-22 1971-06-22
JP7685771A JPS5010725B2 (en) 1971-10-01 1971-10-01

Publications (1)

Publication Number Publication Date
GB1392236A true GB1392236A (en) 1975-04-30

Family

ID=27292010

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2899772A Expired GB1392236A (en) 1971-06-21 1972-06-21 Photosensitive compositions

Country Status (6)

Country Link
CH (1) CH571730A5 (en)
DE (1) DE2230969C3 (en)
FR (1) FR2143224B1 (en)
GB (1) GB1392236A (en)
IT (1) IT958468B (en)
NL (1) NL169234C (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6057584B2 (en) * 1979-04-24 1985-12-16 ジェイエスアール株式会社 photoresist composition

Also Published As

Publication number Publication date
NL7208520A (en) 1972-12-27
DE2230969A1 (en) 1972-12-28
NL169234B (en) 1982-01-18
DE2230969B2 (en) 1975-02-13
DE2230969C3 (en) 1975-09-25
NL169234C (en) 1982-06-16
IT958468B (en) 1973-10-20
FR2143224A1 (en) 1973-02-02
FR2143224B1 (en) 1978-03-03
CH571730A5 (en) 1976-01-15

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years