NL169234B - METHOD FOR PREPARING A PHOTO SENSITIVE PREPARATION AND METHOD FOR ETCHING A SUBSTRATE. - Google Patents

METHOD FOR PREPARING A PHOTO SENSITIVE PREPARATION AND METHOD FOR ETCHING A SUBSTRATE.

Info

Publication number
NL169234B
NL169234B NL7208520A NL7208520A NL169234B NL 169234 B NL169234 B NL 169234B NL 7208520 A NL7208520 A NL 7208520A NL 7208520 A NL7208520 A NL 7208520A NL 169234 B NL169234 B NL 169234B
Authority
NL
Netherlands
Prior art keywords
etching
preparing
substrate
photo sensitive
sensitive preparation
Prior art date
Application number
NL7208520A
Other languages
Dutch (nl)
Other versions
NL7208520A (en
NL169234C (en
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP46044731A external-priority patent/JPS5011284B1/ja
Priority claimed from JP46044991A external-priority patent/JPS5011285B1/ja
Priority claimed from JP7685771A external-priority patent/JPS5010725B2/ja
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Publication of NL7208520A publication Critical patent/NL7208520A/xx
Publication of NL169234B publication Critical patent/NL169234B/en
Application granted granted Critical
Publication of NL169234C publication Critical patent/NL169234C/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
    • C08C19/00—Chemical modification of rubber
    • C08C19/10—Isomerisation; Cyclisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
NL7208520A 1971-06-21 1972-06-21 METHOD FOR PREPARING A PHOTO SENSITIVE PREPARATION AND METHOD FOR ETCHING A SUBSTRATE. NL169234C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP46044731A JPS5011284B1 (en) 1971-06-21 1971-06-21
JP46044991A JPS5011285B1 (en) 1971-06-22 1971-06-22
JP7685771A JPS5010725B2 (en) 1971-10-01 1971-10-01

Publications (3)

Publication Number Publication Date
NL7208520A NL7208520A (en) 1972-12-27
NL169234B true NL169234B (en) 1982-01-18
NL169234C NL169234C (en) 1982-06-16

Family

ID=27292010

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7208520A NL169234C (en) 1971-06-21 1972-06-21 METHOD FOR PREPARING A PHOTO SENSITIVE PREPARATION AND METHOD FOR ETCHING A SUBSTRATE.

Country Status (6)

Country Link
CH (1) CH571730A5 (en)
DE (1) DE2230969C3 (en)
FR (1) FR2143224B1 (en)
GB (1) GB1392236A (en)
IT (1) IT958468B (en)
NL (1) NL169234C (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6057584B2 (en) * 1979-04-24 1985-12-16 ジェイエスアール株式会社 photoresist composition

Also Published As

Publication number Publication date
NL7208520A (en) 1972-12-27
DE2230969A1 (en) 1972-12-28
DE2230969B2 (en) 1975-02-13
DE2230969C3 (en) 1975-09-25
NL169234C (en) 1982-06-16
IT958468B (en) 1973-10-20
FR2143224A1 (en) 1973-02-02
FR2143224B1 (en) 1978-03-03
GB1392236A (en) 1975-04-30
CH571730A5 (en) 1976-01-15

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Legal Events

Date Code Title Description
BC A request for examination has been filed
V4 Lapsed because of reaching the maxim lifetime of a patent