JPS5339115A - Photosensitive recording medium - Google Patents

Photosensitive recording medium

Info

Publication number
JPS5339115A
JPS5339115A JP11309476A JP11309476A JPS5339115A JP S5339115 A JPS5339115 A JP S5339115A JP 11309476 A JP11309476 A JP 11309476A JP 11309476 A JP11309476 A JP 11309476A JP S5339115 A JPS5339115 A JP S5339115A
Authority
JP
Japan
Prior art keywords
recording medium
photosensitive recording
photoresist
shorten
base plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11309476A
Other languages
Japanese (ja)
Inventor
Tadao Kaneko
Motoo Akagi
Keizo Kato
Yoichi Oba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11309476A priority Critical patent/JPS5339115A/en
Publication of JPS5339115A publication Critical patent/JPS5339115A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To prevent stripping of a positive type photoresist from a base plate, and shorten a process, by adding a specified silane coupling agent to the photoresist consisting of a phenol novolak resin and quinone diazide.
JP11309476A 1976-09-22 1976-09-22 Photosensitive recording medium Pending JPS5339115A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11309476A JPS5339115A (en) 1976-09-22 1976-09-22 Photosensitive recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11309476A JPS5339115A (en) 1976-09-22 1976-09-22 Photosensitive recording medium

Publications (1)

Publication Number Publication Date
JPS5339115A true JPS5339115A (en) 1978-04-10

Family

ID=14603320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11309476A Pending JPS5339115A (en) 1976-09-22 1976-09-22 Photosensitive recording medium

Country Status (1)

Country Link
JP (1) JPS5339115A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57157241A (en) * 1981-03-25 1982-09-28 Oki Electric Ind Co Ltd Formation of resist material and its pattern
JPS5891632A (en) * 1981-11-27 1983-05-31 Oki Electric Ind Co Ltd Formation of microscopic pattern
JPS6037549A (en) * 1983-08-10 1985-02-26 Fuji Photo Film Co Ltd Photosolubilizable composition
EP0792195A4 (en) * 1994-11-22 1999-05-26 Complex Fluid Systems Inc Non-aminic photoresist adhesion promoters for microelectronic applications
US6790581B2 (en) 2001-10-12 2004-09-14 Shin-Etsu Chemical Company, Limited Hybrid compound, resist, and patterning process
WO2006129875A1 (en) * 2005-06-01 2006-12-07 Zeon Corporation Radiation-sensitive resin composition, layered product, and process for producing the same
JP2010033027A (en) * 2008-07-04 2010-02-12 Jsr Corp Positive radiation sensitive resin composition

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57157241A (en) * 1981-03-25 1982-09-28 Oki Electric Ind Co Ltd Formation of resist material and its pattern
JPH033213B2 (en) * 1981-03-25 1991-01-18 Oki Electric Ind Co Ltd
JPS5891632A (en) * 1981-11-27 1983-05-31 Oki Electric Ind Co Ltd Formation of microscopic pattern
JPS6037549A (en) * 1983-08-10 1985-02-26 Fuji Photo Film Co Ltd Photosolubilizable composition
JPH0380298B2 (en) * 1983-08-10 1991-12-24 Fuji Photo Film Co Ltd
EP0792195A4 (en) * 1994-11-22 1999-05-26 Complex Fluid Systems Inc Non-aminic photoresist adhesion promoters for microelectronic applications
US6790581B2 (en) 2001-10-12 2004-09-14 Shin-Etsu Chemical Company, Limited Hybrid compound, resist, and patterning process
WO2006129875A1 (en) * 2005-06-01 2006-12-07 Zeon Corporation Radiation-sensitive resin composition, layered product, and process for producing the same
JP2010033027A (en) * 2008-07-04 2010-02-12 Jsr Corp Positive radiation sensitive resin composition

Similar Documents

Publication Publication Date Title
JPS53132A (en) Magnetic brush developing device
ES8104330A1 (en) Anion exchange resins prepared from crosslinked polystyrenesulfonylchloride
JPS5339115A (en) Photosensitive recording medium
JPS5228875A (en) Mask
JPS52117133A (en) Resist image formation by stripping
JPS5321903A (en) Preparation of magnetic disc substrate
JPS5354239A (en) Method of bonding photosensitive flexographic plate and rubber backingmaterial
JPS5264877A (en) Production of semiconductor device
JPS5421271A (en) Pattern forming method
JPS51114931A (en) Photoresist pattern formation method
JPS52129870A (en) Palstic moulding with fixing lug
JPS5342287A (en) Photo-crosslinkable resin composition
JPS51111075A (en) Photo etching photo mask
JPS538509A (en) Impedance matching system for data transmission circuit
JPS5229067A (en) Code plate
JPS51120713A (en) Positive type photo-resistant compound
JPS5225313A (en) Apparatus for restoring derailed vehicles
CA2008987A1 (en) Production of photopolymerized relief printing plates having a non-tacky surface
JPS5216560A (en) Degassing of polyurethane resin
JPS52108139A (en) Magnetic brush device
JPS51125944A (en) Water softening device
NO773405L (en) CURING CATALYST FOR PHENOL RESIN.
JPS5230413A (en) Floating type magnetic head
JPS524830A (en) Developing method
JPS51134637A (en) Photosensitive plate