FR2439418A1 - Masque pour projeter une image sur un substrat semi-conducteur - Google Patents

Masque pour projeter une image sur un substrat semi-conducteur

Info

Publication number
FR2439418A1
FR2439418A1 FR7925689A FR7925689A FR2439418A1 FR 2439418 A1 FR2439418 A1 FR 2439418A1 FR 7925689 A FR7925689 A FR 7925689A FR 7925689 A FR7925689 A FR 7925689A FR 2439418 A1 FR2439418 A1 FR 2439418A1
Authority
FR
France
Prior art keywords
image
layer
mask
projecting
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7925689A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Censor Patent und Versuchsanstalt
Original Assignee
Censor Patent und Versuchsanstalt
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19782845147 external-priority patent/DE2845147B1/de
Application filed by Censor Patent und Versuchsanstalt filed Critical Censor Patent und Versuchsanstalt
Publication of FR2439418A1 publication Critical patent/FR2439418A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'INVENTION CONCERNE UN MASQUE POUR PROJETER UNE IMAGE SUR UN SUBSTRAT SEMI-CONDUCTEUR RECOUVERT D'UNE RESINE PHOTOSENSIBLE. CE MASQUE COMPORTE UNE COUCHE D'IMAGE 2 COMPOSEE DE SURFACES PERMEABLES ET IMPERMEABLES AUX RADIATIONS D'EXPOSITION, UNE PREMIERE LAME DE VERRE 1 DISPOSEE SUR LADITE COUCHE D'IMAGE 2, UNE SECONDE LAME DE VERRE 3 DISPOSEE SUR LA FACE DE LA COUCHE D'IMAGE 2 OPPOSEE A LA PREMIERE LAME 1, LA SECONDE LAME 2 ETANT ORIENTEE VERS LEDIT OBJECTIF DE PROJECTION 4 AYANT UNE EPAISSEUR SUPERIEURE A L'EPAISSEUR DE RAYLEIGH DUDIT OBJECTIF 4 DANS LA REGION OU ELLE EST SUPERPOSEE A LADITE COUCHE D'IMAGE 2. APPLICATION A LA REALISATION DE SEMI-CONDUCTEURS.
FR7925689A 1978-10-17 1979-10-16 Masque pour projeter une image sur un substrat semi-conducteur Withdrawn FR2439418A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19782845147 DE2845147B1 (de) 1978-10-17 1978-10-17 Projektionsmaske
US239479A 1979-01-10 1979-01-10

Publications (1)

Publication Number Publication Date
FR2439418A1 true FR2439418A1 (fr) 1980-05-16

Family

ID=25776129

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7925689A Withdrawn FR2439418A1 (fr) 1978-10-17 1979-10-16 Masque pour projeter une image sur un substrat semi-conducteur

Country Status (3)

Country Link
FR (1) FR2439418A1 (fr)
GB (1) GB2036367A (fr)
NL (1) NL7907643A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992021066A1 (fr) * 1991-05-17 1992-11-26 E.I. Du Pont De Nemours And Company Pellicule de relachement de pression

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4537813A (en) * 1982-09-27 1985-08-27 At&T Technologies, Inc. Photomask encapsulation
US4499162A (en) * 1983-06-24 1985-02-12 At&T Technologies, Inc. Photomask and method of using same
US4537498A (en) * 1984-05-03 1985-08-27 At&T Technologies, Inc. Focal plane adjusted photomask and methods of projecting images onto photosensitized workpiece surfaces
US4529299A (en) * 1984-05-03 1985-07-16 At&T Technologies, Inc. Interposer element for photomasks in projection printer
EP0851294B1 (fr) * 1996-07-17 2004-02-25 Mitsui Chemicals, Inc. Dispositif de protection de masque
JP3711063B2 (ja) * 2001-11-08 2005-10-26 大日本印刷株式会社 防塵装置付きフォトマスク及びこれを用いた露光方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992021066A1 (fr) * 1991-05-17 1992-11-26 E.I. Du Pont De Nemours And Company Pellicule de relachement de pression

Also Published As

Publication number Publication date
GB2036367A (en) 1980-06-25
NL7907643A (nl) 1980-04-21

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Legal Events

Date Code Title Description
ST Notification of lapse