FR2391491A1 - Elements photodurcissables positifs a deux couches negatives - Google Patents

Elements photodurcissables positifs a deux couches negatives

Info

Publication number
FR2391491A1
FR2391491A1 FR7814424A FR7814424A FR2391491A1 FR 2391491 A1 FR2391491 A1 FR 2391491A1 FR 7814424 A FR7814424 A FR 7814424A FR 7814424 A FR7814424 A FR 7814424A FR 2391491 A1 FR2391491 A1 FR 2391491A1
Authority
FR
France
Prior art keywords
layer
negative
photocurable
positive
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7814424A
Other languages
English (en)
Other versions
FR2391491B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of FR2391491A1 publication Critical patent/FR2391491A1/fr
Application granted granted Critical
Publication of FR2391491B1 publication Critical patent/FR2391491B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention se rapporte à la formation d'images polymères. Elle concerne notamment un élément photodurcissable comportant, dans l'ordre : a. un support en forme de plaque ou de feuille, b. une couche photodurcissable, solide, négative, pouvant être développée par un premier solvant, et c. une couche photodurcissable, solide, négative, pouvant être développée par un second solvant, caractérisé en ce que la couche c contient des agents absorbant les radiations actiniques dans la gamme de radiations auxquelles la couche b est sensible, en une quantité suffisante pour que cette couche c présente une densité optique d'au moins une unité. Utilisation dans la fabrication de circuits imprimés, de plaques d'impression, etc
FR7814424A 1977-05-17 1978-05-16 Elements photodurcissables positifs a deux couches negatives Granted FR2391491A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/797,832 US4123272A (en) 1977-05-17 1977-05-17 Double-negative positive-working photohardenable elements

Publications (2)

Publication Number Publication Date
FR2391491A1 true FR2391491A1 (fr) 1978-12-15
FR2391491B1 FR2391491B1 (fr) 1980-06-13

Family

ID=25171914

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7814424A Granted FR2391491A1 (fr) 1977-05-17 1978-05-16 Elements photodurcissables positifs a deux couches negatives

Country Status (6)

Country Link
US (1) US4123272A (fr)
JP (1) JPS5417719A (fr)
BE (1) BE867154A (fr)
DE (1) DE2821053C3 (fr)
FR (1) FR2391491A1 (fr)
GB (1) GB1577492A (fr)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1127340A (fr) * 1977-12-30 1982-07-06 Kohtaro Nagasawa Compose et materiau photodurcissable et photosensible
US4311784A (en) * 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
US4329410A (en) * 1979-12-26 1982-05-11 The Perkin-Elmer Corporation Production of X-ray lithograph masks
US4357416A (en) * 1980-04-21 1982-11-02 E. I. Du Pont De Nemours And Company Process for preparation of multilayer photosensitive solvent-processable litho element
US4472494A (en) * 1980-09-15 1984-09-18 Napp Systems (Usa), Inc. Bilayer photosensitive imaging article
US4362809A (en) * 1981-03-30 1982-12-07 Hewlett-Packard Company Multilayer photoresist process utilizing an absorbant dye
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
GB2152223B (en) * 1983-11-28 1987-01-14 Fusion Semiconductor Systems Process for imaging resist materials
JPS6199151A (ja) * 1984-10-08 1986-05-17 Sanyo Kokusaku Pulp Co Ltd 画像形成方法
GB2171221B (en) * 1985-02-19 1988-10-26 Stc Plc Forming photolithographic marks on semiconductor substrates
JPH0762761B2 (ja) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 画像形成材料
US4863827A (en) * 1986-10-20 1989-09-05 American Hoechst Corporation Postive working multi-level photoresist
DE4018427A1 (de) * 1990-06-14 1992-01-16 Samsung Electronics Co Ltd Fotolitographie-verfahren zur ausbildung eines feinlinigen musters
GB2291207B (en) * 1994-07-14 1998-03-25 Hyundai Electronics Ind Method for forming resist patterns
JP3859182B2 (ja) * 1997-03-27 2006-12-20 東京応化工業株式会社 ネガ型ホトレジスト組成物
US5922509A (en) * 1998-03-18 1999-07-13 Morton International, Inc. Photoimageable compositions having improved stripping properties in aqueous alkaline solutions
JP2000315647A (ja) * 1999-05-06 2000-11-14 Mitsubishi Electric Corp レジストパターン形成方法
US8133658B2 (en) * 2005-07-29 2012-03-13 Anocoil Corporation Non-chemical development of printing plates
US8137897B2 (en) * 2005-07-29 2012-03-20 Anocoil Corporation Processless development of printing plate
EP1910897A4 (fr) * 2005-07-29 2010-12-22 Anocoil Corp Plaque d'impression pouvant etre imagee pour developpement sur presse
US8377630B2 (en) * 2005-07-29 2013-02-19 Anocoil Corporation On-press plate development without contamination of fountain fluid
US8343707B2 (en) 2005-07-29 2013-01-01 Anocoil Corporation Lithographic printing plate for in-solidus development on press

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2100332A5 (fr) * 1970-07-08 1972-03-17 Ncr Co
US3761264A (en) * 1971-10-12 1973-09-25 Rca Corp Method of defining a detailed pattern on a surface of a body
US3849136A (en) * 1973-07-31 1974-11-19 Ibm Masking of deposited thin films by use of a masking layer photoresist composite

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL245513A (fr) * 1959-01-23
US3615435A (en) * 1968-02-14 1971-10-26 Du Pont Photohardenable image reproduction element with integral pigmented layer and process for use
NL168054C (nl) * 1969-02-01 Basf Ag Werkwijze voor het vervaardigen van reliefvormen, alsmede een vast, fotopolymeriseerbaar element, vervaardigd met toepassing van deze werkwijze.
US3808004A (en) * 1969-05-29 1974-04-30 Richardson Graphic Co Lithographic plate and photoresist having two photosensitive layers
CA993709A (en) * 1971-01-21 1976-07-27 Leo Roos Composite, mask-forming photohardenable elements
BE789476A (fr) * 1971-10-01 1973-03-29 Basf Ag Procede de preparation de cliches
US3787211A (en) * 1971-12-10 1974-01-22 Basf Ag Makeready foil for relief printing
JPS50129202U (fr) * 1974-04-05 1975-10-23

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2100332A5 (fr) * 1970-07-08 1972-03-17 Ncr Co
US3761264A (en) * 1971-10-12 1973-09-25 Rca Corp Method of defining a detailed pattern on a surface of a body
US3849136A (en) * 1973-07-31 1974-11-19 Ibm Masking of deposited thin films by use of a masking layer photoresist composite

Also Published As

Publication number Publication date
BE867154A (fr) 1978-11-17
DE2821053A1 (de) 1978-11-23
DE2821053C3 (de) 1983-12-22
GB1577492A (en) 1980-10-22
US4123272A (en) 1978-10-31
JPS5417719A (en) 1979-02-09
FR2391491B1 (fr) 1980-06-13
JPS6130253B2 (fr) 1986-07-12
DE2821053B2 (de) 1981-03-19

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Legal Events

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ST Notification of lapse