GB2152223B - Process for imaging resist materials - Google Patents

Process for imaging resist materials

Info

Publication number
GB2152223B
GB2152223B GB08428518A GB8428518A GB2152223B GB 2152223 B GB2152223 B GB 2152223B GB 08428518 A GB08428518 A GB 08428518A GB 8428518 A GB8428518 A GB 8428518A GB 2152223 B GB2152223 B GB 2152223B
Authority
GB
United Kingdom
Prior art keywords
resist materials
imaging resist
imaging
materials
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08428518A
Other versions
GB2152223A (en
GB8428518D0 (en
Inventor
John C Matthews
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fusion Semiconductor Systems
Original Assignee
Fusion Semiconductor Systems
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fusion Semiconductor Systems filed Critical Fusion Semiconductor Systems
Publication of GB8428518D0 publication Critical patent/GB8428518D0/en
Publication of GB2152223A publication Critical patent/GB2152223A/en
Application granted granted Critical
Publication of GB2152223B publication Critical patent/GB2152223B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
GB08428518A 1983-11-28 1984-11-12 Process for imaging resist materials Expired GB2152223B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US65412383A 1983-11-28 1983-11-28

Publications (3)

Publication Number Publication Date
GB8428518D0 GB8428518D0 (en) 1984-12-19
GB2152223A GB2152223A (en) 1985-07-31
GB2152223B true GB2152223B (en) 1987-01-14

Family

ID=24623516

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08428518A Expired GB2152223B (en) 1983-11-28 1984-11-12 Process for imaging resist materials

Country Status (3)

Country Link
JP (1) JPS60185949A (en)
DE (1) DE3443400A1 (en)
GB (1) GB2152223B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0244572B1 (en) * 1986-04-24 1990-09-05 International Business Machines Corporation Capped two-layer resist process
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
JP2548268B2 (en) * 1988-01-18 1996-10-30 松下電子工業株式会社 Method of forming resist pattern
JP2863177B2 (en) * 1989-01-10 1999-03-03 沖電気工業株式会社 Pattern formation method
DE4018427A1 (en) * 1990-06-14 1992-01-16 Samsung Electronics Co Ltd PHOTOLITOGRAPHY METHOD FOR TRAINING A FINELINE PATTERN
DE4024275A1 (en) * 1990-07-31 1992-02-06 Kernforschungsz Karlsruhe METHOD FOR THE PRODUCTION OF MICROSTRUCTURES WITH AREAS OF DIFFERENT STRUCTURAL HEIGHT
EP0689094A1 (en) * 1994-06-23 1995-12-27 Akzo Nobel N.V. Bleaching mask
KR100434133B1 (en) * 1995-07-14 2004-08-09 텍사스 인스트루먼츠 인코포레이티드 Texas instruments incorporated
US5804088A (en) * 1996-07-12 1998-09-08 Texas Instruments Incorporated Intermediate layer lithography
EP1763706B1 (en) 2004-06-28 2013-12-11 Canon Kabushiki Kaisha Method for manufacturing liquid discharge head

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123272A (en) * 1977-05-17 1978-10-31 E. I. Du Pont De Nemours And Company Double-negative positive-working photohardenable elements
US4211834A (en) * 1977-12-30 1980-07-08 International Business Machines Corporation Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask
CA1139976A (en) * 1978-12-22 1983-01-25 Howard A. Fromson Process and apparatus for making lithographic printing plates

Also Published As

Publication number Publication date
GB2152223A (en) 1985-07-31
GB8428518D0 (en) 1984-12-19
JPS60185949A (en) 1985-09-21
DE3443400A1 (en) 1985-06-27

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee