GB2171221B - Forming photolithographic marks on semiconductor substrates - Google Patents

Forming photolithographic marks on semiconductor substrates

Info

Publication number
GB2171221B
GB2171221B GB08504241A GB8504241A GB2171221B GB 2171221 B GB2171221 B GB 2171221B GB 08504241 A GB08504241 A GB 08504241A GB 8504241 A GB8504241 A GB 8504241A GB 2171221 B GB2171221 B GB 2171221B
Authority
GB
United Kingdom
Prior art keywords
marks
semiconductor substrates
forming photolithographic
photolithographic
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08504241A
Other versions
GB8504241D0 (en
GB2171221A (en
Inventor
Stephen Wilfrid Bland
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
STC PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STC PLC filed Critical STC PLC
Priority to GB08504241A priority Critical patent/GB2171221B/en
Publication of GB8504241D0 publication Critical patent/GB8504241D0/en
Publication of GB2171221A publication Critical patent/GB2171221A/en
Application granted granted Critical
Publication of GB2171221B publication Critical patent/GB2171221B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Formation Of Insulating Films (AREA)
GB08504241A 1985-02-19 1985-02-19 Forming photolithographic marks on semiconductor substrates Expired GB2171221B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB08504241A GB2171221B (en) 1985-02-19 1985-02-19 Forming photolithographic marks on semiconductor substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08504241A GB2171221B (en) 1985-02-19 1985-02-19 Forming photolithographic marks on semiconductor substrates

Publications (3)

Publication Number Publication Date
GB8504241D0 GB8504241D0 (en) 1985-03-20
GB2171221A GB2171221A (en) 1986-08-20
GB2171221B true GB2171221B (en) 1988-10-26

Family

ID=10574725

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08504241A Expired GB2171221B (en) 1985-02-19 1985-02-19 Forming photolithographic marks on semiconductor substrates

Country Status (1)

Country Link
GB (1) GB2171221B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6372647B1 (en) * 1999-12-14 2002-04-16 International Business Machines Corporation Via masked line first dual damascene

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3849136A (en) * 1973-07-31 1974-11-19 Ibm Masking of deposited thin films by use of a masking layer photoresist composite
US4123272A (en) * 1977-05-17 1978-10-31 E. I. Du Pont De Nemours And Company Double-negative positive-working photohardenable elements
JPH0664341B2 (en) * 1983-01-24 1994-08-22 ウエスターン エレクトリック カムパニー，インコーポレーテッド Manufacturing method of semiconductor device

Also Published As

Publication number Publication date
GB8504241D0 (en) 1985-03-20
GB2171221A (en) 1986-08-20

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20020219