FR2389156A1 - Substance sensible aux rayons x pour photogravure - Google Patents

Substance sensible aux rayons x pour photogravure

Info

Publication number
FR2389156A1
FR2389156A1 FR7812272A FR7812272A FR2389156A1 FR 2389156 A1 FR2389156 A1 FR 2389156A1 FR 7812272 A FR7812272 A FR 7812272A FR 7812272 A FR7812272 A FR 7812272A FR 2389156 A1 FR2389156 A1 FR 2389156A1
Authority
FR
France
Prior art keywords
rays
terpolymer
bromine
photogravure
photosensitive substance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7812272A
Other languages
English (en)
Other versions
FR2389156B1 (fr
Inventor
Rudolf August Herbert Heinecke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Standard Electric Corp
Original Assignee
International Standard Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Standard Electric Corp filed Critical International Standard Electric Corp
Publication of FR2389156A1 publication Critical patent/FR2389156A1/fr
Application granted granted Critical
Publication of FR2389156B1 publication Critical patent/FR2389156B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)

Abstract

La présente invention concerne un procédé de photogravure. Afin d'améliorer la précision et la définition du motif d'un circuit intégré en cours de réalisation, il est fait emploi de substances sensibles aux rayons X de préférence à celles sensibles aux rayons ultraviolets. L'invention présente une substance photosensible qui veut être, par exemple, un terpolymère de méthacrylate de methyle, d'acrylate d'éthyle ou d'éthacrylate de glycidyle partiellement estérifié par de l'acide méthylacrilique. Au moins l'un des atomes d'hydrogène de chaque unité terpolymère est remplacé par du brome. Si on incorpore 10 à 15 % de sa masse de brome dans une substance photosensible, la sensibilité de cette dernière aux rayons X mous peut être multipliée par 10 ou 20. L'invention trouve une application, par exemple, dans la fabrication des circuits intégrés.
FR7812272A 1977-04-26 1978-04-26 Substance sensible aux rayons x pour photogravure Granted FR2389156A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1730877A GB1602724A (en) 1977-04-26 1977-04-26 Resist material for x-ray lithography

Publications (2)

Publication Number Publication Date
FR2389156A1 true FR2389156A1 (fr) 1978-11-24
FR2389156B1 FR2389156B1 (fr) 1983-08-26

Family

ID=10092910

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7812272A Granted FR2389156A1 (fr) 1977-04-26 1978-04-26 Substance sensible aux rayons x pour photogravure

Country Status (4)

Country Link
JP (1) JPS53135703A (fr)
DE (1) DE2817426A1 (fr)
FR (1) FR2389156A1 (fr)
GB (1) GB1602724A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0016679A1 (fr) * 1979-03-09 1980-10-01 Thomson-Csf Substances de photomasquage, leur procédé de préparation, et masque obtenu
FR2451050A1 (fr) * 1979-03-09 1980-10-03 Thomson Csf Composition de photomasquage, son procede de preparation, et masque obtenu
FR2461967A2 (fr) * 1979-07-17 1981-02-06 Thomson Csf Composition de photomasquage, son procede de preparation, et masque obtenu

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4588671A (en) * 1981-12-21 1986-05-13 Institut Khimii Akademii Nauk Sssr Photo and electron resist with donor-acceptor complex and light sensitive compound
JP2002110505A (ja) * 2000-09-27 2002-04-12 Mitsubishi Electric Corp 露光方法、露光装置、ｘ線マスク、レジスト、半導体装置および微細構造体

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5290269A (en) * 1976-01-23 1977-07-29 Nippon Telegr & Teleph Corp <Ntt> Forming method for fine resist patterns
JPS5376825A (en) * 1976-12-20 1978-07-07 Cho Lsi Gijutsu Kenkyu Kumiai Radiation sensitive positive regist material
JPS53100774A (en) * 1977-02-15 1978-09-02 Nippon Telegr & Teleph Corp <Ntt> Resist composition for short eavelength ultraviolet light
JPS53102025A (en) * 1977-02-18 1978-09-06 Hitachi Ltd Radiation sensitive organic high molecular material
JPS53116831A (en) * 1977-03-23 1978-10-12 Toshiba Corp Radioactive-ray sensitive material

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0016679A1 (fr) * 1979-03-09 1980-10-01 Thomson-Csf Substances de photomasquage, leur procédé de préparation, et masque obtenu
FR2451050A1 (fr) * 1979-03-09 1980-10-03 Thomson Csf Composition de photomasquage, son procede de preparation, et masque obtenu
FR2461967A2 (fr) * 1979-07-17 1981-02-06 Thomson Csf Composition de photomasquage, son procede de preparation, et masque obtenu

Also Published As

Publication number Publication date
FR2389156B1 (fr) 1983-08-26
GB1602724A (en) 1981-11-18
DE2817426A1 (de) 1978-11-02
JPS5721698B2 (fr) 1982-05-08
JPS53135703A (en) 1978-11-27

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Legal Events

Date Code Title Description
ST Notification of lapse