FR2375623B1 - - Google Patents

Info

Publication number
FR2375623B1
FR2375623B1 FR7619105A FR7619105A FR2375623B1 FR 2375623 B1 FR2375623 B1 FR 2375623B1 FR 7619105 A FR7619105 A FR 7619105A FR 7619105 A FR7619105 A FR 7619105A FR 2375623 B1 FR2375623 B1 FR 2375623B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7619105A
Other languages
French (fr)
Other versions
FR2375623A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR7619105A priority Critical patent/FR2375623A1/fr
Priority to GB24127/77A priority patent/GB1579671A/en
Priority to NL7706870A priority patent/NL165851C/xx
Priority to JP52074305A priority patent/JPS6059583B2/ja
Priority to DE19772728352 priority patent/DE2728352A1/de
Publication of FR2375623A1 publication Critical patent/FR2375623A1/fr
Priority to US06/038,072 priority patent/US4235958A/en
Application granted granted Critical
Publication of FR2375623B1 publication Critical patent/FR2375623B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
FR7619105A 1976-06-23 1976-06-23 Nouveaux films photosensibles utilisables en microgravure Granted FR2375623A1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR7619105A FR2375623A1 (fr) 1976-06-23 1976-06-23 Nouveaux films photosensibles utilisables en microgravure
GB24127/77A GB1579671A (en) 1976-06-23 1977-06-09 Photosensitive films for use in microgravure
NL7706870A NL165851C (nl) 1976-06-23 1977-06-21 Voor straling gevoelige afdeklaag.
JP52074305A JPS6059583B2 (ja) 1976-06-23 1977-06-22 マイクログラビア用感光性フイルム及びその製法
DE19772728352 DE2728352A1 (de) 1976-06-23 1977-06-23 Lichtempfindlicher film und seine verwendung
US06/038,072 US4235958A (en) 1976-06-23 1979-05-11 Photosensitive film usable in microgravure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7619105A FR2375623A1 (fr) 1976-06-23 1976-06-23 Nouveaux films photosensibles utilisables en microgravure

Publications (2)

Publication Number Publication Date
FR2375623A1 FR2375623A1 (fr) 1978-07-21
FR2375623B1 true FR2375623B1 (en:Method) 1981-08-07

Family

ID=9174777

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7619105A Granted FR2375623A1 (fr) 1976-06-23 1976-06-23 Nouveaux films photosensibles utilisables en microgravure

Country Status (6)

Country Link
US (1) US4235958A (en:Method)
JP (1) JPS6059583B2 (en:Method)
DE (1) DE2728352A1 (en:Method)
FR (1) FR2375623A1 (en:Method)
GB (1) GB1579671A (en:Method)
NL (1) NL165851C (en:Method)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4500628A (en) * 1981-04-22 1985-02-19 At&T Bell Laboratories Process of making solid state devices using silicon containing organometallic plasma developed resists
US4396704A (en) * 1981-04-22 1983-08-02 Bell Telephone Laboratories, Incorporated Solid state devices produced by organometallic plasma developed resists
FR2553531B1 (fr) * 1983-10-14 1995-12-29 Canon Kk Monomere photopolymerisable pour milieu d'enregistrement optique et milieu le contenant
JPS60120361A (ja) * 1983-12-05 1985-06-27 Canon Inc 感光体
JPS60121442A (ja) * 1983-12-06 1985-06-28 Canon Inc 感光性記録メモリ−媒体および記録再生方法
FR2564092B1 (fr) * 1984-05-10 1988-06-10 Commissariat Energie Atomique Complexes organiques amphiphiles a transfert de charge, conducteurs de l'electricite ou precurseurs de conducteurs de l'electricite
US5173365A (en) * 1985-03-25 1992-12-22 Nanofilm Corporation Ultra-thin molecular film
JPS6254494A (ja) * 1985-09-02 1987-03-10 日本電気株式会社 回路部品実装方法
JPS62133423U (en:Method) * 1986-02-12 1987-08-22
JPS62280837A (ja) * 1986-05-30 1987-12-05 Matsushita Electric Ind Co Ltd エネルギ−感応性単分子累積膜及びそれを用いたパタ−ン形成方法
JPS6358439A (ja) * 1986-08-29 1988-03-14 Hiroyoshi Shirai レジスト
US5258263A (en) * 1991-09-10 1993-11-02 Polaroid Corporation Printing plate and methods of making and use same
US5474813A (en) * 1992-04-10 1995-12-12 Walker; Dana A. Systems and methods for applying grid lines to a shaft and sensing movement thereof
US5253531A (en) * 1992-04-10 1993-10-19 Walker Dana A System and method for monitoring torsional vibrations and operating parameters of rotating shafts
US5734108A (en) * 1992-04-10 1998-03-31 Walker; Dana A. System for sensing shaft displacement and strain
JPH0619317U (ja) * 1992-07-31 1994-03-11 日本電波工業株式会社 表面実装型の圧電共振子
JPH0634329U (ja) * 1992-07-31 1994-05-06 日本電波工業株式会社 表面実装型の圧電共振子
JPH0626317U (ja) * 1992-08-31 1994-04-08 日本電波工業株式会社 表面実装型の圧電共振子
DE4234423C2 (de) * 1992-10-13 1996-10-10 Inst Mikrotechnik Mainz Gmbh Mit einem Resist beschichtete Metall- oder Halbleitersubstrate und Verfahren zur Erzielung einer stabilen Resist-Substrat-Haftung
WO2007117698A2 (en) 2006-04-07 2007-10-18 Qd Vision, Inc. Composition including material, methods of depositing material, articles including same and systems for depositing material
WO2008111947A1 (en) 2006-06-24 2008-09-18 Qd Vision, Inc. Methods and articles including nanomaterial

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1945456U (de) 1966-02-05 1966-09-01 Kodak Ag Blitzgeraet fuer photographische zwecke.
DE1945456A1 (de) 1968-09-11 1970-04-02 Asahi Chemical Ind Photosensibilisirende Loesung und ihre Verwendung zur Herstellung von Relief-Druckformen
US3923761A (en) * 1972-07-18 1975-12-02 Western Litho Plate & Supply Photopolymers

Also Published As

Publication number Publication date
NL165851C (nl) 1981-05-15
NL165851B (nl) 1980-12-15
FR2375623A1 (fr) 1978-07-21
GB1579671A (en) 1980-11-19
DE2728352C2 (en:Method) 1987-12-23
JPS6059583B2 (ja) 1985-12-25
NL7706870A (nl) 1977-12-28
DE2728352A1 (de) 1977-12-29
JPS534602A (en) 1978-01-17
US4235958A (en) 1980-11-25

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Legal Events

Date Code Title Description
ST Notification of lapse