FR2369022A1 - Procede et appareil de nettoyage d'une piece par ultrasons - Google Patents

Procede et appareil de nettoyage d'une piece par ultrasons

Info

Publication number
FR2369022A1
FR2369022A1 FR7731930A FR7731930A FR2369022A1 FR 2369022 A1 FR2369022 A1 FR 2369022A1 FR 7731930 A FR7731930 A FR 7731930A FR 7731930 A FR7731930 A FR 7731930A FR 2369022 A1 FR2369022 A1 FR 2369022A1
Authority
FR
France
Prior art keywords
cleaning
solvent
ultrasonics
ultrasonic
reservoir
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7731930A
Other languages
English (en)
Other versions
FR2369022B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Branson Ultrasonics Corp
Original Assignee
Branson Ultrasonics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Branson Ultrasonics Corp filed Critical Branson Ultrasonics Corp
Publication of FR2369022A1 publication Critical patent/FR2369022A1/fr
Application granted granted Critical
Publication of FR2369022B1 publication Critical patent/FR2369022B1/fr
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning In General (AREA)

Abstract

L'invention concerne le nettoyage par ultrasons de pièces. La surface à nettoyer d'une pièce 14 reçoit un courant continu de solvant provenant d'un réservoir 40, et un transducteur ultrasonore 50 provoque un phénomène de cavitation dans la pellicule de solvant pour nettoyer efficacement la surface de la pièce. Le nettoyage s'effectue ainsi sans contact mécanique susceptible de déteriorer la pièce. Application au nettoyage des tranches de semiconducteur.
FR7731930A 1976-10-26 1977-10-24 Procede et appareil de nettoyage d'une piece par ultrasons Granted FR2369022A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/735,601 US4064885A (en) 1976-10-26 1976-10-26 Apparatus for cleaning workpieces by ultrasonic energy

Publications (2)

Publication Number Publication Date
FR2369022A1 true FR2369022A1 (fr) 1978-05-26
FR2369022B1 FR2369022B1 (fr) 1982-03-05

Family

ID=24956463

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7731930A Granted FR2369022A1 (fr) 1976-10-26 1977-10-24 Procede et appareil de nettoyage d'une piece par ultrasons

Country Status (5)

Country Link
US (1) US4064885A (fr)
JP (1) JPS5354868A (fr)
DE (1) DE2747082B2 (fr)
FR (1) FR2369022A1 (fr)
GB (1) GB1591742A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2505673A1 (fr) * 1981-05-15 1982-11-19 Gca Corp Appareil pour le decapage par ultra-sons de galettes semiconductrices

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4183011A (en) * 1977-12-22 1980-01-08 Fred M. Dellorfano, Jr. Ultrasonic cleaning systems
JPS56144785A (en) * 1980-04-11 1981-11-11 Olympus Optical Co Washer for endoscope
CH651484A5 (de) * 1981-06-24 1985-09-30 Roag Ag Verfahren und vorrichtung zum trennen von optikteilen von tragkoerpern.
US4409999A (en) * 1981-08-07 1983-10-18 Pedziwiatr Edward A Automatic ultrasonic cleaning apparatus
DE3208195A1 (de) * 1982-03-06 1983-09-08 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Ultraschall-reinigungsverfahren
US4501285A (en) * 1982-04-05 1985-02-26 Sonobond Ultrasonics, Inc. Ultrasonic cleaning apparatus
US4489740A (en) * 1982-12-27 1984-12-25 General Signal Corporation Disc cleaning machine
CS232593B1 (en) * 1983-08-22 1985-02-14 Karel Gabriel Equipment for cleaning of parts by means of near ultrasound field
FR2575942B1 (fr) * 1985-01-11 1987-05-15 Thomas Jean Procede et dispositif de nettoyage par ultrasons
US4924890A (en) * 1986-05-16 1990-05-15 Eastman Kodak Company Method and apparatus for cleaning semiconductor wafers
GB8727513D0 (en) * 1987-11-24 1987-12-23 Int Computers Ltd Cleaning keyboards
US5230743A (en) * 1988-05-25 1993-07-27 Semitool, Inc. Method for single wafer processing in which a semiconductor wafer is contacted with a fluid
US5168886A (en) * 1988-05-25 1992-12-08 Semitool, Inc. Single wafer processor
US5224504A (en) * 1988-05-25 1993-07-06 Semitool, Inc. Single wafer processor
DE3903607A1 (de) * 1989-02-08 1990-08-09 Leybold Ag Vorrichtung zum reinigen, pruefen und einordnen von werkstuecken
JPH03136232A (ja) * 1989-08-31 1991-06-11 Dainippon Screen Mfg Co Ltd 基板の表面処理装置
DE3937442A1 (de) * 1989-11-10 1991-05-16 Nokia Unterhaltungselektronik Verfahren zum bereichsweisen entfernen von schichten von einem substrat
US5203360A (en) * 1990-12-17 1993-04-20 Seagate Technology, Inc. Disc washing system
JP2877216B2 (ja) * 1992-10-02 1999-03-31 東京エレクトロン株式会社 洗浄装置
US5529753A (en) * 1993-07-09 1996-06-25 Dade International Inc. System for ultrasonic energy coupling by irrigation
US5368054A (en) * 1993-12-17 1994-11-29 International Business Machines Corporation Ultrasonic jet semiconductor wafer cleaning apparatus
KR0132274B1 (ko) * 1994-05-16 1998-04-11 김광호 웨이퍼 연마 설비
JPH08162425A (ja) * 1994-12-06 1996-06-21 Mitsubishi Electric Corp 半導体集積回路装置の製造方法および製造装置
US5558111A (en) * 1995-02-02 1996-09-24 International Business Machines Corporation Apparatus and method for carrier backing film reconditioning
JPH08238463A (ja) * 1995-03-03 1996-09-17 Ebara Corp 洗浄方法及び洗浄装置
US5975098A (en) * 1995-12-21 1999-11-02 Dainippon Screen Mfg. Co., Ltd. Apparatus for and method of cleaning substrate
DE19615962C1 (de) * 1996-04-22 1997-10-23 Siemens Ag Verfahren zur Entstaubung von Bauteilen von Elektronenröhren
DE19619000A1 (de) * 1996-05-10 1997-11-20 Gottlob Schwarzwaelder Vorrichtung und Verfahren zum Reinigen von farb- und lackverschmutzten Gegenständen
US6039059A (en) 1996-09-30 2000-03-21 Verteq, Inc. Wafer cleaning system
JP3286539B2 (ja) * 1996-10-30 2002-05-27 信越半導体株式会社 洗浄装置および洗浄方法
US20020066464A1 (en) * 1997-05-09 2002-06-06 Semitool, Inc. Processing a workpiece using ozone and sonic energy
US20050194356A1 (en) * 1997-05-09 2005-09-08 Semitool, Inc. Removing photoresist from a workpiece using water and ozone and a photoresist penetrating additive
US20050034745A1 (en) * 1997-05-09 2005-02-17 Semitool, Inc. Processing a workpiece with ozone and a halogenated additive
US6701941B1 (en) * 1997-05-09 2004-03-09 Semitool, Inc. Method for treating the surface of a workpiece
US7416611B2 (en) * 1997-05-09 2008-08-26 Semitool, Inc. Process and apparatus for treating a workpiece with gases
US7163588B2 (en) * 1997-05-09 2007-01-16 Semitool, Inc. Processing a workpiece using water, a base, and ozone
US20020157686A1 (en) * 1997-05-09 2002-10-31 Semitool, Inc. Process and apparatus for treating a workpiece such as a semiconductor wafer
US6021789A (en) * 1998-11-10 2000-02-08 International Business Machines Corporation Wafer cleaning system with progressive megasonic wave
US6619305B1 (en) * 2000-01-11 2003-09-16 Seagate Technology Llc Apparatus for single disc ultrasonic cleaning
US6539952B2 (en) 2000-04-25 2003-04-01 Solid State Equipment Corp. Megasonic treatment apparatus
US6766813B1 (en) 2000-08-01 2004-07-27 Board Of Regents, The University Of Texas System Apparatus and method for cleaning a wafer
US6569256B1 (en) * 2000-09-21 2003-05-27 Intel Corporation Removing toner from printed material
KR100473475B1 (ko) * 2002-08-09 2005-03-10 삼성전자주식회사 기판 세정 장치
US7306002B2 (en) * 2003-01-04 2007-12-11 Yong Bae Kim System and method for wet cleaning a semiconductor wafer
US20060027248A1 (en) * 2004-08-09 2006-02-09 Applied Materials, Inc. Megasonic cleaning with minimized interference
MY154929A (en) 2007-02-08 2015-08-28 Fontana Technology Particle removal method and composition
US9266117B2 (en) 2011-09-20 2016-02-23 Jo-Ann Reif Process and system for treating particulate solids
US9192968B2 (en) 2012-09-20 2015-11-24 Wave Particle Processing Process and system for treating particulate solids
CN105983552B (zh) * 2015-02-15 2019-12-24 盛美半导体设备（上海）有限公司 一种防掉落的半导体清洗装置
WO2017125242A1 (fr) 2016-01-20 2017-07-27 DUSSAULT, Donald Herbert Procédé et appareil pour le nettoyage d'un disque

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1091076B (de) * 1956-08-24 1960-10-20 Karl Roll Vorrichtung zum Reinigen von Gegenstaenden mittels Ultraschall
US3950184A (en) * 1974-11-18 1976-04-13 Texas Instruments Incorporated Multichannel drainage system

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2850854A (en) * 1956-08-20 1958-09-09 Levy Sidney Method for removing material
US2938732A (en) * 1958-08-13 1960-05-31 Jr Cornelius Mantell Disc record cleaning device
US2994329A (en) * 1958-11-10 1961-08-01 Beryl G Catlin Brush and comb cleaner
US3401708A (en) * 1966-11-28 1968-09-17 Richard W. Henes Device for ultrasonically cleaning phonographic records
DE6813009U (de) * 1968-10-03 1969-05-29 Nuova Tecnofarmo Di Panighi & Vorrichtung zur saeuberung, sterilisation und sterilen aufbewahrung von gegenstaenden und instrumenten
US3829328A (en) * 1970-07-13 1974-08-13 Stam Instr Method for cleaning resilient webs
JPS489567U (fr) * 1971-06-18 1973-02-02

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1091076B (de) * 1956-08-24 1960-10-20 Karl Roll Vorrichtung zum Reinigen von Gegenstaenden mittels Ultraschall
US3950184A (en) * 1974-11-18 1976-04-13 Texas Instruments Incorporated Multichannel drainage system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2505673A1 (fr) * 1981-05-15 1982-11-19 Gca Corp Appareil pour le decapage par ultra-sons de galettes semiconductrices

Also Published As

Publication number Publication date
DE2747082B2 (de) 1980-11-06
DE2747082A1 (de) 1978-05-03
JPS5644788B2 (fr) 1981-10-21
FR2369022B1 (fr) 1982-03-05
GB1591742A (en) 1981-06-24
US4064885A (en) 1977-12-27
JPS5354868A (en) 1978-05-18

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