FR2361628A1 - Procede interferometrique - Google Patents

Procede interferometrique

Info

Publication number
FR2361628A1
FR2361628A1 FR7720042A FR7720042A FR2361628A1 FR 2361628 A1 FR2361628 A1 FR 2361628A1 FR 7720042 A FR7720042 A FR 7720042A FR 7720042 A FR7720042 A FR 7720042A FR 2361628 A1 FR2361628 A1 FR 2361628A1
Authority
FR
France
Prior art keywords
grating
diffraction
measured
diffracted
reflected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7720042A
Other languages
English (en)
Other versions
FR2361628B1 (fr
Inventor
Walter Jaerisch
Guenter Makosch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2361628A1 publication Critical patent/FR2361628A1/fr
Application granted granted Critical
Publication of FR2361628B1 publication Critical patent/FR2361628B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02015Interferometers characterised by the beam path configuration
    • G01B9/02032Interferometers characterised by the beam path configuration generating a spatial carrier frequency, e.g. by creating lateral or angular offset between reference and object beam
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056Passive reduction of errors
    • G01B9/02057Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/30Grating as beam-splitter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Optical Transform (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

Procédé interférométrique de mesure relative à la surface. Un faisceau de lumière cohérente monochromatique et collimatée frappe un réseau 1 disposé parallèlement à la surface à mesurer. Un ordre de diffraction S1 de la lumière réfléchie par le réseau est toujours parallèle à trois autres ordres de diffraction du rayonnement S2 à S4 qui après avoir été diffracté puis réfléchie par la surface à mesurer sont à nouveau diffractés par le réseau. Les quatre composantes engendrent deux champs d'interférence dont la combinaison crée une configuration de battement En choisissant convenablement theta o et h, la résolution des franges d'interférence est en relation avec lambda /4 et le système permet une très grande précision. Peut être utilisé pour toute mesure optique, électronique, rayon X, relative à la surface.
FR7720042A 1976-08-12 1977-06-21 Procede interferometrique Granted FR2361628A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762636211 DE2636211C2 (de) 1976-08-12 1976-08-12 Interferometrisches Verfahren zur Abstands- oder Ebenheitsmessung

Publications (2)

Publication Number Publication Date
FR2361628A1 true FR2361628A1 (fr) 1978-03-10
FR2361628B1 FR2361628B1 (fr) 1980-12-19

Family

ID=5985252

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7720042A Granted FR2361628A1 (fr) 1976-08-12 1977-06-21 Procede interferometrique

Country Status (6)

Country Link
US (1) US4188124A (fr)
JP (1) JPS6036003B2 (fr)
DE (1) DE2636211C2 (fr)
FR (1) FR2361628A1 (fr)
GB (1) GB1582661A (fr)
IT (1) IT1125790B (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2413632A1 (fr) * 1977-12-27 1979-07-27 Ibm Procede interferometrique a resolution 1/4 servant notamment pour la fabrication des circuits integres
FR2504256A1 (fr) * 1981-04-16 1982-10-22 Euromask Procede et dispositif de mesure optique de deplacement et application aux photorepeteurs sur tranche

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0066030B1 (fr) * 1981-05-29 1986-08-27 Ibm Deutschland Gmbh Dispositif et procédé pour la mesure interférométrique de planéité
US4656347A (en) * 1984-01-30 1987-04-07 Nippon Telegraph & Telephone Public Corporation Diffraction grating position adjuster using a grating and a reflector
US4641972A (en) * 1984-09-14 1987-02-10 New York Institute Of Technology Method and apparatus for surface profilometry
US4657394A (en) * 1984-09-14 1987-04-14 New York Institute Of Technology Apparatus and method for obtaining three dimensional surface contours
US5636025A (en) * 1992-04-23 1997-06-03 Medar, Inc. System for optically measuring the surface contour of a part using more fringe techniques
CA2067400A1 (fr) * 1992-04-28 1993-10-29 Robert E. Bredberg Dispositif de mesure d'epaisseur au laser
GB9405457D0 (en) * 1994-03-19 1994-05-04 British Aerospace Testing a metal component for cold compression of the metal
JP3158878B2 (ja) * 1994-07-28 2001-04-23 松下電器産業株式会社 光学式エンコーダ
US5953448A (en) * 1996-03-01 1999-09-14 Textile/Clothing Technology Corporation Contour measurement of an object having a discontinuous surface using block point identification techniques
WO1999046602A1 (fr) 1998-03-09 1999-09-16 Gou Lite Ltd. Mesure de la translation par voie optique
MXPA00009038A (es) * 1998-03-09 2002-06-04 Gou Lite Ltd Medicion de traslacion optica.
US6424407B1 (en) 1998-03-09 2002-07-23 Otm Technologies Ltd. Optical translation measurement
WO2002079718A1 (fr) * 2001-03-29 2002-10-10 Georgia Tech Research Corporation Systeme et procede de profilage de surface
US6643025B2 (en) 2001-03-29 2003-11-04 Georgia Tech Research Corporation Microinterferometer for distance measurements
US7518737B2 (en) * 2002-03-29 2009-04-14 Georgia Tech Research Corp. Displacement-measuring optical device with orifice
US7116430B2 (en) * 2002-03-29 2006-10-03 Georgia Technology Research Corporation Highly-sensitive displacement-measuring optical device
US7440117B2 (en) * 2002-03-29 2008-10-21 Georgia Tech Research Corp. Highly-sensitive displacement-measuring optical device
US7485847B2 (en) * 2004-12-08 2009-02-03 Georgia Tech Research Corporation Displacement sensor employing discrete light pulse detection
CN106908325B (zh) * 2017-01-13 2020-09-01 西南交通大学 基于光栅衍射的杨氏模量微小伸长量测量装置及测量方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2150037A5 (fr) * 1971-08-09 1973-03-30 Ibm

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2413632A1 (fr) * 1977-12-27 1979-07-27 Ibm Procede interferometrique a resolution 1/4 servant notamment pour la fabrication des circuits integres
FR2504256A1 (fr) * 1981-04-16 1982-10-22 Euromask Procede et dispositif de mesure optique de deplacement et application aux photorepeteurs sur tranche
EP0065429A1 (fr) * 1981-04-16 1982-11-24 Euromask Procédé et dispositif de mesure optique de déplacement et application aux photorépéteurs sur tranche

Also Published As

Publication number Publication date
JPS5337090A (en) 1978-04-05
JPS6036003B2 (ja) 1985-08-17
IT1125790B (it) 1986-05-14
DE2636211C2 (de) 1978-01-26
GB1582661A (en) 1981-01-14
US4188124A (en) 1980-02-12
DE2636211B1 (de) 1977-06-02
FR2361628B1 (fr) 1980-12-19

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