FR2360998A1 - Procede de realisation de photodiodes a eclairement anterieur - Google Patents
Procede de realisation de photodiodes a eclairement anterieurInfo
- Publication number
- FR2360998A1 FR2360998A1 FR7724317A FR7724317A FR2360998A1 FR 2360998 A1 FR2360998 A1 FR 2360998A1 FR 7724317 A FR7724317 A FR 7724317A FR 7724317 A FR7724317 A FR 7724317A FR 2360998 A1 FR2360998 A1 FR 2360998A1
- Authority
- FR
- France
- Prior art keywords
- photodiodes
- type
- realizing
- layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005286 illumination Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 230000003287 optical effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
- H10F30/225—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier working in avalanche mode, e.g. avalanche photodiodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
- H10F30/223—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PIN barrier
Landscapes
- Light Receiving Elements (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US71239276A | 1976-08-06 | 1976-08-06 | |
US05/793,493 US4127932A (en) | 1976-08-06 | 1977-05-04 | Method of fabricating silicon photodiodes |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2360998A1 true FR2360998A1 (fr) | 1978-03-03 |
FR2360998B1 FR2360998B1 (enrdf_load_stackoverflow) | 1982-04-09 |
Family
ID=27108828
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7724317A Granted FR2360998A1 (fr) | 1976-08-06 | 1977-08-05 | Procede de realisation de photodiodes a eclairement anterieur |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS5341193A (enrdf_load_stackoverflow) |
CA (1) | CA1078948A (enrdf_load_stackoverflow) |
DE (1) | DE2734726C2 (enrdf_load_stackoverflow) |
FR (1) | FR2360998A1 (enrdf_load_stackoverflow) |
GB (1) | GB1561953A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1985002296A1 (en) * | 1983-11-10 | 1985-05-23 | American Telephone & Telegraph Company | IMPROVED p-i-n AND AVALANCHE PHOTODIODES |
FR2641647A1 (fr) * | 1989-01-12 | 1990-07-13 | Rca Inc | Photodiode a avalanche au silicium a faible bruit de multiplication |
US8664031B2 (en) | 2000-11-13 | 2014-03-04 | Sony Corporation | Method of manufacturing photodiode intergrated chip |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3001899A1 (de) * | 1980-01-19 | 1981-07-23 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Planar-fototransistor |
JPS5789271A (en) * | 1980-11-25 | 1982-06-03 | Moririka:Kk | Compound semiconductor element |
JPS57104275A (en) * | 1980-12-19 | 1982-06-29 | Nec Corp | Light receiving element |
CN114975672B (zh) * | 2021-02-26 | 2024-10-22 | 中国科学院半导体研究所 | 背入射近红外增强硅雪崩光电探测器的结构及制备方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3244567A (en) * | 1962-09-10 | 1966-04-05 | Trw Semiconductors Inc | Impurity diffusion method |
US3534231A (en) * | 1968-02-15 | 1970-10-13 | Texas Instruments Inc | Low bulk leakage current avalanche photodiode |
US3886579A (en) * | 1972-07-28 | 1975-05-27 | Hitachi Ltd | Avalanche photodiode |
JPS49116957A (enrdf_load_stackoverflow) * | 1972-10-25 | 1974-11-08 | ||
JPS5031777A (enrdf_load_stackoverflow) * | 1973-07-21 | 1975-03-28 |
-
1977
- 1977-06-28 CA CA281,617A patent/CA1078948A/en not_active Expired
- 1977-08-02 DE DE2734726A patent/DE2734726C2/de not_active Expired
- 1977-08-05 FR FR7724317A patent/FR2360998A1/fr active Granted
- 1977-08-05 GB GB32881/77A patent/GB1561953A/en not_active Expired
- 1977-08-06 JP JP9376277A patent/JPS5341193A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1985002296A1 (en) * | 1983-11-10 | 1985-05-23 | American Telephone & Telegraph Company | IMPROVED p-i-n AND AVALANCHE PHOTODIODES |
EP0142316A3 (en) * | 1983-11-10 | 1985-07-10 | AT&T Corp. | Improved p-i-n- and avalanche photodiodes |
FR2641647A1 (fr) * | 1989-01-12 | 1990-07-13 | Rca Inc | Photodiode a avalanche au silicium a faible bruit de multiplication |
US8664031B2 (en) | 2000-11-13 | 2014-03-04 | Sony Corporation | Method of manufacturing photodiode intergrated chip |
Also Published As
Publication number | Publication date |
---|---|
JPS5341193A (en) | 1978-04-14 |
FR2360998B1 (enrdf_load_stackoverflow) | 1982-04-09 |
DE2734726C2 (de) | 1987-04-16 |
DE2734726A1 (de) | 1978-02-09 |
CA1078948A (en) | 1980-06-03 |
GB1561953A (en) | 1980-03-05 |
JPS6155791B2 (enrdf_load_stackoverflow) | 1986-11-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6015721A (en) | Method of manufacturing an avalanche photodiode | |
EP0843159A3 (en) | Opto-electronic scale-reading apparatus | |
KR900000209B1 (en) | Manufacture of semiconductor a photo diode and avalanche photodiode | |
KR960030452A (ko) | 화합물반도체수광소자 및 그 제조방법 | |
FR2360998A1 (fr) | Procede de realisation de photodiodes a eclairement anterieur | |
JPS6432694A (en) | Manufacture of semiconductor device in which laser diode and photodiode with expanded light receiving plane are unified | |
GB1519466A (en) | Photodiode detector | |
JPH0316275A (ja) | 半導体受光素子の製造方法 | |
JPS5848479A (ja) | 半導体光検出器 | |
JPS6314470A (ja) | 光半導体素子 | |
JPS6233482A (ja) | アバランシエホトダイオ−ド | |
JPS57190373A (en) | Light emitting element with photodetector | |
GB1441261A (en) | Semiconductor avalanche photodiodes | |
JPH0382085A (ja) | 半導体受光素子及びその製造方法 | |
JPS60202971A (ja) | 半導体発光装置 | |
JPS6222475B2 (enrdf_load_stackoverflow) | ||
JPS63239872A (ja) | 半導体受光装置 | |
JPS61220480A (ja) | 半導体受光装置 | |
JPH0383382A (ja) | 半導体受光素子及びその製造方法 | |
KR890004446A (ko) | 선택적 에피택셜 성장을 이용한 광소자 어레이의 제조방법 | |
JPS5710987A (en) | Silicon avalanche photo diode | |
JPS6358888A (ja) | 半導体レ−ザ装置 | |
JPS627176A (ja) | 半導体受光装置 | |
JPS6133272B2 (enrdf_load_stackoverflow) | ||
JPS5896779A (ja) | 受光装置 |