FR2356975A1 - Procede d'impression photolithographique du type a contact permettant d'obtenir des profils a resolution elevee et appareil utilisant un tel procede - Google Patents

Procede d'impression photolithographique du type a contact permettant d'obtenir des profils a resolution elevee et appareil utilisant un tel procede

Info

Publication number
FR2356975A1
FR2356975A1 FR7716799A FR7716799A FR2356975A1 FR 2356975 A1 FR2356975 A1 FR 2356975A1 FR 7716799 A FR7716799 A FR 7716799A FR 7716799 A FR7716799 A FR 7716799A FR 2356975 A1 FR2356975 A1 FR 2356975A1
Authority
FR
France
Prior art keywords
high resolution
contact type
obtaining high
photolithographic printing
printing process
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7716799A
Other languages
English (en)
French (fr)
Other versions
FR2356975B1 (da
Inventor
Constantin Lapadula
Burn J Lin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2356975A1 publication Critical patent/FR2356975A1/fr
Application granted granted Critical
Publication of FR2356975B1 publication Critical patent/FR2356975B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7716799A 1976-06-30 1977-05-26 Procede d'impression photolithographique du type a contact permettant d'obtenir des profils a resolution elevee et appareil utilisant un tel procede Granted FR2356975A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US70143776A 1976-06-30 1976-06-30

Publications (2)

Publication Number Publication Date
FR2356975A1 true FR2356975A1 (fr) 1978-01-27
FR2356975B1 FR2356975B1 (da) 1978-11-03

Family

ID=24817371

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7716799A Granted FR2356975A1 (fr) 1976-06-30 1977-05-26 Procede d'impression photolithographique du type a contact permettant d'obtenir des profils a resolution elevee et appareil utilisant un tel procede

Country Status (3)

Country Link
JP (1) JPS533170A (da)
FR (1) FR2356975A1 (da)
GB (1) GB1527179A (da)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2412410A1 (fr) * 1977-12-23 1979-07-20 Ibm Procede et appareil de fabrication d'un ensemble de buses pour les imprimantes a jet d'encre
EP0006459A2 (de) * 1978-06-29 1980-01-09 Siemens Aktiengesellschaft Anwendung der Galvanoplastik zur Herstellung von Präzisionsflachteilen
EP0025380A1 (fr) * 1979-09-10 1981-03-18 Roumiguières, Jean-Louis Procédé pour reporter sur un support l'ombre fidèle d'un masque percé de fentes distribuées périodiquement, et application de ce procédé notamment en photo-lithogravure
EP0050474A2 (en) * 1980-10-14 1982-04-28 EASTMAN KODAK COMPANY (a New Jersey corporation) Process for preparing elements containing interlaid arrays of compositions in microareas and elements
FR2519157A1 (fr) * 1981-12-30 1983-07-01 Labo Electronique Physique Procede pour la realisation de motifs submicroniques et motifs ainsi obtenus

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56153738A (en) * 1980-04-30 1981-11-27 Fujitsu Ltd Method for contact exposure
DE3315665A1 (de) * 1983-04-29 1984-10-31 Siemens AG, 1000 Berlin und 8000 München Herstellung von galvanoplastischen flachteilen mit totationsunsymmetrischen, kegelfoermigen strukturen
JPS63299395A (ja) * 1987-05-29 1988-12-06 Mitsubishi Electric Corp 露光機
GB2308667A (en) * 1995-12-29 1997-07-02 Hyundai Electronics Ind Exposure equipment for a semiconductor device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2104273A5 (da) * 1970-08-12 1972-04-14 Rank Organisation Ltd
FR2132043A1 (da) * 1971-04-06 1972-11-17 Ibm

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2104273A5 (da) * 1970-08-12 1972-04-14 Rank Organisation Ltd
FR2132043A1 (da) * 1971-04-06 1972-11-17 Ibm

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
REVUE US: "IBM TECHNICAL DISCLOSURE BULLETIN", VOLUME 19, NO. 5, OCTOBRE1976) *

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2412410A1 (fr) * 1977-12-23 1979-07-20 Ibm Procede et appareil de fabrication d'un ensemble de buses pour les imprimantes a jet d'encre
EP0006459A2 (de) * 1978-06-29 1980-01-09 Siemens Aktiengesellschaft Anwendung der Galvanoplastik zur Herstellung von Präzisionsflachteilen
EP0006459A3 (en) * 1978-06-29 1980-01-23 Siemens Aktiengesellschaft Berlin Und Munchen Electroforming process
EP0025380A1 (fr) * 1979-09-10 1981-03-18 Roumiguières, Jean-Louis Procédé pour reporter sur un support l'ombre fidèle d'un masque percé de fentes distribuées périodiquement, et application de ce procédé notamment en photo-lithogravure
FR2465255A1 (fr) * 1979-09-10 1981-03-20 Roumiguieres Jean Louis Procede pour reporter sur un support l'ombre fidele d'un masque perce de fentes distribuees periodiquement, et application de ce procede notamment en photolithogravure
EP0050474A2 (en) * 1980-10-14 1982-04-28 EASTMAN KODAK COMPANY (a New Jersey corporation) Process for preparing elements containing interlaid arrays of compositions in microareas and elements
EP0050474A3 (en) * 1980-10-14 1983-01-26 Eastman Kodak Company Process for preparing elements containing interlaid arrays of compositions in microareas and elements
FR2519157A1 (fr) * 1981-12-30 1983-07-01 Labo Electronique Physique Procede pour la realisation de motifs submicroniques et motifs ainsi obtenus

Also Published As

Publication number Publication date
GB1527179A (en) 1978-10-04
FR2356975B1 (da) 1978-11-03
JPS533170A (en) 1978-01-12

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Legal Events

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