FR2323170A1 - Composition de revetement pour reserves photographiques en polyvinylformal, et articles photosensibles fabriques a partir de ces compositions - Google Patents

Composition de revetement pour reserves photographiques en polyvinylformal, et articles photosensibles fabriques a partir de ces compositions

Info

Publication number
FR2323170A1
FR2323170A1 FR7626286A FR7626286A FR2323170A1 FR 2323170 A1 FR2323170 A1 FR 2323170A1 FR 7626286 A FR7626286 A FR 7626286A FR 7626286 A FR7626286 A FR 7626286A FR 2323170 A1 FR2323170 A1 FR 2323170A1
Authority
FR
France
Prior art keywords
photosensitiser
prodn
pvf
mixt
organic solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7626286A
Other languages
English (en)
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Printing Developments Inc
Original Assignee
Printing Developments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Printing Developments Inc filed Critical Printing Developments Inc
Publication of FR2323170A1 publication Critical patent/FR2323170A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
FR7626286A 1975-09-02 1976-08-31 Composition de revetement pour reserves photographiques en polyvinylformal, et articles photosensibles fabriques a partir de ces compositions Withdrawn FR2323170A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60959075A 1975-09-02 1975-09-02

Publications (1)

Publication Number Publication Date
FR2323170A1 true FR2323170A1 (fr) 1977-04-01

Family

ID=24441438

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7626286A Withdrawn FR2323170A1 (fr) 1975-09-02 1976-08-31 Composition de revetement pour reserves photographiques en polyvinylformal, et articles photosensibles fabriques a partir de ces compositions

Country Status (7)

Country Link
JP (1) JPS5230504A (xx)
BE (1) BE845675A (xx)
DE (1) DE2639610A1 (xx)
FR (1) FR2323170A1 (xx)
LU (1) LU75706A1 (xx)
NL (1) NL7609513A (xx)
SE (1) SE7609640L (xx)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0211667A2 (en) * 1985-08-07 1987-02-25 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
US5128230A (en) * 1986-12-23 1992-07-07 Shipley Company Inc. Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate
US5215857A (en) * 1985-08-07 1993-06-01 Japan Synthetic Rubber Co., Ltd. 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0721626B2 (ja) * 1985-08-10 1995-03-08 日本合成ゴム株式会社 半導体微細加工用レジスト組成物
JPH0693115B2 (ja) * 1988-10-18 1994-11-16 日本合成ゴム株式会社 ネガ型感放射線性樹脂組成物

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0211667A2 (en) * 1985-08-07 1987-02-25 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
EP0211667A3 (en) * 1985-08-07 1987-09-09 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
EP0457367A1 (en) * 1985-08-07 1991-11-21 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
US5215857A (en) * 1985-08-07 1993-06-01 Japan Synthetic Rubber Co., Ltd. 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US5494784A (en) * 1985-08-07 1996-02-27 Japan Synthetic Rubber Co., Ltd. Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent
US5925492A (en) * 1985-08-07 1999-07-20 Jsr Corporation Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent
US6228554B1 (en) 1985-08-07 2001-05-08 Jsr Corporation Radiation-sensitive resin composition
US6270939B1 (en) 1985-08-07 2001-08-07 Jsr Corporation Radiation-sensitive resin composition
US5128230A (en) * 1986-12-23 1992-07-07 Shipley Company Inc. Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate

Also Published As

Publication number Publication date
NL7609513A (nl) 1977-03-04
BE845675A (fr) 1976-12-16
JPS5230504A (en) 1977-03-08
LU75706A1 (xx) 1977-06-15
SE7609640L (sv) 1977-03-03
DE2639610A1 (de) 1977-03-03

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Legal Events

Date Code Title Description
ST Notification of lapse