FR2323170A1 - Polyvinyl formal photoresist compsn. - contains aryldiazide as photosensitiser and crosslinking agent, and used in prodn. of lithographic printing plates - Google Patents
Polyvinyl formal photoresist compsn. - contains aryldiazide as photosensitiser and crosslinking agent, and used in prodn. of lithographic printing platesInfo
- Publication number
- FR2323170A1 FR2323170A1 FR7626286A FR7626286A FR2323170A1 FR 2323170 A1 FR2323170 A1 FR 2323170A1 FR 7626286 A FR7626286 A FR 7626286A FR 7626286 A FR7626286 A FR 7626286A FR 2323170 A1 FR2323170 A1 FR 2323170A1
- Authority
- FR
- France
- Prior art keywords
- photosensitiser
- prodn
- pvf
- mixt
- organic solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
Abstract
A photosensitive resist compsn. comprises a soln. in organic solvent of a mixt. of (a) a polyvinylformal (PVF) which is insoluble in water but soluble in organic solvent, has a formal content of 80-100% (based on PVF) and is prepd. by reacting an aldehyde chosen from formaldehyde, its 19:1 mixt. with acrolein and its 9:1 mixt. with crotonaldehyde, with a water soluble polyvinyl alcohol with a mol wt. 16000-100,000 and hydrolysis degree 80-100%, in a reactn. medium comprising 1,4-dioxane or acetic acid and contg. an inorg. acid catalyst, and (b) an aryl diazide which is soluble in organic solvent and is a photosensitiser and crosslinking agent for the PVF. The compsn. is used for prodn. of lithographic printing plates and printed circuits. It is storage stable and forms dried layers which are thermally stable and which after exposure to light are strongly resistant to solvents (e.g. in printing inks) in the exposed regions. Specifically the dried layer is stable when heated at 121 degrees C for 30 mins.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US60959075A | 1975-09-02 | 1975-09-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2323170A1 true FR2323170A1 (en) | 1977-04-01 |
Family
ID=24441438
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7626286A Withdrawn FR2323170A1 (en) | 1975-09-02 | 1976-08-31 | Polyvinyl formal photoresist compsn. - contains aryldiazide as photosensitiser and crosslinking agent, and used in prodn. of lithographic printing plates |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS5230504A (en) |
BE (1) | BE845675A (en) |
DE (1) | DE2639610A1 (en) |
FR (1) | FR2323170A1 (en) |
LU (1) | LU75706A1 (en) |
NL (1) | NL7609513A (en) |
SE (1) | SE7609640L (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0211667A2 (en) * | 1985-08-07 | 1987-02-25 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition |
US5128230A (en) * | 1986-12-23 | 1992-07-07 | Shipley Company Inc. | Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate |
US5215857A (en) * | 1985-08-07 | 1993-06-01 | Japan Synthetic Rubber Co., Ltd. | 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0721626B2 (en) * | 1985-08-10 | 1995-03-08 | 日本合成ゴム株式会社 | Resist composition for semiconductor fine processing |
JPH0693115B2 (en) * | 1988-10-18 | 1994-11-16 | 日本合成ゴム株式会社 | Negative radiation-sensitive resin composition |
-
1976
- 1976-08-26 NL NL7609513A patent/NL7609513A/en unknown
- 1976-08-30 BE BE170210A patent/BE845675A/en unknown
- 1976-08-31 FR FR7626286A patent/FR2323170A1/en not_active Withdrawn
- 1976-09-01 SE SE7609640A patent/SE7609640L/en unknown
- 1976-09-02 JP JP51104335A patent/JPS5230504A/en active Pending
- 1976-09-02 LU LU75706A patent/LU75706A1/xx unknown
- 1976-09-02 DE DE19762639610 patent/DE2639610A1/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0211667A2 (en) * | 1985-08-07 | 1987-02-25 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition |
EP0211667A3 (en) * | 1985-08-07 | 1987-09-09 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition |
EP0457367A1 (en) * | 1985-08-07 | 1991-11-21 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition |
US5215857A (en) * | 1985-08-07 | 1993-06-01 | Japan Synthetic Rubber Co., Ltd. | 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent |
US5405720A (en) * | 1985-08-07 | 1995-04-11 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent |
US5494784A (en) * | 1985-08-07 | 1996-02-27 | Japan Synthetic Rubber Co., Ltd. | Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent |
US5925492A (en) * | 1985-08-07 | 1999-07-20 | Jsr Corporation | Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent |
US6228554B1 (en) | 1985-08-07 | 2001-05-08 | Jsr Corporation | Radiation-sensitive resin composition |
US6270939B1 (en) | 1985-08-07 | 2001-08-07 | Jsr Corporation | Radiation-sensitive resin composition |
US5128230A (en) * | 1986-12-23 | 1992-07-07 | Shipley Company Inc. | Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate |
Also Published As
Publication number | Publication date |
---|---|
SE7609640L (en) | 1977-03-03 |
JPS5230504A (en) | 1977-03-08 |
DE2639610A1 (en) | 1977-03-03 |
LU75706A1 (en) | 1977-06-15 |
BE845675A (en) | 1976-12-16 |
NL7609513A (en) | 1977-03-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |