NL7609513A - FOR LIGHT SENSITIVE RESIST COATING PREPARATION AND FOR LIGHT SENSITIVE PRODUCTION AS WELL AS A METHOD OF MANUFACTURING A LITHOGRAPHIC PRINTING PLATE. - Google Patents

FOR LIGHT SENSITIVE RESIST COATING PREPARATION AND FOR LIGHT SENSITIVE PRODUCTION AS WELL AS A METHOD OF MANUFACTURING A LITHOGRAPHIC PRINTING PLATE.

Info

Publication number
NL7609513A
NL7609513A NL7609513A NL7609513A NL7609513A NL 7609513 A NL7609513 A NL 7609513A NL 7609513 A NL7609513 A NL 7609513A NL 7609513 A NL7609513 A NL 7609513A NL 7609513 A NL7609513 A NL 7609513A
Authority
NL
Netherlands
Prior art keywords
light sensitive
manufacturing
well
printing plate
lithographic printing
Prior art date
Application number
NL7609513A
Other languages
Dutch (nl)
Original Assignee
Printing Dev Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Printing Dev Inc filed Critical Printing Dev Inc
Publication of NL7609513A publication Critical patent/NL7609513A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
NL7609513A 1975-09-02 1976-08-26 FOR LIGHT SENSITIVE RESIST COATING PREPARATION AND FOR LIGHT SENSITIVE PRODUCTION AS WELL AS A METHOD OF MANUFACTURING A LITHOGRAPHIC PRINTING PLATE. NL7609513A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60959075A 1975-09-02 1975-09-02

Publications (1)

Publication Number Publication Date
NL7609513A true NL7609513A (en) 1977-03-04

Family

ID=24441438

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7609513A NL7609513A (en) 1975-09-02 1976-08-26 FOR LIGHT SENSITIVE RESIST COATING PREPARATION AND FOR LIGHT SENSITIVE PRODUCTION AS WELL AS A METHOD OF MANUFACTURING A LITHOGRAPHIC PRINTING PLATE.

Country Status (7)

Country Link
JP (1) JPS5230504A (en)
BE (1) BE845675A (en)
DE (1) DE2639610A1 (en)
FR (1) FR2323170A1 (en)
LU (1) LU75706A1 (en)
NL (1) NL7609513A (en)
SE (1) SE7609640L (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5215857A (en) * 1985-08-07 1993-06-01 Japan Synthetic Rubber Co., Ltd. 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent
JPS62123444A (en) 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd Radiation sensitive resinous composition
JPH0721626B2 (en) * 1985-08-10 1995-03-08 日本合成ゴム株式会社 Resist composition for semiconductor fine processing
US5128230A (en) * 1986-12-23 1992-07-07 Shipley Company Inc. Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate
JPH0693115B2 (en) * 1988-10-18 1994-11-16 日本合成ゴム株式会社 Negative radiation-sensitive resin composition

Also Published As

Publication number Publication date
LU75706A1 (en) 1977-06-15
JPS5230504A (en) 1977-03-08
SE7609640L (en) 1977-03-03
FR2323170A1 (en) 1977-04-01
DE2639610A1 (en) 1977-03-03
BE845675A (en) 1976-12-16

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