JPS5230504A - Photoosensitive antiicorrosion film composition and photoosensitive product using same - Google Patents

Photoosensitive antiicorrosion film composition and photoosensitive product using same

Info

Publication number
JPS5230504A
JPS5230504A JP51104335A JP10433576A JPS5230504A JP S5230504 A JPS5230504 A JP S5230504A JP 51104335 A JP51104335 A JP 51104335A JP 10433576 A JP10433576 A JP 10433576A JP S5230504 A JPS5230504 A JP S5230504A
Authority
JP
Japan
Prior art keywords
photoosensitive
antiicorrosion
product
same
film composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP51104335A
Other languages
English (en)
Inventor
Ii Tabetsuto Jiyooji
Emu Razarasu Richiyaado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Printing Developments Inc
Original Assignee
Printing Developments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Printing Developments Inc filed Critical Printing Developments Inc
Publication of JPS5230504A publication Critical patent/JPS5230504A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
JP51104335A 1975-09-02 1976-09-02 Photoosensitive antiicorrosion film composition and photoosensitive product using same Pending JPS5230504A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60959075A 1975-09-02 1975-09-02

Publications (1)

Publication Number Publication Date
JPS5230504A true JPS5230504A (en) 1977-03-08

Family

ID=24441438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51104335A Pending JPS5230504A (en) 1975-09-02 1976-09-02 Photoosensitive antiicorrosion film composition and photoosensitive product using same

Country Status (7)

Country Link
JP (1) JPS5230504A (ja)
BE (1) BE845675A (ja)
DE (1) DE2639610A1 (ja)
FR (1) FR2323170A1 (ja)
LU (1) LU75706A1 (ja)
NL (1) NL7609513A (ja)
SE (1) SE7609640L (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6236657A (ja) * 1985-08-10 1987-02-17 Japan Synthetic Rubber Co Ltd 半導体微細加工用レジスト組成物
JPH01145649A (ja) * 1988-10-18 1989-06-07 Japan Synthetic Rubber Co Ltd ネガ型感放射線性樹脂組成物
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5215857A (en) * 1985-08-07 1993-06-01 Japan Synthetic Rubber Co., Ltd. 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent
US5128230A (en) * 1986-12-23 1992-07-07 Shipley Company Inc. Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US5494784A (en) * 1985-08-07 1996-02-27 Japan Synthetic Rubber Co., Ltd. Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent
US5925492A (en) * 1985-08-07 1999-07-20 Jsr Corporation Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent
US6228554B1 (en) 1985-08-07 2001-05-08 Jsr Corporation Radiation-sensitive resin composition
US6270939B1 (en) 1985-08-07 2001-08-07 Jsr Corporation Radiation-sensitive resin composition
JPS6236657A (ja) * 1985-08-10 1987-02-17 Japan Synthetic Rubber Co Ltd 半導体微細加工用レジスト組成物
JPH01145649A (ja) * 1988-10-18 1989-06-07 Japan Synthetic Rubber Co Ltd ネガ型感放射線性樹脂組成物

Also Published As

Publication number Publication date
BE845675A (fr) 1976-12-16
NL7609513A (nl) 1977-03-04
SE7609640L (sv) 1977-03-03
DE2639610A1 (de) 1977-03-03
LU75706A1 (ja) 1977-06-15
FR2323170A1 (fr) 1977-04-01

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