JPS5230504A - Photoosensitive antiicorrosion film composition and photoosensitive product using same - Google Patents
Photoosensitive antiicorrosion film composition and photoosensitive product using sameInfo
- Publication number
- JPS5230504A JPS5230504A JP51104335A JP10433576A JPS5230504A JP S5230504 A JPS5230504 A JP S5230504A JP 51104335 A JP51104335 A JP 51104335A JP 10433576 A JP10433576 A JP 10433576A JP S5230504 A JPS5230504 A JP S5230504A
- Authority
- JP
- Japan
- Prior art keywords
- photoosensitive
- antiicorrosion
- product
- same
- film composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US60959075A | 1975-09-02 | 1975-09-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5230504A true JPS5230504A (en) | 1977-03-08 |
Family
ID=24441438
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51104335A Pending JPS5230504A (en) | 1975-09-02 | 1976-09-02 | Photoosensitive antiicorrosion film composition and photoosensitive product using same |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS5230504A (ja) |
BE (1) | BE845675A (ja) |
DE (1) | DE2639610A1 (ja) |
FR (1) | FR2323170A1 (ja) |
LU (1) | LU75706A1 (ja) |
NL (1) | NL7609513A (ja) |
SE (1) | SE7609640L (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6236657A (ja) * | 1985-08-10 | 1987-02-17 | Japan Synthetic Rubber Co Ltd | 半導体微細加工用レジスト組成物 |
JPH01145649A (ja) * | 1988-10-18 | 1989-06-07 | Japan Synthetic Rubber Co Ltd | ネガ型感放射線性樹脂組成物 |
US5405720A (en) * | 1985-08-07 | 1995-04-11 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5215857A (en) * | 1985-08-07 | 1993-06-01 | Japan Synthetic Rubber Co., Ltd. | 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent |
US5128230A (en) * | 1986-12-23 | 1992-07-07 | Shipley Company Inc. | Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate |
-
1976
- 1976-08-26 NL NL7609513A patent/NL7609513A/xx unknown
- 1976-08-30 BE BE170210A patent/BE845675A/xx unknown
- 1976-08-31 FR FR7626286A patent/FR2323170A1/fr not_active Withdrawn
- 1976-09-01 SE SE7609640A patent/SE7609640L/xx unknown
- 1976-09-02 DE DE19762639610 patent/DE2639610A1/de active Pending
- 1976-09-02 JP JP51104335A patent/JPS5230504A/ja active Pending
- 1976-09-02 LU LU75706A patent/LU75706A1/xx unknown
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5405720A (en) * | 1985-08-07 | 1995-04-11 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent |
US5494784A (en) * | 1985-08-07 | 1996-02-27 | Japan Synthetic Rubber Co., Ltd. | Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent |
US5925492A (en) * | 1985-08-07 | 1999-07-20 | Jsr Corporation | Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent |
US6228554B1 (en) | 1985-08-07 | 2001-05-08 | Jsr Corporation | Radiation-sensitive resin composition |
US6270939B1 (en) | 1985-08-07 | 2001-08-07 | Jsr Corporation | Radiation-sensitive resin composition |
JPS6236657A (ja) * | 1985-08-10 | 1987-02-17 | Japan Synthetic Rubber Co Ltd | 半導体微細加工用レジスト組成物 |
JPH01145649A (ja) * | 1988-10-18 | 1989-06-07 | Japan Synthetic Rubber Co Ltd | ネガ型感放射線性樹脂組成物 |
Also Published As
Publication number | Publication date |
---|---|
BE845675A (fr) | 1976-12-16 |
NL7609513A (nl) | 1977-03-04 |
SE7609640L (sv) | 1977-03-03 |
DE2639610A1 (de) | 1977-03-03 |
LU75706A1 (ja) | 1977-06-15 |
FR2323170A1 (fr) | 1977-04-01 |
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