FR2244261A1 - Adjusting semiconductor discs relative to a mask - for subsequent exposure to radiation particularly X-rays - Google Patents

Adjusting semiconductor discs relative to a mask - for subsequent exposure to radiation particularly X-rays

Info

Publication number
FR2244261A1
FR2244261A1 FR7430737A FR7430737A FR2244261A1 FR 2244261 A1 FR2244261 A1 FR 2244261A1 FR 7430737 A FR7430737 A FR 7430737A FR 7430737 A FR7430737 A FR 7430737A FR 2244261 A1 FR2244261 A1 FR 2244261A1
Authority
FR
France
Prior art keywords
rays
mask
radiation
exposure
support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7430737A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19732346720 external-priority patent/DE2346720C3/en
Application filed by Siemens AG filed Critical Siemens AG
Publication of FR2244261A1 publication Critical patent/FR2244261A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Device for adjusting semiconductor discs with respect to a mask for exposure to radiation, consisting of masking structure arranged on a support, in order to produce structures in photosensitive coatings by means of exposure to X-rays, the adjustment being carried out by the reciprocal alignment of complementary adjusting masks on the radiation exposure mask and the semiconductor disc, and the masking structure consisting of a material strongly opaque to X-rays which the support for these structures is a matl. transparent to X-rays, incorporating the improvement whereby, a source of infra-red radiation and a receiver for this is provided, the frequency of the radiation used for the adjustment lying in a range for which the support matl. and the semiconductor are still transparent. Enable precision adjustment to be made without the need for costly X-ray equipment.
FR7430737A 1973-09-17 1974-09-11 Adjusting semiconductor discs relative to a mask - for subsequent exposure to radiation particularly X-rays Withdrawn FR2244261A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732346720 DE2346720C3 (en) 1973-09-17 Device for aligning semiconductor wafers with respect to an irradiation mask

Publications (1)

Publication Number Publication Date
FR2244261A1 true FR2244261A1 (en) 1975-04-11

Family

ID=5892800

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7430737A Withdrawn FR2244261A1 (en) 1973-09-17 1974-09-11 Adjusting semiconductor discs relative to a mask - for subsequent exposure to radiation particularly X-rays

Country Status (9)

Country Link
JP (1) JPS5057656A (en)
BE (1) BE820006A (en)
CH (1) CH572664A5 (en)
DK (1) DK481574A (en)
FR (1) FR2244261A1 (en)
IT (1) IT1021303B (en)
LU (1) LU70922A1 (en)
NL (1) NL7412033A (en)
SE (1) SE7411634L (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2483641A1 (en) * 1980-06-02 1981-12-04 Zeiss Jena Veb Carl OPTICAL MOUNTING FOR LITHOPHOTOGRAPHIC PROJECTION DEVICES

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5267570A (en) * 1975-12-03 1977-06-04 Hitachi Ltd Pattern printing device
JPS5313879A (en) * 1976-07-23 1978-02-07 Nec Corp Silicon mask for x-ray exposure and its production
DE2942990A1 (en) * 1979-10-24 1981-05-07 Siemens AG, 1000 Berlin und 8000 München Automatic adjusting method for two structures in parallel planes - using sensors and markings on opposite planes to detect correspondence
GB2089524B (en) * 1980-12-17 1984-12-05 Westinghouse Electric Corp High resolution lithographic process
JPS61111535A (en) * 1985-09-30 1986-05-29 Chiyou Lsi Gijutsu Kenkyu Kumiai X-ray exposure method
JPS61111534A (en) * 1985-09-30 1986-05-29 Chiyou Lsi Gijutsu Kenkyu Kumiai X-ray exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2483641A1 (en) * 1980-06-02 1981-12-04 Zeiss Jena Veb Carl OPTICAL MOUNTING FOR LITHOPHOTOGRAPHIC PROJECTION DEVICES

Also Published As

Publication number Publication date
CH572664A5 (en) 1976-02-13
LU70922A1 (en) 1975-02-24
JPS5057656A (en) 1975-05-20
NL7412033A (en) 1975-03-19
DE2346720B2 (en) 1975-07-17
DK481574A (en) 1975-06-02
SE7411634L (en) 1975-03-18
BE820006A (en) 1975-01-16
DE2346720A1 (en) 1975-04-03
IT1021303B (en) 1978-01-30

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Legal Events

Date Code Title Description
ST Notification of lapse