IT1021303B - DEVICE FOR ADJUSTING SHEETS OF SEMICONDUCTOR MATERIAL WITH RESPECT TO A RADIATION MASK TO PRODUCE A STRUCTURE IN PHOTOVOLTIES WITH EXPOSURE TO RAG GI - Google Patents

DEVICE FOR ADJUSTING SHEETS OF SEMICONDUCTOR MATERIAL WITH RESPECT TO A RADIATION MASK TO PRODUCE A STRUCTURE IN PHOTOVOLTIES WITH EXPOSURE TO RAG GI

Info

Publication number
IT1021303B
IT1021303B IT27200/74A IT2720074A IT1021303B IT 1021303 B IT1021303 B IT 1021303B IT 27200/74 A IT27200/74 A IT 27200/74A IT 2720074 A IT2720074 A IT 2720074A IT 1021303 B IT1021303 B IT 1021303B
Authority
IT
Italy
Prior art keywords
photovolties
rag
exposure
produce
respect
Prior art date
Application number
IT27200/74A
Other languages
Italian (it)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19732346720 external-priority patent/DE2346720C3/en
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT1021303B publication Critical patent/IT1021303B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
IT27200/74A 1973-09-17 1974-09-12 DEVICE FOR ADJUSTING SHEETS OF SEMICONDUCTOR MATERIAL WITH RESPECT TO A RADIATION MASK TO PRODUCE A STRUCTURE IN PHOTOVOLTIES WITH EXPOSURE TO RAG GI IT1021303B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732346720 DE2346720C3 (en) 1973-09-17 Device for aligning semiconductor wafers with respect to an irradiation mask

Publications (1)

Publication Number Publication Date
IT1021303B true IT1021303B (en) 1978-01-30

Family

ID=5892800

Family Applications (1)

Application Number Title Priority Date Filing Date
IT27200/74A IT1021303B (en) 1973-09-17 1974-09-12 DEVICE FOR ADJUSTING SHEETS OF SEMICONDUCTOR MATERIAL WITH RESPECT TO A RADIATION MASK TO PRODUCE A STRUCTURE IN PHOTOVOLTIES WITH EXPOSURE TO RAG GI

Country Status (9)

Country Link
JP (1) JPS5057656A (en)
BE (1) BE820006A (en)
CH (1) CH572664A5 (en)
DK (1) DK481574A (en)
FR (1) FR2244261A1 (en)
IT (1) IT1021303B (en)
LU (1) LU70922A1 (en)
NL (1) NL7412033A (en)
SE (1) SE7411634L (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5267570A (en) * 1975-12-03 1977-06-04 Hitachi Ltd Pattern printing device
JPS5313879A (en) * 1976-07-23 1978-02-07 Nec Corp Silicon mask for x-ray exposure and its production
DE2942990A1 (en) * 1979-10-24 1981-05-07 Siemens AG, 1000 Berlin und 8000 München Automatic adjusting method for two structures in parallel planes - using sensors and markings on opposite planes to detect correspondence
DD151231A1 (en) * 1980-06-02 1981-10-08 Dietmar Klingenfeld OPTICAL ARRANGEMENT FOR PROJECTION SLITHOGRAPHIC EQUIPMENT
GB2089524B (en) * 1980-12-17 1984-12-05 Westinghouse Electric Corp High resolution lithographic process
JPS61111534A (en) * 1985-09-30 1986-05-29 Chiyou Lsi Gijutsu Kenkyu Kumiai X-ray exposure device
JPS61111535A (en) * 1985-09-30 1986-05-29 Chiyou Lsi Gijutsu Kenkyu Kumiai X-ray exposure method

Also Published As

Publication number Publication date
BE820006A (en) 1975-01-16
FR2244261A1 (en) 1975-04-11
JPS5057656A (en) 1975-05-20
DE2346720B2 (en) 1975-07-17
DK481574A (en) 1975-06-02
DE2346720A1 (en) 1975-04-03
SE7411634L (en) 1975-03-18
NL7412033A (en) 1975-03-19
LU70922A1 (en) 1975-02-24
CH572664A5 (en) 1976-02-13

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