FR2217805A1 - Semiconductor photocathode for near-infrared radiation - comprising transparent gallium-aluminium arsenide layer and electron-emitting gallium-indium arsenide layer - Google Patents
Semiconductor photocathode for near-infrared radiation - comprising transparent gallium-aluminium arsenide layer and electron-emitting gallium-indium arsenide layerInfo
- Publication number
- FR2217805A1 FR2217805A1 FR7305050A FR7305050A FR2217805A1 FR 2217805 A1 FR2217805 A1 FR 2217805A1 FR 7305050 A FR7305050 A FR 7305050A FR 7305050 A FR7305050 A FR 7305050A FR 2217805 A1 FR2217805 A1 FR 2217805A1
- Authority
- FR
- France
- Prior art keywords
- arsenide layer
- gallium
- infrared radiation
- substrate
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30612—Etching of AIIIBV compounds
- H01L21/30621—Vapour phase etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/34—Photo-emissive cathodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02387—Group 13/15 materials
- H01L21/02395—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02546—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/34—Photoemissive electrodes
- H01J2201/342—Cathodes
- H01J2201/3421—Composition of the emitting surface
- H01J2201/3423—Semiconductors, e.g. GaAs, NEA emitters
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
Abstract
Photocathode for near-infrared radiation comprises a relatively thick substrate (10-500 mu) having the general formula Ga1-yAlyAs (0.4 y 1) and a thin layer 0.5-10 mu) epitaxially grown on the substrate consisting of a p-doped cpd. having the formula Ga1-xInxAs (0 x 0.5), which is pref. coated with a mono-atomic layer of an alkali metal or its cpd. to facilitate electron emission. The substrate is sufficiently thick to ensure mechanical strength. On the other hand, the substrate transmits a considerable part of photons falling thereon so that a sufficiently copious electron emission takes place.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7305050A FR2217805A1 (en) | 1973-02-13 | 1973-02-13 | Semiconductor photocathode for near-infrared radiation - comprising transparent gallium-aluminium arsenide layer and electron-emitting gallium-indium arsenide layer |
DE19742405611 DE2405611A1 (en) | 1973-02-13 | 1974-02-06 | TRANSPARENT SEMI-CONDUCTOR PHOTOCATHOD FOR RADIATION IN THE NEAR INFRARED RANGE AND PROCESS FOR PRODUCING SUCH A CATHOD |
JP1591274A JPS49114869A (en) | 1973-02-13 | 1974-02-09 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7305050A FR2217805A1 (en) | 1973-02-13 | 1973-02-13 | Semiconductor photocathode for near-infrared radiation - comprising transparent gallium-aluminium arsenide layer and electron-emitting gallium-indium arsenide layer |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2217805A1 true FR2217805A1 (en) | 1974-09-06 |
FR2217805B1 FR2217805B1 (en) | 1979-01-26 |
Family
ID=9114768
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7305050A Granted FR2217805A1 (en) | 1973-02-13 | 1973-02-13 | Semiconductor photocathode for near-infrared radiation - comprising transparent gallium-aluminium arsenide layer and electron-emitting gallium-indium arsenide layer |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS49114869A (en) |
DE (1) | DE2405611A1 (en) |
FR (1) | FR2217805A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4352117A (en) * | 1980-06-02 | 1982-09-28 | International Business Machines Corporation | Electron source |
JPH0371528A (en) * | 1989-08-10 | 1991-03-27 | Hamamatsu Photonics Kk | Semiconductor photoelectric surface structure |
JPH1196896A (en) * | 1997-09-24 | 1999-04-09 | Hamamatsu Photonics Kk | Semiconductor photoelectric surface |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1239893A (en) * | 1970-03-05 | 1971-07-21 | Standard Telephones Cables Ltd | Improvements in or relating to photocathodes |
-
1973
- 1973-02-13 FR FR7305050A patent/FR2217805A1/en active Granted
-
1974
- 1974-02-06 DE DE19742405611 patent/DE2405611A1/en active Pending
- 1974-02-09 JP JP1591274A patent/JPS49114869A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1239893A (en) * | 1970-03-05 | 1971-07-21 | Standard Telephones Cables Ltd | Improvements in or relating to photocathodes |
Also Published As
Publication number | Publication date |
---|---|
FR2217805B1 (en) | 1979-01-26 |
JPS49114869A (en) | 1974-11-01 |
DE2405611A1 (en) | 1974-08-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |