FR2191764A5 - - Google Patents

Info

Publication number
FR2191764A5
FR2191764A5 FR7323747A FR7323747A FR2191764A5 FR 2191764 A5 FR2191764 A5 FR 2191764A5 FR 7323747 A FR7323747 A FR 7323747A FR 7323747 A FR7323747 A FR 7323747A FR 2191764 A5 FR2191764 A5 FR 2191764A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7323747A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Massachusetts Institute of Technology
Original Assignee
Massachusetts Institute of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Massachusetts Institute of Technology filed Critical Massachusetts Institute of Technology
Application granted granted Critical
Publication of FR2191764A5 publication Critical patent/FR2191764A5/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/167—X-ray
    • Y10S430/168—X-ray exposure process

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
  • Radiography Using Non-Light Waves (AREA)
  • X-Ray Techniques (AREA)
FR7323747A 1972-06-29 1973-06-28 Expired FR2191764A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26766772A 1972-06-29 1972-06-29

Publications (1)

Publication Number Publication Date
FR2191764A5 true FR2191764A5 (fr) 1974-02-01

Family

ID=23019704

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7323747A Expired FR2191764A5 (fr) 1972-06-29 1973-06-28

Country Status (3)

Country Link
US (1) US3742229A (fr)
JP (1) JPS5142470B2 (fr)
FR (1) FR2191764A5 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2350628A1 (fr) * 1976-05-03 1977-12-02 Hughes Aircraft Co Procede d'alignement d'un cache a l'aide de reperes

Families Citing this family (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3874916A (en) * 1972-06-23 1975-04-01 Radiant Energy Systems Mask alignment system for electron beam pattern generator
US4050817A (en) * 1973-05-03 1977-09-27 Nippon Kogaku K.K. Manufacture of multi-layer structures
GB1473301A (en) * 1973-05-03 1977-05-11 Nippon Kogaku Kk Manufacture of multi-layer structures
JPS5253462Y2 (fr) * 1974-03-18 1977-12-05
US3947687A (en) * 1974-10-23 1976-03-30 The United States Of America As Represented By The Secretary Of The Air Force Collimated x-ray source for x-ray lithographic system
US3984244A (en) * 1974-11-27 1976-10-05 E. I. Du Pont De Nemours And Company Process for laminating a channeled photosensitive layer on an irregular surface
JPS5192178A (fr) * 1975-02-10 1976-08-12
JPS51120180A (en) * 1975-04-15 1976-10-21 Nippon Telegr & Teleph Corp <Ntt> Pattern printing device
US3984680A (en) * 1975-10-14 1976-10-05 Massachusetts Institute Of Technology Soft X-ray mask alignment system
DE2604939C3 (de) * 1976-02-09 1978-07-27 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Herstellen von wenigstens einem Durchgangsloch insbesondere einer Düse für Tintenstrahldrucker
JPS52112280A (en) * 1976-03-17 1977-09-20 Mitsubishi Electric Corp X-ray exposure mask
JPS52136577A (en) * 1976-05-11 1977-11-15 Nippon Chemical Ind Aligning device
DE2635275C2 (de) * 1976-08-05 1984-09-06 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Justierung eines scheibenförmigen Substrates relativ zu einer Fotomaske in einem Röntgenstrahlbelichtungsgerät
US4131472A (en) * 1976-09-15 1978-12-26 Align-Rite Corporation Method for increasing the yield of batch processed microcircuit semiconductor devices
JPS5342678A (en) * 1976-09-30 1978-04-18 Nippon Telegr & Teleph Corp <Ntt> X-ray exposure method
JPS5350680A (en) * 1976-10-19 1978-05-09 Nec Corp Transfer mask for x-ray exposure and its production
US4134066A (en) * 1977-03-24 1979-01-09 International Business Machines Corporation Wafer indexing system using a grid pattern and coding and orientation marks in each grid cell
US4200395A (en) * 1977-05-03 1980-04-29 Massachusetts Institute Of Technology Alignment of diffraction gratings
DE2722958A1 (de) * 1977-05-20 1978-11-23 Siemens Ag Verfahren zur justierung einer halbleiterscheibe relativ zu einer bestrahlungsmaske bei der roentgenstrahl-fotolithografie
DE2723902C2 (de) * 1977-05-26 1983-12-08 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Parallelausrichtung und Justierung der Lage einer Halbleiterscheibe relativ zu einer Bestrahlungsmaske bei der Röntgenstrahl-Fotolithografie
US4215192A (en) * 1978-01-16 1980-07-29 The Perkin-Elmer Corporation X-ray lithography apparatus and method of use
US4342917A (en) * 1978-01-16 1982-08-03 The Perkin-Elmer Corporation X-ray lithography apparatus and method of use
USRE33992E (en) * 1978-08-15 1992-07-14 The United States Of America As Represented By The Secretary Of The Navy Pulsed X-ray lithography
US4184078A (en) * 1978-08-15 1980-01-15 The United States Of America As Represented By The Secretary Of The Navy Pulsed X-ray lithography
US4171489A (en) * 1978-09-13 1979-10-16 Bell Telephone Laboratories, Incorporated Radiation mask structure
DE2841124C2 (de) * 1978-09-21 1984-09-13 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Herstellen von elektronischen Halbleiterbauelementen durch Röntgen-Lithographie
JPS55113330A (en) * 1979-02-23 1980-09-01 Chiyou Lsi Gijutsu Kenkyu Kumiai X-ray exposure system and device
US4260670A (en) * 1979-07-12 1981-04-07 Western Electric Company, Inc. X-ray mask
US4301237A (en) * 1979-07-12 1981-11-17 Western Electric Co., Inc. Method for exposing substrates to X-rays
US4246054A (en) * 1979-11-13 1981-01-20 The Perkin-Elmer Corporation Polymer membranes for X-ray masks
GB2066487B (en) * 1979-12-18 1983-11-23 Philips Electronic Associated Alignment of exposure masks
US4335313A (en) * 1980-05-12 1982-06-15 The Perkin-Elmer Corporation Method and apparatus for aligning an opaque mask with an integrated circuit wafer
DE3118802A1 (de) * 1980-05-14 1982-02-25 Canon K.K., Tokyo Druckuebertragungsgeraet
US4357540A (en) * 1980-12-19 1982-11-02 International Business Machines Corporation Semiconductor device array mask inspection method and apparatus
US4343878A (en) * 1981-01-02 1982-08-10 Amdahl Corporation System for providing photomask alignment keys in semiconductor integrated circuit processing
FR2514195A1 (fr) * 1981-10-05 1983-04-08 Merlin Gerin Disjoncteur multipolaire a bloc declencheur amovible
US4477921A (en) * 1981-11-27 1984-10-16 Spire Corporation X-Ray lithography source tube
JPS5968928A (ja) * 1982-10-13 1984-04-19 Pioneer Electronic Corp 半導体装置の製造方法
US4576832A (en) * 1982-12-30 1986-03-18 International Business Machines Corporation Self-aligning mask
US4760265A (en) * 1986-01-18 1988-07-26 Kabushiki Kaisha Toyoda Jidoshokki Seisakusho Method and device for detecting defects of patterns in microelectronic devices
JPH0746681B2 (ja) * 1986-10-28 1995-05-17 富士通株式会社 Ｘ線ステッパー用マスクの製造方法
US4926452A (en) * 1987-10-30 1990-05-15 Four Pi Systems Corporation Automated laminography system for inspection of electronics
US5097492A (en) * 1987-10-30 1992-03-17 Four Pi Systems Corporation Automated laminography system for inspection of electronics
US5081656A (en) * 1987-10-30 1992-01-14 Four Pi Systems Corporation Automated laminography system for inspection of electronics
US5561696A (en) * 1987-10-30 1996-10-01 Hewlett-Packard Company Method and apparatus for inspecting electrical connections
US5621811A (en) * 1987-10-30 1997-04-15 Hewlett-Packard Co. Learning method and apparatus for detecting and controlling solder defects
US5262257A (en) * 1989-07-13 1993-11-16 Canon Kabushiki Kaisha Mask for lithography
JPH03248414A (ja) * 1990-02-26 1991-11-06 Mitsubishi Electric Corp 選択的な表面反応を利用した微細パターンの形成方法
US5259012A (en) * 1990-08-30 1993-11-02 Four Pi Systems Corporation Laminography system and method with electromagnetically directed multipath radiation source
US5124561A (en) * 1991-04-04 1992-06-23 International Business Machines Corporation Process for X-ray mask warpage reduction
US5382483A (en) * 1992-01-13 1995-01-17 International Business Machines Corporation Self-aligned phase-shifting mask
JPH0815854A (ja) * 1994-06-30 1996-01-19 Fujitsu Ltd 半導体装置の製造方法
US5583904A (en) * 1995-04-11 1996-12-10 Hewlett-Packard Co. Continuous linear scan laminography system and method
US5687209A (en) * 1995-04-11 1997-11-11 Hewlett-Packard Co. Automatic warp compensation for laminographic circuit board inspection
US5570405A (en) * 1995-06-06 1996-10-29 International Business Machines Corporation Registration and alignment technique for X-ray mask fabrication
US20040137734A1 (en) * 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
US7758794B2 (en) * 2001-10-29 2010-07-20 Princeton University Method of making an article comprising nanoscale patterns with reduced edge roughness
US6309580B1 (en) * 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US7141450B2 (en) * 2002-04-08 2006-11-28 Lucent Technologies Inc. Flip-chip alignment method
JP2006259143A (ja) * 2005-03-16 2006-09-28 Fuji Xerox Co Ltd 配置装置及び方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3113896A (en) * 1961-01-31 1963-12-10 Space Technology Lab Inc Electron beam masking for etching electrical circuits
US3447924A (en) * 1965-08-16 1969-06-03 Charles J Trzyna Aligning method
US3521058A (en) * 1965-09-08 1970-07-21 Georg S Mittelstaedt Method of improving the definition of detail of both hard and soft substance in radiographs
US3637380A (en) * 1967-06-26 1972-01-25 Teeg Research Inc Methods for electrochemically making metallic patterns by means of radiation-sensitive elements

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2350628A1 (fr) * 1976-05-03 1977-12-02 Hughes Aircraft Co Procede d'alignement d'un cache a l'aide de reperes

Also Published As

Publication number Publication date
DE2333902A1 (de) 1974-01-17
JPS4959576A (fr) 1974-06-10
JPS5142470B2 (fr) 1976-11-16
DE2333902B2 (de) 1976-02-05
US3742229A (en) 1973-06-26

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