JPS52136577A - Aligning device - Google Patents

Aligning device

Info

Publication number
JPS52136577A
JPS52136577A JP5281876A JP5281876A JPS52136577A JP S52136577 A JPS52136577 A JP S52136577A JP 5281876 A JP5281876 A JP 5281876A JP 5281876 A JP5281876 A JP 5281876A JP S52136577 A JPS52136577 A JP S52136577A
Authority
JP
Japan
Prior art keywords
aligning device
aligning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5281876A
Other languages
Japanese (ja)
Other versions
JPS5546053B2 (en
Inventor
Shinya Shinoyama
Kiwao Nakazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP5281876A priority Critical patent/JPS52136577A/en
Publication of JPS52136577A publication Critical patent/JPS52136577A/en
Publication of JPS5546053B2 publication Critical patent/JPS5546053B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP5281876A 1976-05-11 1976-05-11 Aligning device Granted JPS52136577A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5281876A JPS52136577A (en) 1976-05-11 1976-05-11 Aligning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5281876A JPS52136577A (en) 1976-05-11 1976-05-11 Aligning device

Publications (2)

Publication Number Publication Date
JPS52136577A true JPS52136577A (en) 1977-11-15
JPS5546053B2 JPS5546053B2 (en) 1980-11-21

Family

ID=12925411

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5281876A Granted JPS52136577A (en) 1976-05-11 1976-05-11 Aligning device

Country Status (1)

Country Link
JP (1) JPS52136577A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54145478A (en) * 1978-05-04 1979-11-13 Nippon Telegr & Teleph Corp <Ntt> Relative positioning method for wafer and exposure mask
JPS5729139U (en) * 1981-04-30 1982-02-16
JPS62115164A (en) * 1985-11-14 1987-05-26 Hitachi Ltd Method and device for forming pattern
JP2007512694A (en) * 2003-11-28 2007-05-17 ズス・マイクロテック・リソグラフィ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング Direct alignment in mask position adjuster
JP2010093217A (en) * 2008-10-03 2010-04-22 National Chiao Tung Univ Liquid immersion inclined lithography apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4959576A (en) * 1972-06-29 1974-06-10
JPS5057778A (en) * 1973-09-17 1975-05-20

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4959576A (en) * 1972-06-29 1974-06-10
JPS5057778A (en) * 1973-09-17 1975-05-20

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54145478A (en) * 1978-05-04 1979-11-13 Nippon Telegr & Teleph Corp <Ntt> Relative positioning method for wafer and exposure mask
JPS5729139U (en) * 1981-04-30 1982-02-16
JPS62115164A (en) * 1985-11-14 1987-05-26 Hitachi Ltd Method and device for forming pattern
JP2007512694A (en) * 2003-11-28 2007-05-17 ズス・マイクロテック・リソグラフィ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング Direct alignment in mask position adjuster
JP2010093217A (en) * 2008-10-03 2010-04-22 National Chiao Tung Univ Liquid immersion inclined lithography apparatus

Also Published As

Publication number Publication date
JPS5546053B2 (en) 1980-11-21

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