JPS62115164A - Method and device for forming pattern - Google Patents

Method and device for forming pattern

Info

Publication number
JPS62115164A
JPS62115164A JP25368685A JP25368685A JPS62115164A JP S62115164 A JPS62115164 A JP S62115164A JP 25368685 A JP25368685 A JP 25368685A JP 25368685 A JP25368685 A JP 25368685A JP S62115164 A JPS62115164 A JP S62115164A
Authority
JP
Japan
Prior art keywords
pattern
wafer
transfer
side opposite
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25368685A
Other languages
Japanese (ja)
Inventor
Shigeo Moriyama
Toshishige Kurosaki
Tsuneo Terasawa
Shinji Okazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP25368685A priority Critical patent/JPS62115164A/en
Priority claimed from US06/927,939 external-priority patent/US4798470A/en
Publication of JPS62115164A publication Critical patent/JPS62115164A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026Focusing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073Alignment marks and their environment
    • G03F9/7076Mark details, e.g. phase grating mark, temporary mark
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073Alignment marks and their environment
    • G03F9/7084Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels

Abstract

PURPOSE:To obtain always high positioning accuracy and to eliminate the need for moving a detecting means to the outside of an exposing range at every transfer of a pattern by detecting the prescribed reference marks provided on the surface of a wafer on the side opposite from the surface on which the pattern is formed, then transferring the pattern. CONSTITUTION:The reference marks 7a, 7b consisting of recesses are provided on the surface of the wafer 1 on the side opposite from the surface on which the pattern 2 is formed. The patterns 7a, 7b are detected by the pattern detector 8 via a lens and a driving device 20 is controlled in accordance with the information of such mark positions to move a stage 6, thereby positioning the wafer at the central position of the marks 7a, 7b. The circuit pattern drawn on a reticle 4 is transferred by a reducing lens 5 onto the wafer 1. The high positioning accuracy is thereby obtd. and the need for moving the detector 8 to the outside of the exposing optical path at every transfer of the pattern is eliminated.
JP25368685A 1985-11-14 1985-11-14 Method and device for forming pattern Pending JPS62115164A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25368685A JPS62115164A (en) 1985-11-14 1985-11-14 Method and device for forming pattern

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP25368685A JPS62115164A (en) 1985-11-14 1985-11-14 Method and device for forming pattern
US06/927,939 US4798470A (en) 1985-11-14 1986-11-07 Pattern printing method and apparatus

Publications (1)

Publication Number Publication Date
JPS62115164A true JPS62115164A (en) 1987-05-26

Family

ID=17254735

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25368685A Pending JPS62115164A (en) 1985-11-14 1985-11-14 Method and device for forming pattern

Country Status (1)

Country Link
JP (1) JPS62115164A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002361892A (en) * 2001-06-13 2002-12-18 Ricoh Co Ltd Ink supply unit, recording head and ink jet recorder
KR100579603B1 (en) * 2001-01-15 2006-05-12 에이에스엠엘 네델란즈 비.브이. Lithographic Apparatus

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5271985A (en) * 1975-12-08 1977-06-15 Siemens Ag Apparatus for making iluminating pattern for specimen
JPS52136577A (en) * 1976-05-11 1977-11-15 Nippon Chemical Ind Aligning device
JPS5491183A (en) * 1977-12-28 1979-07-19 Fujitsu Ltd Production of semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5271985A (en) * 1975-12-08 1977-06-15 Siemens Ag Apparatus for making iluminating pattern for specimen
JPS52136577A (en) * 1976-05-11 1977-11-15 Nippon Chemical Ind Aligning device
JPS5491183A (en) * 1977-12-28 1979-07-19 Fujitsu Ltd Production of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100579603B1 (en) * 2001-01-15 2006-05-12 에이에스엠엘 네델란즈 비.브이. Lithographic Apparatus
JP2002361892A (en) * 2001-06-13 2002-12-18 Ricoh Co Ltd Ink supply unit, recording head and ink jet recorder

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