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1975-05-15 |
1977-06-28 |
Raytheon Company |
Integrated circuit fusing technique
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JPS5267532A
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1975-12-03 |
1977-06-04 |
Nippon Telegr & Teleph Corp <Ntt> |
Semiconductor memory unit
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JPS5272541A
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1975-12-15 |
1977-06-17 |
Fujitsu Ltd |
Semi-conductor memory
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1976-03-01 |
1977-08-16 |
Advanced Micro Devices, Inc. |
Platinum silicide fuse links for integrated circuit devices
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1976-06-04 |
1977-12-15 |
Bosch Gmbh Robert |
Anordnung zum auftrennen von leiterbahnen auf integrierten schaltkreisen
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1976-12-13 |
1979-01-02 |
General Motors Corporation |
Integrated circuit process compatible surge protection resistor
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1977-09-30 |
1982-11-16 |
Michel Moussie |
Programmable read only memory cell
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JPS607388B2
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1978-09-08 |
1985-02-23 |
富士通株式会社 |
半導体記憶装置
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1978-10-20 |
1980-03-04 |
Harris Semiconductor |
CMOS-bipolar EAROM
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1979-04-19 |
1980-12-09 |
National Semiconductor Corporation |
Laser programmable read only memory
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JPS5847596Y2
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1979-09-05 |
1983-10-29 |
富士通株式会社 |
半導体装置
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1979-10-01 |
1985-09-05 |
Hitachi, Ltd., Tokio/Tokyo |
Integrierte Halbleiterschaltung und Schaltkreisaktivierverfahren
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JPS5685934A
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1979-12-14 |
1981-07-13 |
Nippon Telegr & Teleph Corp <Ntt> |
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1980-04-24 |
1984-10-09 |
Tokyo Shibaura Denki Kabushiki Kaisha |
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JPS5834945B2
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1980-06-02 |
1983-07-29 |
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JPS5720463A
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1980-07-14 |
1982-02-02 |
Toshiba Corp |
Semiconductor memory device
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JPS5763854A
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1980-10-07 |
1982-04-17 |
Toshiba Corp |
Semiconductor device
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JPS57134962A
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1981-02-13 |
1982-08-20 |
Toshiba Corp |
Semiconductor memory and manufacture of the same
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JPS5846174B2
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1981-03-03 |
1983-10-14 |
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JPS58170A
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1981-06-24 |
1983-01-05 |
Mitsubishi Electric Corp |
半導体装置
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1981-09-28 |
1983-09-13 |
Harris Corporation |
Method of fabricating a vertical fuse utilizing epitaxial deposition and special masking
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1981-09-30 |
1984-02-14 |
Monolithic Memories, Incorporated |
High speed PROM device
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JPS5856355A
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1981-09-30 |
1983-04-04 |
Hitachi Ltd |
半導体集積回路装置
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1981-10-09 |
1987-09-17 |
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1981-10-28 |
1989-03-21 |
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1981-11-12 |
1985-05-21 |
Advanced Micro Devices, Inc. |
Merged platinum silicide fuse and Schottky diode and method of manufacture thereof
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1982-03-09 |
1983-09-12 |
Toshiba Corp |
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1982-05-12 |
1988-07-27 |
Kabushiki Kaisha Toshiba |
Semiconductor device capable of structural selection
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1982-12-09 |
1984-06-18 |
Toshiba Corp |
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1983-09-19 |
1984-06-12 |
Harris Corporation |
Controlled thermal-oxidation thinning of polycrystalline silicon
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JPS6065545A
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1983-09-21 |
1985-04-15 |
Hitachi Micro Comput Eng Ltd |
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1983-12-15 |
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1987-11-06 |
1997-07-02 |
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1988-06-28 |
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1988-12-29 |
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1989-06-30 |
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1989-09-07 |
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1994-06-10 |
1997-04-22 |
International Business Machines Corporation |
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JPH08222710A
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1995-02-17 |
1996-08-30 |
Mitsubishi Electric Corp |
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1995-04-24 |
1996-05-28 |
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Sidewall formation process for a top lead fuse
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1996-12-24 |
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1996-12-27 |
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1998-05-29 |
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1998-05-29 |
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1998-11-05 |
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Fuse for use in a semiconductor device
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1999-04-20 |
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2009-06-23 |
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Non volatile memory RAD-hard (NVM-rh) system
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半導体装置
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