FR2154293A1 - Sputtering thin films - to produce homogeneous coatings on cylindrical articles - Google Patents
Sputtering thin films - to produce homogeneous coatings on cylindrical articlesInfo
- Publication number
- FR2154293A1 FR2154293A1 FR7134685A FR7134685A FR2154293A1 FR 2154293 A1 FR2154293 A1 FR 2154293A1 FR 7134685 A FR7134685 A FR 7134685A FR 7134685 A FR7134685 A FR 7134685A FR 2154293 A1 FR2154293 A1 FR 2154293A1
- Authority
- FR
- France
- Prior art keywords
- article
- thin films
- cathode
- cylindrical articles
- produce homogeneous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004544 sputter deposition Methods 0.000 title abstract 2
- 238000000576 coating method Methods 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7134685A FR2154293A1 (en) | 1971-09-27 | 1971-09-27 | Sputtering thin films - to produce homogeneous coatings on cylindrical articles |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7134685A FR2154293A1 (en) | 1971-09-27 | 1971-09-27 | Sputtering thin films - to produce homogeneous coatings on cylindrical articles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2154293A1 true FR2154293A1 (en) | 1973-05-11 |
| FR2154293B1 FR2154293B1 (enExample) | 1974-05-31 |
Family
ID=9083509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7134685A Granted FR2154293A1 (en) | 1971-09-27 | 1971-09-27 | Sputtering thin films - to produce homogeneous coatings on cylindrical articles |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2154293A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2533398A1 (fr) * | 1982-09-17 | 1984-03-23 | Kljuchko Gennady | Dispositif a plasma d'arc pour l'obtention des revetements |
-
1971
- 1971-09-27 FR FR7134685A patent/FR2154293A1/fr active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2533398A1 (fr) * | 1982-09-17 | 1984-03-23 | Kljuchko Gennady | Dispositif a plasma d'arc pour l'obtention des revetements |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2154293B1 (enExample) | 1974-05-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |