FR2118411A5 - Cathode and target for high frequency sputtering - using parallel plate dielectric targets - Google Patents

Cathode and target for high frequency sputtering - using parallel plate dielectric targets

Info

Publication number
FR2118411A5
FR2118411A5 FR7047130A FR7047130A FR2118411A5 FR 2118411 A5 FR2118411 A5 FR 2118411A5 FR 7047130 A FR7047130 A FR 7047130A FR 7047130 A FR7047130 A FR 7047130A FR 2118411 A5 FR2118411 A5 FR 2118411A5
Authority
FR
France
Prior art keywords
cathode
target
high frequency
parallel plate
frequency sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7047130A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Priority to FR7047130A priority Critical patent/FR2118411A5/en
Application granted granted Critical
Publication of FR2118411A5 publication Critical patent/FR2118411A5/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

H.F. sputtering appts is a partially evacuated chamber contg. an anode (I) and a target (II) sepd. from but partially parallel with (I). A cathode (III) is sepd. from (II) which shields (III) from (I), and H.F. a.c. current is applied between (III) and (I), and transfer means pass power from (III) to (II) to sputter a material onto the pref. dielectric (II).
FR7047130A 1970-12-17 1970-12-17 Cathode and target for high frequency sputtering - using parallel plate dielectric targets Expired FR2118411A5 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7047130A FR2118411A5 (en) 1970-12-17 1970-12-17 Cathode and target for high frequency sputtering - using parallel plate dielectric targets

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7047130A FR2118411A5 (en) 1970-12-17 1970-12-17 Cathode and target for high frequency sputtering - using parallel plate dielectric targets

Publications (1)

Publication Number Publication Date
FR2118411A5 true FR2118411A5 (en) 1972-07-28

Family

ID=9066517

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7047130A Expired FR2118411A5 (en) 1970-12-17 1970-12-17 Cathode and target for high frequency sputtering - using parallel plate dielectric targets

Country Status (1)

Country Link
FR (1) FR2118411A5 (en)

Similar Documents

Publication Publication Date Title
GB1420061A (en) Sputtering method and apparatus
AU557135B2 (en) Magnetron cathode sputtering system
GB1465745A (en) Sputtering apparatus
US3562142A (en) R.f.sputter plating method and apparatus employing control of ion and electron bombardment of the plating
GB1405489A (en) Sputtering apparatus
GB1257015A (en)
FR2118411A5 (en) Cathode and target for high frequency sputtering - using parallel plate dielectric targets
JPS57194254A (en) Cathode for insulator target in rf sputtering
GB1021776A (en)
GB1500095A (en) Ion source using a hollow cathode discharge arrangement and a particle accelerator comprising such a source
JPS5558371A (en) Sputtering apparatus
JPS5585671A (en) Sputtering apparatus
GB1366567A (en) Microwawe oven apparatus
FR2183557A1 (en) Cathodic sputtering appts - with number of chambers for simultaneous treatment of several substrates
JPS551062A (en) Electric field-radiation electronic gun
CA940996A (en) Electron gun having a segmented anode electrode
GB1383189A (en) Apparatus for the vacuum deposition of thin layers
GB1169747A (en) Improvements in or relating to Sputtering Apparatus
GB1368454A (en) Electrets
GB1228207A (en)
GB1284224A (en) Radio frequency sputtering apparatus
GB1308243A (en) Radio frequency sputter apparatus
GB1213498A (en) Getter-ion pump
ES302594A1 (en) Procedure and apparatus for the cathodic deposition. (Machine-translation by Google Translate, not legally binding)
GB1325520A (en) Glow discharge electron guns

Legal Events

Date Code Title Description
ST Notification of lapse