FR1287279A - Procédé de fabrication de dispositifs semi-conducteurs - Google Patents

Procédé de fabrication de dispositifs semi-conducteurs

Info

Publication number
FR1287279A
FR1287279A FR860134A FR860134A FR1287279A FR 1287279 A FR1287279 A FR 1287279A FR 860134 A FR860134 A FR 860134A FR 860134 A FR860134 A FR 860134A FR 1287279 A FR1287279 A FR 1287279A
Authority
FR
France
Prior art keywords
semiconductor device
manufacturing process
device manufacturing
semiconductor
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR860134A
Other languages
English (en)
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pacific Semiconductors Inc
Original Assignee
Pacific Semiconductors Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pacific Semiconductors Inc filed Critical Pacific Semiconductors Inc
Application granted granted Critical
Publication of FR1287279A publication Critical patent/FR1287279A/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
    • H10D62/834—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge further characterised by the dopants
    • H10P10/00—
    • H10P32/12—
    • H10P32/14—
    • H10P32/1408—
    • H10P32/16—
    • H10P32/171—
    • H10P95/00—
    • H10P95/50—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S252/00—Compositions
    • Y10S252/95—Doping agent source material
FR860134A 1960-10-13 1961-04-27 Procédé de fabrication de dispositifs semi-conducteurs Expired FR1287279A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US62495A US3084079A (en) 1960-10-13 1960-10-13 Manufacture of semiconductor devices

Publications (1)

Publication Number Publication Date
FR1287279A true FR1287279A (fr) 1962-03-09

Family

ID=22042857

Family Applications (1)

Application Number Title Priority Date Filing Date
FR860134A Expired FR1287279A (fr) 1960-10-13 1961-04-27 Procédé de fabrication de dispositifs semi-conducteurs

Country Status (5)

Country Link
US (1) US3084079A (cg-RX-API-DMAC10.html)
DE (1) DE1213054B (cg-RX-API-DMAC10.html)
FR (1) FR1287279A (cg-RX-API-DMAC10.html)
GB (1) GB930487A (cg-RX-API-DMAC10.html)
NL (1) NL263492A (cg-RX-API-DMAC10.html)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3200019A (en) * 1962-01-19 1965-08-10 Rca Corp Method for making a semiconductor device
US3247032A (en) * 1962-06-20 1966-04-19 Continental Device Corp Method for controlling diffusion of an active impurity material into a semiconductor body
US3281291A (en) * 1963-08-30 1966-10-25 Rca Corp Semiconductor device fabrication
GB1102164A (en) * 1964-04-15 1968-02-07 Texas Instruments Inc Selective impurity diffusion
US3354005A (en) * 1965-10-23 1967-11-21 Western Electric Co Methods of applying doping compositions to base materials
US3532563A (en) * 1968-03-19 1970-10-06 Milton Genser Doping of semiconductor surfaces
US4050966A (en) * 1968-12-20 1977-09-27 Siemens Aktiengesellschaft Method for the preparation of diffused silicon semiconductor components
US3630793A (en) * 1969-02-24 1971-12-28 Ralph W Christensen Method of making junction-type semiconductor devices
DE2007752B2 (de) * 1970-02-19 1978-07-27 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen von dotiertem Halbleitermaterial
US3928225A (en) * 1971-04-08 1975-12-23 Semikron Gleichrichterbau Glass forming mixture with boron as the doping material for producing conductivity zones in semiconductor bodies by means of diffusion
US4048350A (en) * 1975-09-19 1977-09-13 International Business Machines Corporation Semiconductor device having reduced surface leakage and methods of manufacture
US4236948A (en) * 1979-03-09 1980-12-02 Demetron Gesellschaft Fur Elektronik Werkstoffe Mbh Process for doping semiconductor crystals
GB2114365B (en) * 1982-01-28 1986-08-06 Owens Illinois Inc Process for forming a doped oxide film and composite article
US4571366A (en) * 1982-02-11 1986-02-18 Owens-Illinois, Inc. Process for forming a doped oxide film and doped semiconductor
US4605450A (en) * 1982-02-11 1986-08-12 Owens-Illinois, Inc. Process for forming a doped oxide film and doped semiconductor
US4490192A (en) * 1983-06-08 1984-12-25 Allied Corporation Stable suspensions of boron, phosphorus, antimony and arsenic dopants
JPS60153119A (ja) * 1984-01-20 1985-08-12 Fuji Electric Corp Res & Dev Ltd 不純物拡散方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB580412A (en) * 1942-08-29 1946-09-06 Micromatic Hone Corp Improvements in tools for honing helical slots or grooves
US2484519A (en) * 1946-01-15 1949-10-11 Martin Graham Robert Method of coating surfaces with boron
GB778383A (en) * 1953-10-02 1957-07-03 Standard Telephones Cables Ltd Improvements in or relating to the production of material for semi-conductors
NL99619C (cg-RX-API-DMAC10.html) * 1955-06-28
US2832702A (en) * 1955-08-18 1958-04-29 Hughes Aircraft Co Method of treating semiconductor bodies for translating devices
NL210216A (cg-RX-API-DMAC10.html) * 1955-12-02
US2828232A (en) * 1956-05-01 1958-03-25 Hughes Aircraft Co Method for producing junctions in semi-conductor device
NL135875C (cg-RX-API-DMAC10.html) * 1958-06-09 1900-01-01
US2974073A (en) * 1958-12-04 1961-03-07 Rca Corp Method of making phosphorus diffused silicon semiconductor devices
FR1248102A (fr) * 1959-10-30 1960-12-09 Materiel Telephonique Préparation des semi-conducteurs

Also Published As

Publication number Publication date
GB930487A (en) 1963-07-03
DE1213054B (de) 1966-03-24
NL263492A (cg-RX-API-DMAC10.html) 1964-05-25
US3084079A (en) 1963-04-02

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