FR1087946A - Procédé de production de matières semi-conductrices - Google Patents

Procédé de production de matières semi-conductrices

Info

Publication number
FR1087946A
FR1087946A FR1087946DA FR1087946A FR 1087946 A FR1087946 A FR 1087946A FR 1087946D A FR1087946D A FR 1087946DA FR 1087946 A FR1087946 A FR 1087946A
Authority
FR
France
Prior art keywords
production process
semiconductor material
material production
semiconductor
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of FR1087946A publication Critical patent/FR1087946A/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/04Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00Boron; Compounds thereof
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B9/00General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
    • C22B9/02Refining by liquating, filtering, centrifuging, distilling, or supersonic wave action including acoustic waves
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/04Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
    • C30B11/08Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
    • C30B11/10Solid or liquid components, e.g. Verneuil method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/16Heating of the molten zone
    • C30B13/20Heating of the molten zone by induction, e.g. hot wire technique
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/02Induction heating
    • H05B6/22Furnaces without an endless core
    • H05B6/30Arrangements for remelting or zone melting
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/25Process efficiency

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Acoustics & Sound (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electromagnetism (AREA)
  • General Engineering & Computer Science (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicon Compounds (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
FR1087946D 1952-12-17 1953-09-04 Procédé de production de matières semi-conductrices Expired FR1087946A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US333693XA 1952-12-17 1952-12-17

Publications (1)

Publication Number Publication Date
FR1087946A true FR1087946A (fr) 1955-03-01

Family

ID=21870028

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1087946D Expired FR1087946A (fr) 1952-12-17 1953-09-04 Procédé de production de matières semi-conductrices

Country Status (6)

Country Link
BE (1) BE525102A (nl)
CH (1) CH333693A (nl)
DE (1) DE1014332B (nl)
FR (1) FR1087946A (nl)
GB (1) GB774270A (nl)
NL (1) NL89230C (nl)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2835614A (en) * 1955-11-30 1958-05-20 Raulaud Corp Method of manufacturing crystalline material
US2855335A (en) * 1955-01-14 1958-10-07 Int Standard Electric Corp Method of purifying semiconductor material
US2876147A (en) * 1953-02-14 1959-03-03 Siemens Ag Method of and apparatus for producing semiconductor material
US3002824A (en) * 1956-11-28 1961-10-03 Philips Corp Method and apparatus for the manufacture of crystalline semiconductors
DE1128412B (de) * 1959-12-17 1962-04-26 Metallgesellschaft Ag Verfahren zur Herstellung von Reinstsilicium durch thermische Zersetzung von gasfoermigen Siliciumverbindungen
DE1216040B (de) * 1958-09-12 1966-05-05 Eternit Sa Muffensteckverbindung fuer glatte Einsteckrohre
CN113337725A (zh) * 2021-06-29 2021-09-03 红河学院 一种从冶炼渣中富集锗的方法

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL130620C (nl) * 1954-05-18 1900-01-01
US2964396A (en) * 1954-05-24 1960-12-13 Siemens Ag Producing semiconductor substances of highest purity
DE1017795B (de) * 1954-05-25 1957-10-17 Siemens Ag Verfahren zur Herstellung reinster kristalliner Substanzen, vorzugsweise Halbleitersubstanzen
DE1253235B (de) * 1954-05-25 1967-11-02 Siemens Ag Verfahren zum Herstellen stabfoermiger Halbleiterkristalle
DE1179382B (de) * 1954-06-30 1964-10-08 Siemens Ag Verfahren zum Herstellen eines extrem reinen, stabfoermigen Halbleiterkristalls fuer die Fertigung von elektrischen Halbleiterbauelementen, wie Richtleiter, Transistoren usw.
DE1201073B (de) * 1954-07-30 1965-09-16 Siemens Ag Verfahren zum Herstellen einer halbleitenden Legierung
NL203438A (nl) * 1955-01-14
DE1196046B (de) * 1955-03-28 1965-07-01 Siemens Ag Verfahren zum Herstellen eines hochreinen, kristallinen Stabes aus einem leitenden oder halbleitenden Element
DE1141255B (de) * 1958-03-05 1962-12-20 Siemens Ag Verfahren zum Herstellen hochgereinigter einkristalliner Halbleiterstaebe
DE1063870B (de) * 1956-06-28 1959-08-20 Gustav Weissenberg Verfahren und Vorrichtung zum tiegellosen Zuechten von Einkristallen aus hochreinem Silicium oder Germanium
DE1136308B (de) * 1956-10-17 1962-09-13 Siemens Ag Verfahren zum Herstellen von Kristallstaeben aus hochreinen halbleitenden Stoffen
DE1181668B (de) * 1956-10-17 1964-11-19 Siemens Ag Verfahren zum Herstellen von hochreinen, stabfoermigen Halbleiterkristallen durch Abscheiden des Halbleiters aus einer gasfoermigen Verbindung des Halbleiters durch eineelektrische Gasentladung
DE1207922B (de) * 1957-04-30 1965-12-30 Standard Elektrik Lorenz Ag Verfahren zum Herstellen von hochreinen Halbleitersubstanzen, insbesondere von Silizium
DE1169683B (de) * 1957-05-31 1964-05-06 Siemens Ag Verfahren zum tiegellosen Zonenschmelzen eines Halbleiterstabes
DE1076623B (de) * 1957-11-15 1960-03-03 Siemens Ag Vorrichtung zum tiegelfreien Zonenziehen von stabfoermigem Halbleitermaterial
DE1092576B (de) * 1957-11-15 1960-11-10 Siemens Ag Stromzufuehrung fuer die bewegliche Heizspule einer tiegelfreien Zonenziehvorrichtung im Innern eines Gefaesses
NL234451A (nl) * 1957-12-27
NL126240C (nl) * 1958-02-19
NL237618A (nl) * 1958-04-03
BE581195A (nl) * 1958-07-30
US3093456A (en) * 1958-09-02 1963-06-11 Texas Instruments Inc Method for recovery and reuse of quartz containers
US3053639A (en) * 1959-02-11 1962-09-11 Union Carbide Corp Method and apparatus for growing crystals
NL250835A (nl) * 1959-04-30
CH354429A (fr) * 1959-06-05 1961-05-31 Ind De Pierres Scient Hrand Dj Procédé de fabrication d'un corps tubulaire en pierre synthétique, at installation pour la mise en oeuvre de ce procédé
CH354427A (fr) * 1959-06-05 1961-05-31 Ind De Pierres Scient Hrand Dj Procédé de fabrication d'un corps de révolution, notamment d'un disque en pierre synthétique et installation pour la mise en oeuvre de ce procédé
US3086850A (en) * 1959-06-17 1963-04-23 Itt Method and means for growing and treating crystals
US3115469A (en) * 1959-06-22 1963-12-24 Monsanto Chemicals Production of single crystals of ferrites
NL258961A (nl) * 1959-12-23
DE1114171B (de) * 1959-12-31 1961-09-28 Siemens Ag Halterung fuer stabfoermiges Halbleitermaterial in Vorrichtungen zum tiegelfreien Zonenschmelzen
NL124042C (nl) * 1960-03-11
US3156533A (en) * 1960-07-26 1964-11-10 Imber Oscar Crystal growth apparatus
DE1216257B (de) * 1960-08-18 1966-05-12 Kempten Elektroschmelz Gmbh Verfahren zur Herstellung von Einkristallen
US3232745A (en) * 1960-12-05 1966-02-01 Siemens Ag Producing rod-shaped semiconductor crystals
DE1227424B (de) * 1961-03-01 1966-10-27 Philips Nv Verfahren und Vorrichtung zum Zonenschmelzen eines aus einer Metallverbindung bestehenden stabfoermigen Koerpers
NL275885A (nl) * 1961-03-14
FR1315934A (fr) * 1961-12-15 1963-01-25 Radiotechnique Appareil horizontal pour la purification et le tirage de cristaux semi-conducteurs
DE1182207B (de) * 1962-07-20 1964-11-26 Siemens Ag Verfahren zum Herstellen eines versetzungsarmen Halbleitereinkristalls durch tiegelfreies Zonenschmelzen
US3245761A (en) * 1962-10-11 1966-04-12 Norton Co Apparatus for making magnesium oxide crystals
US3314769A (en) * 1963-05-08 1967-04-18 Union Carbide Corp Arc process and apparatus for growing crystals
DE1284942B (de) * 1964-06-30 1968-12-12 Halbleiterwerk Frankfurt Oder Vorrichtung zur thermischen Behandlung von Kristallen und Schmelzen, insbesondere aus Halbleitermaterial
US4379733A (en) * 1981-10-02 1983-04-12 Hughes Aircraft Company Bicameral mode crystal growth apparatus and process
CN115198356B (zh) * 2022-07-15 2023-07-21 郑州大学 一种特定取向的大规格金属单晶及其制备方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2876147A (en) * 1953-02-14 1959-03-03 Siemens Ag Method of and apparatus for producing semiconductor material
US3086856A (en) * 1953-02-14 1963-04-23 Siemens Ag Method and device for the successive zone melting and resolidifying of extremely pure substances
US2855335A (en) * 1955-01-14 1958-10-07 Int Standard Electric Corp Method of purifying semiconductor material
US2835614A (en) * 1955-11-30 1958-05-20 Raulaud Corp Method of manufacturing crystalline material
US3002824A (en) * 1956-11-28 1961-10-03 Philips Corp Method and apparatus for the manufacture of crystalline semiconductors
DE1216040B (de) * 1958-09-12 1966-05-05 Eternit Sa Muffensteckverbindung fuer glatte Einsteckrohre
DE1128412B (de) * 1959-12-17 1962-04-26 Metallgesellschaft Ag Verfahren zur Herstellung von Reinstsilicium durch thermische Zersetzung von gasfoermigen Siliciumverbindungen
CN113337725A (zh) * 2021-06-29 2021-09-03 红河学院 一种从冶炼渣中富集锗的方法

Also Published As

Publication number Publication date
NL89230C (nl) 1900-01-01
DE1014332B (de) 1957-08-22
CH333693A (fr) 1958-10-31
BE525102A (nl) 1900-01-01
GB774270A (en) 1957-05-08

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