FI953779A - Menetelmä ohuen kalvon kerrostamiseksi alustalle käyttämällä etäiskylmätyppiplasmaa - Google Patents

Menetelmä ohuen kalvon kerrostamiseksi alustalle käyttämällä etäiskylmätyppiplasmaa Download PDF

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Publication number
FI953779A
FI953779A FI953779A FI953779A FI953779A FI 953779 A FI953779 A FI 953779A FI 953779 A FI953779 A FI 953779A FI 953779 A FI953779 A FI 953779A FI 953779 A FI953779 A FI 953779A
Authority
FI
Finland
Prior art keywords
substrate
nitrogen plasma
thin film
remote
cold nitrogen
Prior art date
Application number
FI953779A
Other languages
English (en)
Swedish (sv)
Other versions
FI953779A0 (fi
Inventor
Franck Callebert
Philippe Supiot
Odile Dessaux
Pierre Goudmand
Original Assignee
Europ Composants Electron
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Europ Composants Electron filed Critical Europ Composants Electron
Publication of FI953779A0 publication Critical patent/FI953779A0/fi
Publication of FI953779A publication Critical patent/FI953779A/fi

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
  • Light Receiving Elements (AREA)
FI953779A 1993-02-10 1995-08-09 Menetelmä ohuen kalvon kerrostamiseksi alustalle käyttämällä etäiskylmätyppiplasmaa FI953779A (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9301484A FR2701492B1 (fr) 1993-02-10 1993-02-10 Procédé pour déposer une couche mince sur un substrat par plasma froid différé d'azote.
PCT/FR1994/000149 WO1994018355A1 (fr) 1993-02-10 1994-02-09 Procede pour deposer une couche mince sur un substrat par plasma froid differe d'azote

Publications (2)

Publication Number Publication Date
FI953779A0 FI953779A0 (fi) 1995-08-09
FI953779A true FI953779A (fi) 1995-09-22

Family

ID=9443921

Family Applications (1)

Application Number Title Priority Date Filing Date
FI953779A FI953779A (fi) 1993-02-10 1995-08-09 Menetelmä ohuen kalvon kerrostamiseksi alustalle käyttämällä etäiskylmätyppiplasmaa

Country Status (9)

Country Link
EP (1) EP0683825B1 (fi)
JP (1) JPH08506381A (fi)
KR (1) KR960701237A (fi)
AT (1) ATE156866T1 (fi)
CA (1) CA2155659A1 (fi)
DE (1) DE69404971T2 (fi)
FI (1) FI953779A (fi)
FR (1) FR2701492B1 (fi)
WO (1) WO1994018355A1 (fi)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2718155B1 (fr) * 1994-04-05 1996-04-26 Europ Composants Electron Procédé de dépôt de diélectrique et/ou de métal sur un substrat.
WO1997010287A1 (fr) * 1995-09-15 1997-03-20 Sommer Revetements France S.A. Procede d'obtention d'un revetement de sol et produit obtenu
US7129187B2 (en) * 2004-07-14 2006-10-31 Tokyo Electron Limited Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films
US20230054056A1 (en) * 2019-12-19 2023-02-23 Agc Glass Europe Silicon oxide coated polymer films and low pressure pecvd methods for producing the same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4363828A (en) * 1979-12-12 1982-12-14 International Business Machines Corp. Method for depositing silicon films and related materials by a glow discharge in a disiland or higher order silane gas
US4863755A (en) * 1987-10-16 1989-09-05 The Regents Of The University Of California Plasma enhanced chemical vapor deposition of thin films of silicon nitride from cyclic organosilicon nitrogen precursors
FR2651782B1 (fr) * 1989-09-14 1993-03-19 Air Liquide Procede pour la realisation d'un depot d'un revetement protecteur inorganique et amorphe sur un substrat polymerique organique.
US4980196A (en) * 1990-02-14 1990-12-25 E. I. Du Pont De Nemours And Company Method of coating steel substrate using low temperature plasma processes and priming
FR2661688B1 (fr) * 1990-05-02 1992-07-17 Air Liquide Revetement multicouche pour substrat polycarbonate et procede d'elaboration d'un tel revetement.
JPH0782999B2 (ja) * 1991-04-15 1995-09-06 株式会社半導体プロセス研究所 気相成長膜の形成方法、半導体製造装置、および半 導体装置
DE4126759A1 (de) * 1991-08-13 1993-02-18 Siemens Ag Verfahren zur erzeugung siliciumhaltiger organischer schichten

Also Published As

Publication number Publication date
CA2155659A1 (en) 1994-08-18
WO1994018355A1 (fr) 1994-08-18
KR960701237A (ko) 1996-02-24
FR2701492A1 (fr) 1994-08-19
DE69404971T2 (de) 1997-12-18
ATE156866T1 (de) 1997-08-15
EP0683825A1 (fr) 1995-11-29
EP0683825B1 (fr) 1997-08-13
FI953779A0 (fi) 1995-08-09
JPH08506381A (ja) 1996-07-09
FR2701492B1 (fr) 1996-05-10
DE69404971D1 (de) 1997-09-18

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