MX9101829A - Metodo para tratar diamantes para producir diamantes ligables para depositar los mismos substracto. - Google Patents

Metodo para tratar diamantes para producir diamantes ligables para depositar los mismos substracto.

Info

Publication number
MX9101829A
MX9101829A MX9101829A MX9101829A MX9101829A MX 9101829 A MX9101829 A MX 9101829A MX 9101829 A MX9101829 A MX 9101829A MX 9101829 A MX9101829 A MX 9101829A MX 9101829 A MX9101829 A MX 9101829A
Authority
MX
Mexico
Prior art keywords
diamonds
ligable
substract
deposit
produce
Prior art date
Application number
MX9101829A
Other languages
English (en)
Inventor
Luis Ximenez Caballero
Original Assignee
Diamond Tech Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Diamond Tech Co filed Critical Diamond Tech Co
Publication of MX9101829A publication Critical patent/MX9101829A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/4584—Coating or impregnating of particulate or fibrous ceramic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0209—Pretreatment of the material to be coated by heating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/10—Heating of the reaction chamber or the substrate
    • C30B25/105—Heating of the reaction chamber or the substrate by irradiation or electric discharge
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/04—Diamond

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

Se deposita una capa de cristal metaestable mediante deposición de plasma químico sobre diamantes a una presión subatmosférica (10-3 Torr) a 850-1050ºC. La capa metaestable permite que el diamante sea unido metalúrgicamente a un substrato adecuado.
MX9101829A 1990-10-29 1991-10-29 Metodo para tratar diamantes para producir diamantes ligables para depositar los mismos substracto. MX9101829A (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/605,080 US5164220A (en) 1990-10-29 1990-10-29 Method for treating diamonds to produce bondable diamonds for depositing same on a substrate

Publications (1)

Publication Number Publication Date
MX9101829A true MX9101829A (es) 1994-01-31

Family

ID=24422176

Family Applications (1)

Application Number Title Priority Date Filing Date
MX9101829A MX9101829A (es) 1990-10-29 1991-10-29 Metodo para tratar diamantes para producir diamantes ligables para depositar los mismos substracto.

Country Status (4)

Country Link
US (2) US5164220A (es)
AU (1) AU8911891A (es)
MX (1) MX9101829A (es)
WO (1) WO1992007664A1 (es)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9018608D0 (en) * 1989-08-30 2013-11-13 Texas Instruments Inc Durable wideband anti-reflection coating for infrared windows
DE4109979C2 (de) * 1990-03-28 2000-03-30 Nisshin Flour Milling Co Verfahren zur Herstellung beschichteter Teilchen aus anorganischen oder metallischen Materialien
US5164220A (en) * 1990-10-29 1992-11-17 Diamond Technologies Company Method for treating diamonds to produce bondable diamonds for depositing same on a substrate
US5453293A (en) * 1991-07-17 1995-09-26 Beane; Alan F. Methods of manufacturing coated particles having desired values of intrinsic properties and methods of applying the coated particles to objects
US5526768A (en) * 1994-02-03 1996-06-18 Harris Corporation Method for providing a silicon and diamond substrate having a carbon to silicon transition layer and apparatus thereof
US5713775A (en) * 1995-05-02 1998-02-03 Massachusetts Institute Of Technology Field emitters of wide-bandgap materials and methods for their fabrication
US6258418B1 (en) * 1998-06-24 2001-07-10 Ronald A. Rudder Method for producing diamond-tiled cooking utensils and other workpieces for durable stick-resistant surfaces
US6258237B1 (en) * 1998-12-30 2001-07-10 Cerd, Ltd. Electrophoretic diamond coating and compositions for effecting same
US7654997B2 (en) * 2004-04-21 2010-02-02 Acclarent, Inc. Devices, systems and methods for diagnosing and treating sinusitus and other disorders of the ears, nose and/or throat
WO2006034281A1 (en) 2004-09-21 2006-03-30 Discus Dental Impressions Dental instruments having durable coatings
DE102005011940A1 (de) * 2005-03-14 2006-09-21 Degussa Ag Verfahren zur Herstellung von beschichteten Kohlenstoffpartikel und deren Verwendung in Anodenmaterialien für Lithium-Ionenbatterien
WO2007130748A1 (en) 2006-05-03 2007-11-15 Discus Dental Impressions, Inc. Dental instruments having anti-microbial coating
US8662209B2 (en) * 2009-03-27 2014-03-04 Varel International, Ind., L.P. Backfilled polycrystalline diamond cutter with high thermal conductivity
US8365846B2 (en) * 2009-03-27 2013-02-05 Varel International, Ind., L.P. Polycrystalline diamond cutter with high thermal conductivity
TW201219131A (en) * 2010-11-04 2012-05-16 Ritedia Corp comprising multiple stacked and bonded composite bodies each of which is formed by using a metal substrate to enclose a single layer of planar arrangement of diamond particles
US10669635B2 (en) 2014-09-18 2020-06-02 Baker Hughes, A Ge Company, Llc Methods of coating substrates with composite coatings of diamond nanoparticles and metal
US9873827B2 (en) 2014-10-21 2018-01-23 Baker Hughes Incorporated Methods of recovering hydrocarbons using suspensions for enhanced hydrocarbon recovery
US10167392B2 (en) * 2014-10-31 2019-01-01 Baker Hughes Incorporated Compositions of coated diamond nanoparticles, methods of forming coated diamond nanoparticles, and methods of forming coatings
US10695872B2 (en) * 2015-03-11 2020-06-30 Lockheed Martin Corporation Heat spreaders fabricated from metal nanoparticles
US10155899B2 (en) 2015-06-19 2018-12-18 Baker Hughes Incorporated Methods of forming suspensions and methods for recovery of hydrocarbon material from subterranean formations
EP3266406B1 (de) * 2016-07-04 2020-03-04 Coltène/Whaledent AG Dentalinstrument
CN108277500A (zh) * 2018-04-14 2018-07-13 新郑市新材料专业孵化器服务中心 一种金刚石电解提纯装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3293012A (en) * 1962-11-27 1966-12-20 Exxon Production Research Co Process of infiltrating diamond particles with metallic binders
US3372010A (en) * 1965-06-23 1968-03-05 Wall Colmonoy Corp Diamond abrasive matrix
JPS4810368B1 (es) * 1968-11-19 1973-04-03
US3641718A (en) * 1969-07-31 1972-02-15 Gen Motors Corp Abrasive cutting tool
US3826630A (en) * 1970-04-23 1974-07-30 De Beers Cons Mines Ltd Coating for diamonds
US3894673A (en) * 1971-11-04 1975-07-15 Abrasive Tech Inc Method of manufacturing diamond abrasive tools
US3871840A (en) * 1972-01-24 1975-03-18 Christensen Diamond Prod Co Abrasive particles encapsulated with a metal envelope of allotriomorphic dentrites
US3919717A (en) * 1974-07-24 1975-11-11 Ibm Wear-resistant surface for magnetic heads consisting of diamond particles
US4184853A (en) * 1976-04-21 1980-01-22 Andropov Jury I Individual abrasive grains with a silicon-base alloy coating
JPS5311190A (en) * 1976-07-19 1978-02-01 Ishizuka Kenkyusho Diamond granules useful for production of electrodeposition tools and manufacture
US4275528A (en) * 1979-09-10 1981-06-30 Christensen, Inc. Electroplated diamond milling cutter
US4358922A (en) * 1980-04-10 1982-11-16 Surface Technology, Inc. Metallic articles having dual layers of electroless metal coatings incorporating particulate matter
US4381227A (en) * 1980-07-31 1983-04-26 Norton Company Process for the manufacture of abrasive-coated tools
US4647494A (en) * 1985-10-31 1987-03-03 International Business Machines Corporation Silicon/carbon protection of metallic magnetic structures
US4659436A (en) * 1986-02-24 1987-04-21 Augustus Worx, Inc. Particulate diamond-coated metal article with high resistance to stress cracking and process therefor
US4919974A (en) * 1989-01-12 1990-04-24 Ford Motor Company Making diamond composite coated cutting tools
US4988421A (en) * 1989-01-12 1991-01-29 Ford Motor Company Method of toughening diamond coated tools
US5164220A (en) * 1990-10-29 1992-11-17 Diamond Technologies Company Method for treating diamonds to produce bondable diamonds for depositing same on a substrate

Also Published As

Publication number Publication date
WO1992007664A1 (en) 1992-05-14
AU8911891A (en) 1992-05-26
US5277940A (en) 1994-01-11
US5164220A (en) 1992-11-17

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