FI944526A0 - Pintaepäpuhtauksien poistaminen säteilyttämällä - Google Patents

Pintaepäpuhtauksien poistaminen säteilyttämällä

Info

Publication number
FI944526A0
FI944526A0 FI944526A FI944526A FI944526A0 FI 944526 A0 FI944526 A0 FI 944526A0 FI 944526 A FI944526 A FI 944526A FI 944526 A FI944526 A FI 944526A FI 944526 A0 FI944526 A0 FI 944526A0
Authority
FI
Finland
Prior art keywords
surface contaminants
irradiation
removal
substrate
energy irradiation
Prior art date
Application number
FI944526A
Other languages
English (en)
Swedish (sv)
Other versions
FI944526A (fi
Inventor
Audrey C Engelsberg
Joseph A Dehais
Original Assignee
Cauldron Lp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cauldron Lp filed Critical Cauldron Lp
Publication of FI944526A publication Critical patent/FI944526A/fi
Publication of FI944526A0 publication Critical patent/FI944526A0/fi

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02046—Dry cleaning only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
    • B23K26/142—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor for the removal of by-products
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
    • B23K26/1435—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor involving specially adapted flow control means
    • B23K26/1436—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor involving specially adapted flow control means for pressure control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
    • B23K26/1435—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor involving specially adapted flow control means
    • B23K26/1437—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor involving specially adapted flow control means for flow rate control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
    • B23K26/1462—Nozzles; Features related to nozzles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/32051—Deposition of metallic or metal-silicide layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/32115—Planarisation
    • H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/76819—Smoothing of the dielectric

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Electromagnetism (AREA)
  • Fluid Mechanics (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Drying Of Semiconductors (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Road Signs Or Road Markings (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
FI944526A 1992-03-31 1994-09-29 Pintaepäpuhtauksien poistaminen säteilyttämällä FI944526A0 (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US86503992A 1992-03-31 1992-03-31
PCT/US1993/002734 WO1993019888A1 (en) 1992-03-31 1993-03-24 Removal of surface contaminants by irradiation

Publications (2)

Publication Number Publication Date
FI944526A FI944526A (fi) 1994-09-29
FI944526A0 true FI944526A0 (fi) 1994-09-29

Family

ID=25344584

Family Applications (1)

Application Number Title Priority Date Filing Date
FI944526A FI944526A0 (fi) 1992-03-31 1994-09-29 Pintaepäpuhtauksien poistaminen säteilyttämällä

Country Status (17)

Country Link
EP (1) EP0633823B1 (fi)
JP (1) JPH07505577A (fi)
KR (1) KR100221421B1 (fi)
CN (1) CN1078415A (fi)
AT (1) ATE180703T1 (fi)
AU (1) AU673519B2 (fi)
BR (1) BR9306174A (fi)
CA (1) CA2132332C (fi)
CZ (1) CZ238294A3 (fi)
DE (1) DE69325171D1 (fi)
FI (1) FI944526A0 (fi)
MX (1) MX9301773A (fi)
NO (1) NO943626D0 (fi)
RU (1) RU2114486C1 (fi)
SG (1) SG42890A1 (fi)
TW (1) TW367527B (fi)
WO (1) WO1993019888A1 (fi)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2714464B1 (fr) * 1993-12-23 1996-02-09 Cogema Procédé de contrôle de la contamination surfacique d'un solide et dispositif de mise en Óoeuvre.
IL115934A0 (en) * 1995-11-09 1996-01-31 Oramir Semiconductor Ltd Laser processing chamber with cassette cell
IL115931A0 (en) 1995-11-09 1996-01-31 Oramir Semiconductor Ltd Laser stripping improvement by modified gas composition
IL115933A0 (en) 1995-11-09 1996-01-31 Oramir Semiconductor Ltd Process and apparatus for oblique beam revolution for the effective laser stripping of sidewalls
NL1002598C2 (nl) * 1996-03-13 1997-09-17 Bootsman Holding Bv Werkwijze en inrichting voor het bewerken van substraat.
US5800625A (en) * 1996-07-26 1998-09-01 Cauldron Limited Partnership Removal of material by radiation applied at an oblique angle
EP1058586A1 (en) * 1998-02-20 2000-12-13 The Goodyear Tire & Rubber Company Robotic laser tire mold cleaning system and method of use
US6369353B1 (en) 1998-02-20 2002-04-09 The Goodyear Tire & Rubber Company Robotic laser tire mold cleaning system and method of use
FR2777810B1 (fr) 1998-04-28 2000-05-19 Air Liquide Procede et dispositif de traitement de la surface interne d'une bouteille de gaz
TWI426964B (zh) * 2008-09-17 2014-02-21 Hitachi High Tech Corp Organic EL mask cleaning device, organic EL display manufacturing device, organic EL display and organic EL mask cleaning method
KR101135499B1 (ko) 2010-05-28 2012-04-13 삼성에스디아이 주식회사 전지용 전극 탭의 레이저 세정 장치 및 이를 이용한 레이저 세정 방법
RU2538161C2 (ru) * 2012-12-28 2015-01-10 федеральное государственное автономное образовательное учреждение высшего образования "Санкт-Петербургский национальный исследовательский университет информационных технологий, механики и оптики" Способ лазерной очистки поверхности
JP6649387B2 (ja) * 2014-12-30 2020-02-19 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． 生物汚損防止システム
JP6382901B2 (ja) 2016-09-29 2018-08-29 ファナック株式会社 レーザー加工システム
US10416575B2 (en) * 2016-11-16 2019-09-17 Suss Microtec Photomask Equipment Gmbh & Co. Kg Apparatus and method for cleaning a partial area of a substrate
RU2739195C1 (ru) * 2020-04-07 2020-12-21 Общество С Ограниченной Ответственностью "Нтц Тонкопленочных Технологий В Энергетике" Вакуумная напылительная установка с системой лазерной очистки паллет (варианты)
CN113020129A (zh) * 2021-02-26 2021-06-25 苏州大学 一种复合激光清洗光头及复合式激光清洗方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5776846A (en) * 1980-10-31 1982-05-14 Fujitsu Ltd Surface treating method for semiconductor
JPS57102229A (en) * 1980-12-17 1982-06-25 Matsushita Electric Ind Co Ltd Substrate processing method
US4568632A (en) * 1982-10-07 1986-02-04 International Business Machines Corporation Patterning of polyimide films with far ultraviolet light
JPS6037736A (ja) * 1983-08-11 1985-02-27 Toshiba Corp 表面清浄方法
JPS60129136A (ja) * 1983-12-15 1985-07-10 Toshiba Corp 紫外線照射装置
JPS61147988A (ja) * 1984-12-19 1986-07-05 Toshiba Corp レ−ザ加工装置
US4668304A (en) * 1985-04-10 1987-05-26 Eaton Corporation Dopant gettering semiconductor processing by excimer laser
JPS6285433A (ja) * 1985-10-09 1987-04-18 Sumitomo Electric Ind Ltd 研摩装置
ES2019931B3 (es) * 1986-02-14 1991-07-16 Amoco Corp Tratamiento por laser ultravioleta de superficies moldeadas.
EP0268301B1 (en) * 1986-11-20 1993-09-15 Nec Corporation Method and apparatus for writing a line on a patterned substrate
JPS63178845A (ja) * 1987-01-20 1988-07-22 Mitsubishi Heavy Ind Ltd 付着物除去装置
DE3721940A1 (de) * 1987-07-02 1989-01-12 Ibm Deutschland Entfernen von partikeln von oberflaechen fester koerper durch laserbeschuss
DE3904969A1 (de) * 1988-02-24 1989-09-21 Schmidt Ott Andreas Dr Verfahren zur beseitigung von staubpartikeln von oberflaechen in gasfoermiger umgebung
US5024968A (en) * 1988-07-08 1991-06-18 Engelsberg Audrey C Removal of surface contaminants by irradiation from a high-energy source
US5099557A (en) * 1988-07-08 1992-03-31 Engelsberg Audrey C Removal of surface contaminants by irradiation from a high-energy source
FR2641718B1 (fr) * 1989-01-17 1992-03-20 Ardt Procede de nettoyage de la surface de matieres solides et dispositif de mise en oeuvre de ce procede, utilisant un laser impulsionnel de puissance, a impulsions courtes, dont on focalise le faisceau sur la surface a nettoyer
US4920994A (en) * 1989-09-12 1990-05-01 The United States Of America As Represented By The United States Department Of Energy Laser removal of sludge from steam generators
US5151135A (en) * 1989-09-15 1992-09-29 Amoco Corporation Method for cleaning surfaces using UV lasers
US4979180A (en) * 1989-11-24 1990-12-18 Muncheryan Arthur M Modular interchangeable laser system
JPH04157088A (ja) * 1990-10-17 1992-05-29 Fujitsu Ltd レーザ加工装置

Also Published As

Publication number Publication date
NO943626L (no) 1994-09-29
DE69325171D1 (de) 1999-07-08
RU94042468A (ru) 1997-03-10
MX9301773A (es) 1994-02-28
FI944526A (fi) 1994-09-29
EP0633823A4 (en) 1995-02-15
CA2132332C (en) 1999-03-30
ATE180703T1 (de) 1999-06-15
BR9306174A (pt) 1998-01-13
NO943626D0 (no) 1994-09-29
KR100221421B1 (ko) 1999-09-15
SG42890A1 (en) 1997-10-17
EP0633823B1 (en) 1999-06-02
CZ238294A3 (en) 1996-02-14
RU2114486C1 (ru) 1998-06-27
TW367527B (en) 1999-08-21
JPH07505577A (ja) 1995-06-22
AU673519B2 (en) 1996-11-14
EP0633823A1 (en) 1995-01-18
CN1078415A (zh) 1993-11-17
CA2132332A1 (en) 1993-10-01
AU3932593A (en) 1993-11-08
WO1993019888A1 (en) 1993-10-14

Similar Documents

Publication Publication Date Title
BR9405973A (pt) Remoção de contaminantes superficiais por irradiação
LV11116A (lv) Virsmas notirisana ar apstarojuma palidzibu
FI944526A0 (fi) Pintaepäpuhtauksien poistaminen säteilyttämällä
ATE211584T1 (de) Materialentfernung durch polarisierte strahlung und rückseitige anwendung von strahlung
DE69404190D1 (de) Frequenzstabilisationsverfahren für Halbleiterlaser und frequenzstabilisierte Lichtquelle
DE59208363D1 (de) Vorrichtung zur plasmaunterstützten bearbeitung von substraten
ATE225671T1 (de) Verfahren zum desinfizieren und reinigen von kleinteilen und dafür geeignete vorrichtung
DE69422308D1 (de) Frequenzstabilisationsverfahren für Halbleiterlaser und frequenzstabilisierte Lichtquelle
ATE237553T1 (de) Vorrichtung und verfahren zur produktion von singulett-sauerstoff
ATE44348T1 (de) Verfahren und vorrichtung zur mechanischen entfernung von oberflaechen stueckiger gueter.