FI93680B - Stödkonstruktion för tunnfilm och förfarande för framställning av den - Google Patents
Stödkonstruktion för tunnfilm och förfarande för framställning av den Download PDFInfo
- Publication number
- FI93680B FI93680B FI922060A FI922060A FI93680B FI 93680 B FI93680 B FI 93680B FI 922060 A FI922060 A FI 922060A FI 922060 A FI922060 A FI 922060A FI 93680 B FI93680 B FI 93680B
- Authority
- FI
- Finland
- Prior art keywords
- support structure
- thin film
- film
- ultra
- substrate
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J47/00—Tubes for determining the presence, intensity, density or energy of radiation or particles
- H01J47/001—Details
- H01J47/002—Vessels or containers
- H01J47/004—Windows permeable to X-rays, gamma-rays, or particles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
- H01J5/02—Vessels; Containers; Shields associated therewith; Vacuum locks
- H01J5/18—Windows permeable to X-rays, gamma-rays, or particles
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24298—Noncircular aperture [e.g., slit, diamond, rectangular, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24322—Composite web or sheet
- Y10T428/24331—Composite web or sheet including nonapertured component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/266—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension of base or substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31721—Of polyimide
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Measurement Of Radiation (AREA)
- Materials For Photolithography (AREA)
- Laminated Bodies (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Claims (8)
1. Stödkonstruktion för ett tunnmembran, särskilt ett röntgen-och ultraviolett straining genomsläppande ultratunt membran vars tjocklek understiger 5 mikrometer, kännetecknad av att pä mem-branets yta har bildats en gallerformig stödkonstruktion av ljuskänsligt material.
2. Stödkonstruktion för ett tunnmembran enligt patentkravet 1, kännetecknad av att stödkonstruktionen har framställts av polymer.
3. Stödkonstruktion för ett tunnmembran enligt patentkravet 1 eller 2, kännetecknad av att stödkonstruktionen har framställts av polyimid.
4. Förfarande för framställning av en stödkonstruktion för ett tunnmembran enligt patentkravet 1, kännetecknat av att förfa-randet omfattar följande steg: a) stödkonstruktionsmaterialet appliceras pä ett underlag bestä-ende av ett ultratunt membran och ett substrat och förhärdas i ugn, b) pä det förhärdade stödkonstruktionsmaterialet anbringas en exponeringsmask av samma form som stödkonstruktionen som skall bildas, och stödkonstruktionsmaterialet exponeras, • | c) det exponerade stödkonstruktionsmaterialet framkallas och den sä bildade stödkonstruktionen av önskad form polymeriseras med härdningsbehandling i ätminstone ett steg, d) substratet som utgjort bakgrunden tili tunnmembranet avlägs-'* nas genom etsning.
5. Förfarande enligt patentkravet 4, kännetecknat av att stödkonstruktionen polymeriseras genom härdningsbehandling i ett steg vid en temperatur av 400 °C.
6. Förfarande enligt patentkravet 4, kännetecknat av att stöd 93680 ( konstruktionen polymeriseras med härdningsbehandling i tvä steg vid en temperatur av 400 °C.
7. Förfarande enligt nägot av patentkraven 4-6, kännetecknat av att som substrat används en formkropp framställd av kisel.
8. Förfarande enligt nägot av patentkraven 4-6, kännetecknat av att som substrat används en formkropp framställd av metall.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI922060A FI93680C (sv) | 1992-05-07 | 1992-05-07 | Stödkonstruktion för tunnfilm och förfarande för framställning av den |
FR9305427A FR2691011B1 (fr) | 1992-05-07 | 1993-05-06 | Structure de renfort pour une pellicule mince et procede pour fabriquer cette structure. |
DE4315240A DE4315240A1 (de) | 1992-05-07 | 1993-05-07 | Verstärkungsstruktur für dünne Filme und Verfahren zu deren Herstellung |
GB9309399A GB2266787B (en) | 1992-05-07 | 1993-05-07 | Thin film reinforcing structure and method for manufacturing the same |
US08/447,737 US5578360A (en) | 1992-05-07 | 1995-05-23 | Thin film reinforcing structure and method for manufacturing the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI922060A FI93680C (sv) | 1992-05-07 | 1992-05-07 | Stödkonstruktion för tunnfilm och förfarande för framställning av den |
FI922060 | 1992-05-07 |
Publications (4)
Publication Number | Publication Date |
---|---|
FI922060A0 FI922060A0 (sv) | 1992-05-07 |
FI922060A FI922060A (sv) | 1993-11-08 |
FI93680B true FI93680B (sv) | 1995-01-31 |
FI93680C FI93680C (sv) | 1995-05-10 |
Family
ID=8535241
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI922060A FI93680C (sv) | 1992-05-07 | 1992-05-07 | Stödkonstruktion för tunnfilm och förfarande för framställning av den |
Country Status (5)
Country | Link |
---|---|
US (1) | US5578360A (sv) |
DE (1) | DE4315240A1 (sv) |
FI (1) | FI93680C (sv) |
FR (1) | FR2691011B1 (sv) |
GB (1) | GB2266787B (sv) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0748512A1 (en) * | 1995-01-04 | 1996-12-18 | Koninklijke Philips Electronics N.V. | Method of manufacturing a thin, radiotransparent window |
WO1998025292A1 (en) * | 1996-12-06 | 1998-06-11 | Koninklijke Philips Electronics N.V. | X-ray tube having an internal window shield |
JP2000347054A (ja) * | 1999-03-31 | 2000-12-15 | Sharp Corp | 光デバイス及びその製造方法、並びに、ポリイミド膜の製造方法 |
US7618906B2 (en) * | 2005-11-17 | 2009-11-17 | Oxford Instruments Analytical Oy | Window membrane for detector and analyser devices, and a method for manufacturing a window membrane |
US7474730B2 (en) * | 2006-10-17 | 2009-01-06 | Oxford Instruments Analytical Oy | Compensation for fluctuations over time in the radiation characteristics of the X-ray source in an XRF analyser |
US7737424B2 (en) * | 2007-06-01 | 2010-06-15 | Moxtek, Inc. | X-ray window with grid structure |
US7709820B2 (en) * | 2007-06-01 | 2010-05-04 | Moxtek, Inc. | Radiation window with coated silicon support structure |
US7660393B2 (en) | 2007-06-19 | 2010-02-09 | Oxford Instruments Analytical Oy | Gas tight radiation window, and a method for its manufacturing |
US8498381B2 (en) * | 2010-10-07 | 2013-07-30 | Moxtek, Inc. | Polymer layer on X-ray window |
US9305735B2 (en) | 2007-09-28 | 2016-04-05 | Brigham Young University | Reinforced polymer x-ray window |
EP2190778A4 (en) | 2007-09-28 | 2014-08-13 | Univ Brigham Young | CARBON NANOTUBES ASSEMBLY |
US7684545B2 (en) * | 2007-10-30 | 2010-03-23 | Rigaku Innovative Technologies, Inc. | X-ray window and resistive heater |
US8247971B1 (en) | 2009-03-19 | 2012-08-21 | Moxtek, Inc. | Resistively heated small planar filament |
US7983394B2 (en) | 2009-12-17 | 2011-07-19 | Moxtek, Inc. | Multiple wavelength X-ray source |
FI20105626A0 (sv) | 2010-06-03 | 2010-06-03 | Hs Foils Oy | Ultratunn berylliumfönster och metod för dess tillverkning |
US8526574B2 (en) | 2010-09-24 | 2013-09-03 | Moxtek, Inc. | Capacitor AC power coupling across high DC voltage differential |
US8804910B1 (en) | 2011-01-24 | 2014-08-12 | Moxtek, Inc. | Reduced power consumption X-ray source |
US8750458B1 (en) | 2011-02-17 | 2014-06-10 | Moxtek, Inc. | Cold electron number amplifier |
US8929515B2 (en) | 2011-02-23 | 2015-01-06 | Moxtek, Inc. | Multiple-size support for X-ray window |
US8989354B2 (en) * | 2011-05-16 | 2015-03-24 | Brigham Young University | Carbon composite support structure |
US9174412B2 (en) | 2011-05-16 | 2015-11-03 | Brigham Young University | High strength carbon fiber composite wafers for microfabrication |
US9076628B2 (en) | 2011-05-16 | 2015-07-07 | Brigham Young University | Variable radius taper x-ray window support structure |
US8761344B2 (en) | 2011-12-29 | 2014-06-24 | Moxtek, Inc. | Small x-ray tube with electron beam control optics |
GB2514984B (en) | 2012-03-11 | 2015-09-30 | Mark Larson | Improved Radiation Window With Support Structure |
US9173623B2 (en) | 2013-04-19 | 2015-11-03 | Samuel Soonho Lee | X-ray tube and receiver inside mouth |
US10258930B2 (en) | 2015-06-19 | 2019-04-16 | Mark Larson | High-performance, low-stress support structure with membrane |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4983501A (sv) * | 1972-12-18 | 1974-08-12 | ||
US4092442A (en) * | 1976-12-30 | 1978-05-30 | International Business Machines Corporation | Method of depositing thin films utilizing a polyimide mask |
US4254174A (en) * | 1979-03-29 | 1981-03-03 | Massachusetts Institute Of Technology | Supported membrane composite structure and its method of manufacture |
US4253029A (en) * | 1979-05-23 | 1981-02-24 | Bell Telephone Laboratories, Incorporated | Mask structure for x-ray lithography |
US4426247A (en) * | 1982-04-12 | 1984-01-17 | Nippon Telegraph & Telephone Public Corporation | Method for forming micropattern |
US4522842A (en) * | 1982-09-09 | 1985-06-11 | At&T Bell Laboratories | Boron nitride X-ray masks with controlled stress |
JPS5950443A (ja) * | 1982-09-16 | 1984-03-23 | Hitachi Ltd | X線マスク |
US4677042A (en) * | 1984-11-05 | 1987-06-30 | Canon Kabushiki Kaisha | Mask structure for lithography, method for preparation thereof and lithographic method |
US4741988A (en) * | 1985-05-08 | 1988-05-03 | U.S. Philips Corp. | Patterned polyimide film, a photosensitive polyamide acid derivative and an electrophoretic image-display cell |
JPS62202518A (ja) * | 1986-02-03 | 1987-09-07 | Fujitsu Ltd | X線露光用マスク |
US4770974A (en) * | 1986-09-18 | 1988-09-13 | International Business Machines Corporation | Microlithographic resist containing poly(1,1-dialkylsilazane) |
DE3702035A1 (de) * | 1987-01-24 | 1988-08-04 | Basf Ag | Copolymerisate mit o-nitrocarbinolestergruppierungen und verfahren zur herstellung von zweilagenresisten sowie von halbleiterbauelementen |
FI885554A (fi) * | 1988-11-30 | 1990-05-31 | Outokumpu Oy | Indikationsfoenster foer analysator och dess framstaellningsfoerfarande. |
JPH02208601A (ja) * | 1989-02-08 | 1990-08-20 | Seiko Instr Inc | 光学用窓材及びその製造方法 |
US4999280A (en) * | 1989-03-17 | 1991-03-12 | International Business Machines Corporation | Spray silylation of photoresist images |
GB8917191D0 (en) * | 1989-07-27 | 1989-09-13 | Gec Avery Technology | Strain gauge encapsulation process |
DE59105367D1 (de) * | 1990-08-17 | 1995-06-08 | Ciba Geigy Ag | Copolyimide, Verfahren zu deren Herstellung und deren Verwendung. |
US5258091A (en) * | 1990-09-18 | 1993-11-02 | Sumitomo Electric Industries, Ltd. | Method of producing X-ray window |
US5300403A (en) * | 1992-06-18 | 1994-04-05 | International Business Machines Corporation | Line width control in a radiation sensitive polyimide |
-
1992
- 1992-05-07 FI FI922060A patent/FI93680C/sv active
-
1993
- 1993-05-06 FR FR9305427A patent/FR2691011B1/fr not_active Expired - Fee Related
- 1993-05-07 DE DE4315240A patent/DE4315240A1/de not_active Withdrawn
- 1993-05-07 GB GB9309399A patent/GB2266787B/en not_active Expired - Fee Related
-
1995
- 1995-05-23 US US08/447,737 patent/US5578360A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5578360A (en) | 1996-11-26 |
FR2691011A1 (fr) | 1993-11-12 |
FI922060A (sv) | 1993-11-08 |
GB9309399D0 (en) | 1993-06-23 |
GB2266787A (en) | 1993-11-10 |
FR2691011B1 (fr) | 1996-01-05 |
DE4315240A1 (de) | 1993-11-11 |
GB2266787B (en) | 1995-10-04 |
FI922060A0 (sv) | 1992-05-07 |
FI93680C (sv) | 1995-05-10 |
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HC | Name/ company changed in application |
Owner name: OUTOKUMPU INSTRUMENTS OY |
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BB | Publication of examined application |