FR2691011B1 - Structure de renfort pour une pellicule mince et procede pour fabriquer cette structure. - Google Patents

Structure de renfort pour une pellicule mince et procede pour fabriquer cette structure.

Info

Publication number
FR2691011B1
FR2691011B1 FR9305427A FR9305427A FR2691011B1 FR 2691011 B1 FR2691011 B1 FR 2691011B1 FR 9305427 A FR9305427 A FR 9305427A FR 9305427 A FR9305427 A FR 9305427A FR 2691011 B1 FR2691011 B1 FR 2691011B1
Authority
FR
France
Prior art keywords
manufacturing
thin film
same
reinforcement structure
reinforcement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9305427A
Other languages
English (en)
Other versions
FR2691011A1 (fr
Inventor
Veli-Pekka Viitanen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Outokumpu Instruments Oy
Original Assignee
Outokumpu Instruments Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Outokumpu Instruments Oy filed Critical Outokumpu Instruments Oy
Publication of FR2691011A1 publication Critical patent/FR2691011A1/fr
Application granted granted Critical
Publication of FR2691011B1 publication Critical patent/FR2691011B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J47/00—Tubes for determining the presence, intensity, density or energy of radiation or particles
    • H01J47/001—Details
    • H01J47/002—Vessels or containers
    • H01J47/004—Windows permeable to X-rays, gamma-rays, or particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
    • H01J5/02—Vessels; Containers; Shields associated therewith; Vacuum locks
    • H01J5/18—Windows permeable to X-rays, gamma-rays, or particles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24298—Noncircular aperture [e.g., slit, diamond, rectangular, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24322—Composite web or sheet
    • Y10T428/24331—Composite web or sheet including nonapertured component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/266—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension of base or substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31721—Of polyimide

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Measurement Of Radiation (AREA)
  • Laminated Bodies (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR9305427A 1992-05-07 1993-05-06 Structure de renfort pour une pellicule mince et procede pour fabriquer cette structure. Expired - Fee Related FR2691011B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI922060A FI93680C (fi) 1992-05-07 1992-05-07 Ohutkalvon tukirakenne ja menetelmä sen valmistamiseksi

Publications (2)

Publication Number Publication Date
FR2691011A1 FR2691011A1 (fr) 1993-11-12
FR2691011B1 true FR2691011B1 (fr) 1996-01-05

Family

ID=8535241

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9305427A Expired - Fee Related FR2691011B1 (fr) 1992-05-07 1993-05-06 Structure de renfort pour une pellicule mince et procede pour fabriquer cette structure.

Country Status (5)

Country Link
US (1) US5578360A (fr)
DE (1) DE4315240A1 (fr)
FI (1) FI93680C (fr)
FR (1) FR2691011B1 (fr)
GB (1) GB2266787B (fr)

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JPH11505602A (ja) * 1995-01-04 1999-05-21 フィリップス エレクトロニクス ネムローゼ フェンノートシャップ 薄い放射線透過性窓の製造方法
WO1998025292A1 (fr) * 1996-12-06 1998-06-11 Koninklijke Philips Electronics N.V. Tube a rayons x comportant une protection interne de fenetre
JP2000347054A (ja) * 1999-03-31 2000-12-15 Sharp Corp 光デバイス及びその製造方法、並びに、ポリイミド膜の製造方法
US7618906B2 (en) * 2005-11-17 2009-11-17 Oxford Instruments Analytical Oy Window membrane for detector and analyser devices, and a method for manufacturing a window membrane
US7474730B2 (en) * 2006-10-17 2009-01-06 Oxford Instruments Analytical Oy Compensation for fluctuations over time in the radiation characteristics of the X-ray source in an XRF analyser
US7737424B2 (en) * 2007-06-01 2010-06-15 Moxtek, Inc. X-ray window with grid structure
US7709820B2 (en) * 2007-06-01 2010-05-04 Moxtek, Inc. Radiation window with coated silicon support structure
US7660393B2 (en) 2007-06-19 2010-02-09 Oxford Instruments Analytical Oy Gas tight radiation window, and a method for its manufacturing
US8498381B2 (en) 2010-10-07 2013-07-30 Moxtek, Inc. Polymer layer on X-ray window
EP2190778A4 (fr) 2007-09-28 2014-08-13 Univ Brigham Young Ensemble de nanotubes de carbone
US9305735B2 (en) 2007-09-28 2016-04-05 Brigham Young University Reinforced polymer x-ray window
US7684545B2 (en) * 2007-10-30 2010-03-23 Rigaku Innovative Technologies, Inc. X-ray window and resistive heater
US8247971B1 (en) 2009-03-19 2012-08-21 Moxtek, Inc. Resistively heated small planar filament
US7983394B2 (en) 2009-12-17 2011-07-19 Moxtek, Inc. Multiple wavelength X-ray source
FI20105626A0 (fi) * 2010-06-03 2010-06-03 Hs Foils Oy Erittäin ohut berylliumikkuna ja menetelmä sen valmistamiseksi
US8526574B2 (en) 2010-09-24 2013-09-03 Moxtek, Inc. Capacitor AC power coupling across high DC voltage differential
US8804910B1 (en) 2011-01-24 2014-08-12 Moxtek, Inc. Reduced power consumption X-ray source
US8750458B1 (en) 2011-02-17 2014-06-10 Moxtek, Inc. Cold electron number amplifier
US8929515B2 (en) 2011-02-23 2015-01-06 Moxtek, Inc. Multiple-size support for X-ray window
US8989354B2 (en) * 2011-05-16 2015-03-24 Brigham Young University Carbon composite support structure
US9076628B2 (en) 2011-05-16 2015-07-07 Brigham Young University Variable radius taper x-ray window support structure
US9174412B2 (en) 2011-05-16 2015-11-03 Brigham Young University High strength carbon fiber composite wafers for microfabrication
US8761344B2 (en) 2011-12-29 2014-06-24 Moxtek, Inc. Small x-ray tube with electron beam control optics
WO2013138258A1 (fr) 2012-03-11 2013-09-19 Mark Larson Fenêtre de rayonnement améliorée à structure de support
US9173623B2 (en) 2013-04-19 2015-11-03 Samuel Soonho Lee X-ray tube and receiver inside mouth
US10258930B2 (en) 2015-06-19 2019-04-16 Mark Larson High-performance, low-stress support structure with membrane

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4983501A (fr) * 1972-12-18 1974-08-12
US4092442A (en) * 1976-12-30 1978-05-30 International Business Machines Corporation Method of depositing thin films utilizing a polyimide mask
US4254174A (en) * 1979-03-29 1981-03-03 Massachusetts Institute Of Technology Supported membrane composite structure and its method of manufacture
US4253029A (en) * 1979-05-23 1981-02-24 Bell Telephone Laboratories, Incorporated Mask structure for x-ray lithography
DE3377597D1 (en) * 1982-04-12 1988-09-08 Nippon Telegraph & Telephone Method for forming micropattern
US4522842A (en) * 1982-09-09 1985-06-11 At&T Bell Laboratories Boron nitride X-ray masks with controlled stress
JPS5950443A (ja) * 1982-09-16 1984-03-23 Hitachi Ltd Ｘ線マスク
US4677042A (en) * 1984-11-05 1987-06-30 Canon Kabushiki Kaisha Mask structure for lithography, method for preparation thereof and lithographic method
US4741988A (en) * 1985-05-08 1988-05-03 U.S. Philips Corp. Patterned polyimide film, a photosensitive polyamide acid derivative and an electrophoretic image-display cell
JPS62202518A (ja) * 1986-02-03 1987-09-07 Fujitsu Ltd Ｘ線露光用マスク
US4770974A (en) * 1986-09-18 1988-09-13 International Business Machines Corporation Microlithographic resist containing poly(1,1-dialkylsilazane)
DE3702035A1 (de) * 1987-01-24 1988-08-04 Basf Ag Copolymerisate mit o-nitrocarbinolestergruppierungen und verfahren zur herstellung von zweilagenresisten sowie von halbleiterbauelementen
FI885554A (fi) * 1988-11-30 1990-05-31 Outokumpu Oy Indikationsfoenster foer analysator och dess framstaellningsfoerfarande.
JPH02208601A (ja) * 1989-02-08 1990-08-20 Seiko Instr Inc 光学用窓材及びその製造方法
US4999280A (en) * 1989-03-17 1991-03-12 International Business Machines Corporation Spray silylation of photoresist images
GB8917191D0 (en) * 1989-07-27 1989-09-13 Gec Avery Technology Strain gauge encapsulation process
EP0471650B1 (fr) * 1990-08-17 1995-05-03 Ciba-Geigy Ag Copolyimides, leur procédé de préparation et leur utilisation
US5258091A (en) * 1990-09-18 1993-11-02 Sumitomo Electric Industries, Ltd. Method of producing X-ray window
US5300403A (en) * 1992-06-18 1994-04-05 International Business Machines Corporation Line width control in a radiation sensitive polyimide

Also Published As

Publication number Publication date
US5578360A (en) 1996-11-26
FI922060A0 (fi) 1992-05-07
FI93680B (fi) 1995-01-31
GB2266787A (en) 1993-11-10
GB2266787B (en) 1995-10-04
DE4315240A1 (de) 1993-11-11
FI922060A (fi) 1993-11-08
GB9309399D0 (en) 1993-06-23
FR2691011A1 (fr) 1993-11-12
FI93680C (fi) 1995-05-10

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Legal Events

Date Code Title Description
ST Notification of lapse