FI910150A0 - Skanningsanordning foer optisk skanning av en yta laengs en linje. - Google Patents

Skanningsanordning foer optisk skanning av en yta laengs en linje.

Info

Publication number
FI910150A0
FI910150A0 FI910150A FI910150A FI910150A0 FI 910150 A0 FI910150 A0 FI 910150A0 FI 910150 A FI910150 A FI 910150A FI 910150 A FI910150 A FI 910150A FI 910150 A0 FI910150 A0 FI 910150A0
Authority
FI
Finland
Prior art keywords
skanningsanordning
skanning
linje
laengs
yta
Prior art date
Application number
FI910150A
Other languages
English (en)
Other versions
FI104297B (fi
FI104297B1 (fi
FI910150A (fi
Inventor
Amstel Willem Dirk Van
Joseph Louis Horijon
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of FI910150A0 publication Critical patent/FI910150A0/fi
Publication of FI910150A publication Critical patent/FI910150A/fi
Application granted granted Critical
Publication of FI104297B publication Critical patent/FI104297B/fi
Publication of FI104297B1 publication Critical patent/FI104297B1/fi

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901—Optical details; Scanning details
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0031—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration for scanning purposes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901—Optical details; Scanning details
    • G01N2021/8905—Directional selective optics, e.g. slits, spatial filters
    • G01N2021/8907—Cylindrical optics

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Textile Engineering (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Lenses (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Light Guides In General And Applications Therefor (AREA)
  • Noodles (AREA)
  • Epoxy Compounds (AREA)
  • Facsimile Scanning Arrangements (AREA)
FI910150A 1990-01-16 1991-01-11 Skannauslaite pinnan skannaamiseksi optisesti viivaa pitkin FI104297B1 (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL9000100 1990-01-16
NL9000100 1990-01-16

Publications (4)

Publication Number Publication Date
FI910150A0 true FI910150A0 (fi) 1991-01-11
FI910150A FI910150A (fi) 1991-07-17
FI104297B FI104297B (fi) 1999-12-15
FI104297B1 FI104297B1 (fi) 1999-12-15

Family

ID=19856420

Family Applications (1)

Application Number Title Priority Date Filing Date
FI910150A FI104297B1 (fi) 1990-01-16 1991-01-11 Skannauslaite pinnan skannaamiseksi optisesti viivaa pitkin

Country Status (11)

Country Link
US (1) US5170037A (fi)
EP (1) EP0437883B1 (fi)
JP (1) JP2995238B2 (fi)
KR (1) KR0170783B1 (fi)
AT (1) ATE108029T1 (fi)
CA (1) CA2034017C (fi)
DE (1) DE69010318T2 (fi)
DK (1) DK0437883T3 (fi)
ES (1) ES2058766T3 (fi)
FI (1) FI104297B1 (fi)
IL (1) IL96947A (fi)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5512760A (en) * 1993-05-06 1996-04-30 U.S. Philips Corporation Optical height detector with coaxial irradiation and image axes and plural detectors spaced along the image axis
DE19528519A1 (de) * 1995-08-03 1997-02-06 Tzn Forschung & Entwicklung Vorrichtung zur Detektion streifenförmiger Oberflächenfehler
DE19714221A1 (de) * 1997-04-07 1998-10-08 Zeiss Carl Fa Konfokales Mikroskop mit einem motorischen Scanningtisch
WO2003023455A1 (en) * 2001-09-13 2003-03-20 Anzpac Systems Limited Method and apparatus for article inspection
US8441694B2 (en) * 2003-09-30 2013-05-14 Hewlett-Packard Development Company, L.P. Method and an apparatus for adjusting a scanning target area of an image reproduction device
KR100816078B1 (ko) * 2006-06-19 2008-03-24 광운대학교 산학협력단 공간영상 투영장치 및 그 방법
WO2009061458A1 (en) * 2007-11-07 2009-05-14 Amfit, Inc. Impression foam digital scanner

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH539892A (de) * 1971-03-22 1973-07-31 Zellweger Uster Ag Abtastvorrichtung für optisch erkennbare Zeichen
US3995110A (en) * 1973-12-20 1976-11-30 Xerox Corporation Flying spot scanner with plural lens correction
DE2550814C3 (de) * 1975-11-12 1979-08-09 Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch Zeilentastvorrichtung für Materialbahnen zur Fehlstellenermittlung
DE2827705C3 (de) * 1978-06-23 1981-07-30 Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch Gerät zur Feststellung von Fehlern an Bahnmaterial
DE3431540A1 (de) * 1984-07-02 1986-03-06 Elektro Optik Gmbh & Co Kg Verfahren zur korrektur der sphaerischen aberration und des astigmatismus eines ausmittigen lichtbuendels in einer spiegeloptik
US4872757A (en) * 1988-04-20 1989-10-10 Ball Corporation Optical convex surface profiling and gauging apparatus and method therefor

Also Published As

Publication number Publication date
EP0437883A1 (en) 1991-07-24
ATE108029T1 (de) 1994-07-15
DE69010318D1 (de) 1994-08-04
JP2995238B2 (ja) 1999-12-27
IL96947A0 (en) 1992-03-29
FI104297B (fi) 1999-12-15
JPH04212120A (ja) 1992-08-03
IL96947A (en) 1993-07-08
CA2034017A1 (en) 1991-07-17
FI104297B1 (fi) 1999-12-15
KR0170783B1 (ko) 1999-05-01
DK0437883T3 (da) 1994-10-03
DE69010318T2 (de) 1995-01-26
CA2034017C (en) 2001-08-21
US5170037A (en) 1992-12-08
FI910150A (fi) 1991-07-17
ES2058766T3 (es) 1994-11-01
EP0437883B1 (en) 1994-06-29

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Legal Events

Date Code Title Description
HC Name/ company changed in application

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V.

HC Name/ company changed in application

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V.

MA Patent expired