FI894430A0 - Uv-haerdbara kompositioner foer tillverkning av loedmaskiner i form av en skyddskupa. - Google Patents

Uv-haerdbara kompositioner foer tillverkning av loedmaskiner i form av en skyddskupa.

Info

Publication number
FI894430A0
FI894430A0 FI894430A FI894430A FI894430A0 FI 894430 A0 FI894430 A0 FI 894430A0 FI 894430 A FI894430 A FI 894430A FI 894430 A FI894430 A FI 894430A FI 894430 A0 FI894430 A0 FI 894430A0
Authority
FI
Finland
Prior art keywords
skyddskupa
loedmaskiner
haerdbara
kompositioner
foer tillverkning
Prior art date
Application number
FI894430A
Other languages
English (en)
Other versions
FI894430A (fi
Inventor
Paul Ling Kong Hung
Kenneth Kuo-Shu Tseng
Original Assignee
M & T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M & T Chemicals Inc filed Critical M & T Chemicals Inc
Publication of FI894430A0 publication Critical patent/FI894430A0/fi
Publication of FI894430A publication Critical patent/FI894430A/fi

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
FI894430A 1988-09-20 1989-09-19 Uv-haerdbara kompositioner foer tillverkning av loedmaskiner i form av en skyddskupa. FI894430A (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/247,052 US5006436A (en) 1988-09-20 1988-09-20 UV curable compositions for making tentable solder mask coating

Publications (2)

Publication Number Publication Date
FI894430A0 true FI894430A0 (fi) 1989-09-19
FI894430A FI894430A (fi) 1990-03-21

Family

ID=22933355

Family Applications (1)

Application Number Title Priority Date Filing Date
FI894430A FI894430A (fi) 1988-09-20 1989-09-19 Uv-haerdbara kompositioner foer tillverkning av loedmaskiner i form av en skyddskupa.

Country Status (13)

Country Link
US (1) US5006436A (fi)
EP (1) EP0360579A1 (fi)
JP (1) JPH02210443A (fi)
KR (1) KR900005230A (fi)
CN (1) CN1043397A (fi)
AU (1) AU4145989A (fi)
BR (1) BR8904708A (fi)
DK (1) DK461589A (fi)
FI (1) FI894430A (fi)
IL (1) IL91686A0 (fi)
NO (1) NO893734L (fi)
PT (1) PT91735A (fi)
ZA (1) ZA897138B (fi)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5420171A (en) * 1991-12-31 1995-05-30 Tech Spray, Inc. UV curable temporary solder mask
JPH06295060A (ja) * 1992-10-29 1994-10-21 Ajinomoto Co Inc 感光性樹脂組成物又は感光性熱硬化性樹脂組成物及びそれらを使用したフォトソルダ−レジスト組成物
EP0680626B1 (en) * 1993-01-20 1999-06-16 Agfa-Gevaert N.V. Photopolymerizable composition of high sensitivity and method for obtaining images therewith
EP0750229B1 (en) * 1994-03-04 1999-10-06 Asahi Kasei Kogyo Kabushiki Kaisha Liquid photosensitive resin composition for forming relief structures
JP2000502463A (ja) 1995-12-21 2000-02-29 ザ ダウ ケミカル カンパニー はんだマスク組成物
US5707782A (en) * 1996-03-01 1998-01-13 The Board Of Trustees Of The University Of Illinois Photoimageable, dielectric, crosslinkable copolyesters
DE69800652T2 (de) * 1997-02-25 2001-08-23 E.I. Du Pont De Nemours And Co., Wilmington Flexible, flammhemmende fotopolymerisierbare Zusammensetzung zur Beschichtung von Leiterplatten
US5874197A (en) * 1997-09-18 1999-02-23 E. I. Du Pont De Nemours And Company Thermal assisted photosensitive composition and method thereof
WO1999024512A1 (en) * 1997-11-06 1999-05-20 The Edgington Company Coating composition
ES2260825T3 (es) 1997-12-02 2006-11-01 Ciba Specialty Chemicals Holding Inc. Materiales poliolefinicos que tienen durabilidad superficial mejorada y metodos para su obtencion mediante exposicion a radiacion.
US6331317B1 (en) * 1999-11-12 2001-12-18 Alkermes Controlled Therapeutics Ii Inc. Apparatus and method for preparing microparticles
EP1317691A2 (en) * 2000-09-11 2003-06-11 Showa Denko K.K. Photosensitive composition, cured article thereof, and printed circuit board using the same
US7312266B2 (en) * 2000-12-15 2007-12-25 The College Of William And Mary Organic thiol metal-free stabilizers and plasticizers for halogen-containing polymers
US6667357B2 (en) 2000-12-15 2003-12-23 The College Of William And Mary Organic thiol metal-free stabilizers and plasticizers for halogen-containing polymers
US6762231B2 (en) * 2000-12-15 2004-07-13 The College Of William And Mary Organic thiol metal-free stabilizers and plasticizers for halogen-containing polymers
US6927247B2 (en) * 2000-12-15 2005-08-09 The College Of William And Mary Organic thiol metal-free stabilizers and plasticizers for halogen-containing polymers
JP4581706B2 (ja) * 2004-01-29 2010-11-17 住友ベークライト株式会社 ポジ型感光性樹脂組成物、該ポジ型感光性樹脂組成物を用いた半導体装置及び表示素子、並びに半導体装置及び表示素子の製造方法
JP4587865B2 (ja) * 2004-04-22 2010-11-24 昭和電工株式会社 感光性樹脂組成物及びその硬化物並びにそれらを使用するプリント配線基板の製造方法
JP2007010785A (ja) * 2005-06-28 2007-01-18 Fujifilm Holdings Corp 永久パターン形成方法
TWI426351B (zh) * 2006-11-15 2014-02-11 Taiyo Holdings Co Ltd Photolithography (Phototool) and the formation of resistance to resistance pattern
JP6361944B1 (ja) * 2017-01-24 2018-07-25 東洋インキＳｃホールディングス株式会社 カラーフィルタ用感光性組成物及びその製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3048502A1 (de) * 1980-12-22 1982-07-22 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US4422914A (en) * 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
JPS5986045A (ja) * 1982-11-05 1984-05-18 Nippon Soda Co Ltd 永久レジスト用光硬化性樹脂組成物
US4572890A (en) * 1983-05-11 1986-02-25 Ciba-Geigy Corporation Process for the production of images
DE3412992A1 (de) * 1984-04-06 1985-10-24 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch und verfahren zum aufbringen von markierungen auf eine loetstopresistschicht
US4849320A (en) * 1986-05-10 1989-07-18 Ciba-Geigy Corporation Method of forming images

Also Published As

Publication number Publication date
AU4145989A (en) 1990-03-29
BR8904708A (pt) 1990-05-01
KR900005230A (ko) 1990-04-13
DK461589A (da) 1990-03-21
NO893734D0 (no) 1989-09-19
JPH02210443A (ja) 1990-08-21
US5006436A (en) 1991-04-09
IL91686A0 (en) 1990-04-29
ZA897138B (en) 1990-06-27
DK461589D0 (da) 1989-09-19
PT91735A (pt) 1990-03-30
FI894430A (fi) 1990-03-21
CN1043397A (zh) 1990-06-27
NO893734L (no) 1990-03-21
EP0360579A1 (en) 1990-03-28

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Legal Events

Date Code Title Description
MM Patent lapsed

Owner name: M & T CHEMICALS, INC.