FI864753A - Positivt arbetande straolkaenslig blandning. - Google Patents

Positivt arbetande straolkaenslig blandning. Download PDF

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Publication number
FI864753A
FI864753A FI864753A FI864753A FI864753A FI 864753 A FI864753 A FI 864753A FI 864753 A FI864753 A FI 864753A FI 864753 A FI864753 A FI 864753A FI 864753 A FI864753 A FI 864753A
Authority
FI
Finland
Prior art keywords
dyes
radiation
compound
sensitive
positive
Prior art date
Application number
FI864753A
Other languages
English (en)
Other versions
FI84112C (fi
FI84112B (fi
FI864753A0 (fi
Inventor
Hans Ruckert
Joachim Knaul
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of FI864753A0 publication Critical patent/FI864753A0/fi
Publication of FI864753A publication Critical patent/FI864753A/fi
Application granted granted Critical
Publication of FI84112B publication Critical patent/FI84112B/fi
Publication of FI84112C publication Critical patent/FI84112C/fi

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/16—X-ray, infrared, or ultraviolet ray processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Basic Packing Technique (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
FI864753A 1985-11-25 1986-11-21 Positivt arbetande straolkaenslig blandning. FI84112C (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3541534 1985-11-25
DE19853541534 DE3541534A1 (de) 1985-11-25 1985-11-25 Positiv arbeitendes strahlungsempfindliches gemisch

Publications (4)

Publication Number Publication Date
FI864753A0 FI864753A0 (fi) 1986-11-21
FI864753A true FI864753A (fi) 1987-05-26
FI84112B FI84112B (fi) 1991-06-28
FI84112C FI84112C (fi) 1991-10-10

Family

ID=6286708

Family Applications (1)

Application Number Title Priority Date Filing Date
FI864753A FI84112C (fi) 1985-11-25 1986-11-21 Positivt arbetande straolkaenslig blandning.

Country Status (9)

Country Link
US (1) US4789619A (fi)
EP (1) EP0224161B1 (fi)
JP (1) JPS62150244A (fi)
KR (1) KR940007782B1 (fi)
AT (1) ATE76985T1 (fi)
CA (1) CA1310534C (fi)
DE (2) DE3541534A1 (fi)
FI (1) FI84112C (fi)
ZA (1) ZA868874B (fi)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3725741A1 (de) * 1987-08-04 1989-02-16 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch
DE3812326A1 (de) * 1988-04-14 1989-10-26 Basf Ag Positiv arbeitendes, strahlungsempfindliches gemisch auf basis von saeurespaltbaren und photochemisch saeurebildenden verbindungen und verfahren zur herstellung von reliefmustern und reliefbildern
JPH0820734B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 感光性組成物及びそれを用いた光重合性組成物
DE3827901A1 (de) * 1988-08-17 1990-02-22 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JPH02275956A (ja) * 1988-12-23 1990-11-09 Oki Electric Ind Co Ltd フォトレジスト組成物
GB8921116D0 (en) * 1989-09-18 1989-11-01 Du Pont Improvements in or relating to radiation sensitive compositions
US5206110A (en) * 1991-02-04 1993-04-27 Ocg Microelectronic Materials, Inc. Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye
US5250392A (en) * 1991-02-04 1993-10-05 Ocg Microelectronic Materials, Inc. Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye
JP2764769B2 (ja) * 1991-06-24 1998-06-11 富士写真フイルム株式会社 光重合性組成物
EP0599779A1 (de) * 1992-10-29 1994-06-01 OCG Microelectronic Materials AG Hochauflösender negativ arbeitender Photoresist mit grossem Prozessspielraum
US5663035A (en) * 1994-04-13 1997-09-02 Hoechst Japan Limited Radiation-sensitive mixture comprising a basic iodonium compound
DE825927T1 (de) 1996-04-23 1998-07-16 Horsell, Graphic Industries Ltd., Leeds Warmeempfindliche zusammensetzung und verfahren zur herstellung einer lithographischen druckform damit
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6001517A (en) * 1996-10-31 1999-12-14 Kabushiki Kaisha Toshiba Positive photosensitive polymer composition, method of forming a pattern and electronic parts
US6060222A (en) * 1996-11-19 2000-05-09 Kodak Polcyhrome Graphics Llc 1Postitve-working imaging composition and element and method of forming positive image with a laser
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
WO1999001796A2 (en) 1997-07-05 1999-01-14 Kodak Polychrome Graphics Llc Pattern-forming methods
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
EP0901902A3 (en) 1997-09-12 1999-03-24 Fuji Photo Film Co., Ltd. Positive photosensitive composition for use with an infrared laser
US6444393B2 (en) * 1998-03-26 2002-09-03 Fuji Photo Film Co., Ltd. Anionic infrared-ray absorbing agent, photosensitive composition and planographic printing plate precursor using same
US7255972B2 (en) * 2002-10-23 2007-08-14 Az Electronic Materials Usa Corp. Chemically amplified positive photosensitive resin composition
TW200707106A (en) * 2005-05-17 2007-02-16 Kyowa Hakko Chemical Co Ltd Photoresist composition
EP2135901A4 (en) * 2007-03-05 2013-02-13 Fujifilm Corp CONNECTION FOR PHOTORESIST, PHOTORESIST SOLUTION AND USE OF THIS PROCESS

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1117391B (de) * 1959-03-18 1961-11-16 Kalle Ag Elektrophotographisches Verfahren zur Herstellung von Druckformen
US3100703A (en) * 1961-03-13 1963-08-13 Horizons Inc Photographic process utilizing cyanine dye bases
US3109736A (en) * 1962-04-06 1963-11-05 Horizons Inc Light-sensitive merocyanine dye base compositions
DE1283093B (de) * 1965-11-10 1968-11-14 Kalle Ag Lichtempfindliche Schicht
DE1286898B (de) * 1965-11-10 1969-01-09 Kalle Ag Lichtempfindliche Schicht
FR1590914A (fi) * 1967-11-09 1970-04-20
GB1426277A (en) * 1972-04-21 1976-02-25 Eastman Kodak Co Sensitive silver halide radiogrpahic materials
US4218247A (en) * 1975-02-28 1980-08-19 Teijin Limited Photoconductive resin containing tertiary amino groups for electrophotography
AU507694B2 (en) * 1975-06-14 1980-02-21 Hoechst Aktiengesellschaft Electrophotographic reproduction
JPS5312984A (en) * 1976-07-21 1978-02-06 Konishiroku Photo Ind Photosensitive composition
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
DE2817428A1 (de) * 1978-04-21 1979-10-31 Hoechst Ag Material fuer elektrophotographische reproduktion
DE3023201A1 (de) * 1980-06-21 1982-01-07 Hoechst Ag, 6000 Frankfurt Positiv arbeitendes strahlungsempfindliches gemisch
DE3275028D1 (en) * 1981-08-24 1987-02-12 Eastman Kodak Co Merocyanine-cyanine-merocyanine (mcm) electrically photosensitive colorants
AU9012082A (en) * 1981-11-06 1983-05-12 Polychrome Corp. Light sensitive composition
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
JPS58211141A (ja) * 1982-06-02 1983-12-08 Fuji Photo Film Co Ltd ネガ型感光性平版印刷版
DE3377023D1 (en) * 1982-07-29 1988-07-14 Minnesota Mining & Mfg Triarylmethane compounds, their preparation and use as photoconductive systems
IE56081B1 (en) * 1982-11-01 1991-04-10 Microsi Inc A method of producing images of enhanced contrast in photoresists
JPS59174831A (ja) * 1983-03-24 1984-10-03 Fuji Photo Film Co Ltd 光重合性組成物
GB8333901D0 (en) * 1983-12-20 1984-02-01 Minnesota Mining & Mfg Radiationsensitive compositions
DE3406927A1 (de) * 1984-02-25 1985-08-29 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen

Also Published As

Publication number Publication date
EP0224161B1 (de) 1992-06-03
DE3685555D1 (de) 1992-07-09
KR870005272A (ko) 1987-06-05
US4789619A (en) 1988-12-06
FI84112C (fi) 1991-10-10
CA1310534C (en) 1992-11-24
ATE76985T1 (de) 1992-06-15
KR940007782B1 (ko) 1994-08-25
FI84112B (fi) 1991-06-28
EP0224161A2 (de) 1987-06-03
DE3541534A1 (de) 1987-05-27
EP0224161A3 (en) 1988-07-20
ZA868874B (en) 1987-07-29
JPS62150244A (ja) 1987-07-04
FI864753A0 (fi) 1986-11-21

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MM Patent lapsed

Owner name: HOECHST AKTIENGESELLSCHAFT