FI842910A - Foerfarande foer att aostadkomma en aerosolstroem och dess anvaendning. - Google Patents

Foerfarande foer att aostadkomma en aerosolstroem och dess anvaendning. Download PDF

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Publication number
FI842910A
FI842910A FI842910A FI842910A FI842910A FI 842910 A FI842910 A FI 842910A FI 842910 A FI842910 A FI 842910A FI 842910 A FI842910 A FI 842910A FI 842910 A FI842910 A FI 842910A
Authority
FI
Finland
Prior art keywords
aerosolstroem
foerfarande foer
foer att
och dess
dess anvaendning
Prior art date
Application number
FI842910A
Other languages
English (en)
Other versions
FI77636C (fi
FI77636B (fi
FI842910A0 (fi
Inventor
Reinhart Kuehne
Max Kuisl
Original Assignee
Licentia Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Licentia Gmbh filed Critical Licentia Gmbh
Publication of FI842910A0 publication Critical patent/FI842910A0/fi
Publication of FI842910A publication Critical patent/FI842910A/fi
Application granted granted Critical
Publication of FI77636B publication Critical patent/FI77636B/fi
Publication of FI77636C publication Critical patent/FI77636C/fi

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45519Inert gas curtains
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413Reactant delivery systems
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413Reactant delivery systems
    • C03B37/0142Reactant deposition burners
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807Reactant delivery systems, e.g. reactant deposition burners
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563Gas nozzles
    • C23C16/45576Coaxial inlets for each gas
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/04Multi-nested ports
    • C03B2207/06Concentric circular ports
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/04Multi-nested ports
    • C03B2207/08Recessed or protruding ports
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/20Specific substances in specified ports, e.g. all gas flows specified
    • C03B2207/26Multiple ports for glass precursor
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/30For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/34Liquid, e.g. mist or aerosol
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/46Comprising performance enhancing means, e.g. electrostatic charge or built-in heater

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Vapour Deposition (AREA)
  • Absorbent Articles And Supports Therefor (AREA)
  • Respiratory Apparatuses And Protective Means (AREA)
  • Silicon Compounds (AREA)
  • Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Surface Treatment Of Glass (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Colloid Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Compositions (AREA)
FI842910A 1983-07-20 1984-07-19 Foerfarande foer att foerse en kropp med en belaeggning. FI77636C (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19833326043 DE3326043A1 (de) 1983-07-20 1983-07-20 Verfahren zur herstellung eines aerosolstromes und dessen verwendung
DE3326043 1983-07-20

Publications (4)

Publication Number Publication Date
FI842910A0 FI842910A0 (fi) 1984-07-19
FI842910A true FI842910A (fi) 1985-01-21
FI77636B FI77636B (fi) 1988-12-30
FI77636C FI77636C (fi) 1989-04-10

Family

ID=6204376

Family Applications (1)

Application Number Title Priority Date Filing Date
FI842910A FI77636C (fi) 1983-07-20 1984-07-19 Foerfarande foer att foerse en kropp med en belaeggning.

Country Status (7)

Country Link
US (1) US4597983A (fi)
EP (1) EP0134507B1 (fi)
JP (1) JPS6075576A (fi)
AT (1) ATE31187T1 (fi)
CA (1) CA1222660A (fi)
DE (2) DE3326043A1 (fi)
FI (1) FI77636C (fi)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60215540A (ja) * 1984-04-06 1985-10-28 Sumitomo Electric Ind Ltd 光フアイバ−用多孔質母材の製造装置
DE3417438A1 (de) * 1984-05-11 1985-11-14 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren und vorrichtung zur herstellung eines aerosolstromes
DE3434674A1 (de) * 1984-09-21 1986-04-03 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur herstellung eines aerosolstromes
JPH07101751B2 (ja) * 1985-03-28 1995-11-01 キヤノン株式会社 光起電力素子の製造方法
DE3530153A1 (de) * 1985-08-23 1987-03-05 Licentia Gmbh Verfahren zur herstellung eines aerosolstromes
DE3672819D1 (de) * 1985-09-30 1990-08-23 Union Carbide Corp Vorrichtung und verfahren zum beschichten in einer vakuumkammer durch lichtbogendampfniederschlag.
JPH02222134A (ja) * 1989-02-23 1990-09-04 Nobuo Mikoshiba 薄膜形成装置
CA2061069C (en) * 1991-02-27 1999-06-29 Toshio Kubota Method of electrostatically spray-coating a workpiece with paint
US6312656B1 (en) 1995-12-19 2001-11-06 Corning Incorporated Method for forming silica by combustion of liquid reactants using oxygen
US5746834A (en) * 1996-01-04 1998-05-05 Memc Electronics Materials, Inc. Method and apparatus for purging barrel reactors
EP1010672A1 (en) * 1998-12-17 2000-06-21 PIRELLI CAVI E SISTEMI S.p.A. Method and apparatus for forming an optical fiber preform by combustionless hydrolysis
US6331689B1 (en) 1999-06-15 2001-12-18 Siemens Aktiengesellschaft Method and device for producing a powder aerosol and use thereof

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4002512A (en) * 1974-09-16 1977-01-11 Western Electric Company, Inc. Method of forming silicon dioxide
US4083708A (en) * 1976-09-15 1978-04-11 Exxon Research & Engineering Co. Forming a glass on a substrate
CA1080562A (en) * 1977-02-10 1980-07-01 Frederick D. King Method of and apparatus for manufacturing an optical fibre with plasma activated deposition in a tube
JPS5927728B2 (ja) * 1977-08-11 1984-07-07 日本電信電話株式会社 煤状ガラスロッドの製造方法
US4233045A (en) * 1978-11-27 1980-11-11 Corning Glass Works Apparatus and method for making optical filament preform
DE2930781A1 (de) * 1979-07-28 1981-02-12 Licentia Gmbh Verfahren zur herstellung einer lichtleitfaser
CA1166527A (en) * 1979-09-26 1984-05-01 Shiro Takahashi Method and apparatus for producing multi-component glass fiber preform
US4310474A (en) * 1980-04-02 1982-01-12 Western Electric Company, Inc. Method and apparatus for generating a vapor stream
DE3027450C2 (de) * 1980-07-19 1982-06-03 Standard Elektrik Lorenz Ag, 7000 Stuttgart Verfahren zur Innenbeschichtung eines Glas-Substratrohres für die Herstellung eines Glasfaser-Lichtleiters
WO1982003345A1 (en) * 1981-03-30 1982-10-14 Western Electric Co Universal torch
US4378987A (en) * 1981-10-15 1983-04-05 Corning Glass Works Low temperature method for making optical fibers
US4440558A (en) * 1982-06-14 1984-04-03 International Telephone And Telegraph Corporation Fabrication of optical preforms by axial chemical vapor deposition

Also Published As

Publication number Publication date
ATE31187T1 (de) 1987-12-15
CA1222660A (en) 1987-06-09
FI77636C (fi) 1989-04-10
FI77636B (fi) 1988-12-30
EP0134507A1 (de) 1985-03-20
DE3326043A1 (de) 1985-02-07
US4597983A (en) 1986-07-01
FI842910A0 (fi) 1984-07-19
DE3467891D1 (en) 1988-01-14
JPS6075576A (ja) 1985-04-27
EP0134507B1 (de) 1987-12-02

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MM Patent lapsed

Owner name: LICENTIA PATENT- VERWALTUNGS-G.M.B.H.