FI82866B - Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning. - Google Patents
Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning. Download PDFInfo
- Publication number
- FI82866B FI82866B FI862041A FI862041A FI82866B FI 82866 B FI82866 B FI 82866B FI 862041 A FI862041 A FI 862041A FI 862041 A FI862041 A FI 862041A FI 82866 B FI82866 B FI 82866B
- Authority
- FI
- Finland
- Prior art keywords
- layer
- parts
- weight
- structured
- layers
- Prior art date
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/42—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes polyesters; polyethers; polyacetals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/48—Polyethers
- C08G18/487—Polyethers containing cyclic groups
- C08G18/4879—Polyethers containing cyclic groups containing aromatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
- C08G18/8116—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group esters of acrylic or alkylacrylic acid having only one isocyanate or isothiocyanate group
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
- C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
- C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
- C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/36—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes condensation products of phenols with aldehydes or ketones
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K38/00—Medicinal preparations containing peptides
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Claims (9)
1. Förfarande för framställning av värmebeständiga strukturerade skikt genom att anbringa strälningskänsliga 5 lösliga polymerer 1 form av ett skikt eller en folie pä ett substrat, genom att besträla skiktet eller folien genom ett negativoriginal med aktiniskt ljus eller genom att rikta en ljus-, elektron-, laser- eller jonstäle, genom att avlägsna de icke-besträlade skikt- eller folie-10 omrädena och eventuellt genom därpä följande värmebehand-ling, i vilket förfarande används polyeterbaserade foto-polymerer i form av additionsprodukter av olefiniskt omättade monoisocyanater och fenoxiharts innehällande hydroxylgrupper, kännetecknat därav, att som 15 olefiniskt omättad monoisocyanat används isocyanat innehäl lande metakrylatgrupper eller additionsprodukter av hydroxietyl(met)akrylat och 2,4-di-isocyanattoluen.
2. Förfarande enligt patentkravet 1, kännetecknat därav, att fotopolymerer används tillsam- 20 mans med ljus- eller strälningskänsliga föreningar, som kan kopolymeras, i synnerhet med föreningar innehällande akrylat- och metakrylatgrupper.
3. Förfarande enligt patentkravet 1 eller 2, kännetecknat därav, att fotopolymerer används 25 tillsammans med fotoinitiatorer och/eller fotosensibili-satorer, i synnerhet α-halogenacetofenoner, dialkoxiace-tofenoner, benzoylfosfinoxider och Michlers keton.
4. Förfarande enligt nägot av patentkraven 1-3, kännetecknat därav, att som polyeter används 30 fenoxihartser, vars molekylvikt är 15 000 - 30 000.
5. Värmebeständigt strukturerat skikt, kännetecknat därav, att det är framställt med förfaran-det enligt ett eller flera av patentkraven 1-4.
6. Användning av det strukturerade skiktet enligt 35 patentkravet 5, kännetecknad därav, att det ie 82866 används som ett längvarigt skyddande lödskydds- och iso-leringsskikt inom finledningstekniken.
7. Användning av det strukturerade skiktet enligt patentkravet 5, kännetecknad därav, att det 5 används som en som mellanskydd fungerande isolering 1 strukturöverföringsförfaranden, som förverkligas genom galvanisering, torr- och vätetsning samt jonimplantation.
8. Användning av det strukturerade skiktet enligt patentkravet 5, kännetecknad därav, att det 10 används som skydds- och isoleringsmaterial inom eltekni-ken, i synnerhet inom halvledartekniken.
9. Användning av det strukturerade skiktet enligt patentkravet 5, kännetecknad därav, att det används som dämpningsmassa för markvägsfilter, som alfa- 15 strälningsskydd pä cellfälten av minneskomponenter eller som orienteringsskikt i vätskekristall-bildskärmar.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3522507 | 1985-06-24 | ||
DE3522507 | 1985-06-24 |
Publications (4)
Publication Number | Publication Date |
---|---|
FI862041A0 FI862041A0 (fi) | 1986-05-15 |
FI862041A FI862041A (fi) | 1986-12-25 |
FI82866B true FI82866B (fi) | 1991-01-15 |
FI82866C FI82866C (sv) | 1991-04-25 |
Family
ID=6274005
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI862041A FI82866C (sv) | 1985-06-24 | 1986-05-15 | Förfarande för framställning av strukturerade värmebeständiga skikt oc h deras användning |
Country Status (11)
Country | Link |
---|---|
US (1) | US4828948A (sv) |
EP (1) | EP0206159B1 (sv) |
JP (1) | JPS61296353A (sv) |
KR (1) | KR940009022B1 (sv) |
AT (1) | ATE60927T1 (sv) |
CA (1) | CA1309056C (sv) |
DE (1) | DE3677549D1 (sv) |
DK (1) | DK164064C (sv) |
FI (1) | FI82866C (sv) |
HK (1) | HK49192A (sv) |
SG (1) | SG39192G (sv) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0321821A3 (de) * | 1987-12-23 | 1991-01-16 | Siemens Aktiengesellschaft | Flüssiges, strahlenhärtbares Harz zur Sekundärbeschichtung von Lichtwellenleitern |
EP0321820A3 (de) * | 1987-12-23 | 1991-01-23 | Siemens Aktiengesellschaft | Flüssiges, strahlenhärtbares Harz zur Sekundärbeschichtung von Lichtwellenleitern |
KR920002258Y1 (ko) * | 1989-12-18 | 1992-04-06 | 구자명 | 제침기(staple remover) |
DE69130691T2 (de) * | 1990-08-02 | 1999-07-22 | Ppg Industries Inc | Lichtempfindliche, elektroabscheidbare Photoresistzusammensetzung |
US5268256A (en) * | 1990-08-02 | 1993-12-07 | Ppg Industries, Inc. | Photoimageable electrodepositable photoresist composition for producing non-tacky films |
US5268260A (en) * | 1991-10-22 | 1993-12-07 | International Business Machines Corporation | Photoresist develop and strip solvent compositions and method for their use |
US5849271A (en) * | 1995-06-07 | 1998-12-15 | The Procter & Gamble Company | Oral compositions |
JPH0985489A (ja) * | 1995-09-20 | 1997-03-31 | Sony Corp | はんだ及びはんだ付け法 |
US6048375A (en) * | 1998-12-16 | 2000-04-11 | Norton Company | Coated abrasive |
TWI384013B (zh) | 2008-10-08 | 2013-02-01 | Eternal Chemical Co Ltd | 感光型聚醯亞胺 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3694415A (en) * | 1970-07-15 | 1972-09-26 | Kiyoshi Honda | Coating resinous composition |
US3776889A (en) * | 1971-01-07 | 1973-12-04 | Powers Chemco Inc | Allyl carbamate esters of hydroxy-containing polymers |
JPS573686B2 (sv) * | 1974-02-01 | 1982-01-22 | ||
US4139436A (en) * | 1977-02-07 | 1979-02-13 | The Goodyear Tire & Rubber Company | Polyetherurethane composition and polymer prepared by photopolymerization |
US4233425A (en) * | 1978-11-15 | 1980-11-11 | The Dow Chemical Company | Addition polymerizable polyethers having pendant ethylenically unsaturated urethane groups |
US4228232A (en) * | 1979-02-27 | 1980-10-14 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing ethylenically unsaturated oligomers |
US4246391A (en) * | 1979-06-26 | 1981-01-20 | Union Carbide Corporation | Procedure for production of lower viscosity radiation-curable acrylated urethanes |
US4320221A (en) * | 1980-12-12 | 1982-03-16 | The Dow Chemical Company | Addition polymerizable isocyanate-polyol anaerobic adhesives |
US4436806A (en) * | 1981-01-16 | 1984-03-13 | W. R. Grace & Co. | Method and apparatus for making printed circuit boards |
US4442198A (en) * | 1981-01-16 | 1984-04-10 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
-
1986
- 1986-05-15 FI FI862041A patent/FI82866C/sv not_active IP Right Cessation
- 1986-06-12 EP EP86108069A patent/EP0206159B1/de not_active Expired - Lifetime
- 1986-06-12 AT AT86108069T patent/ATE60927T1/de not_active IP Right Cessation
- 1986-06-12 DE DE8686108069T patent/DE3677549D1/de not_active Expired - Fee Related
- 1986-06-20 JP JP61144674A patent/JPS61296353A/ja active Pending
- 1986-06-23 CA CA000512150A patent/CA1309056C/en not_active Expired - Fee Related
- 1986-06-23 DK DK293186A patent/DK164064C/da not_active IP Right Cessation
- 1986-06-24 US US06/877,872 patent/US4828948A/en not_active Expired - Fee Related
- 1986-06-24 KR KR1019860005026A patent/KR940009022B1/ko active IP Right Grant
-
1992
- 1992-04-08 SG SG391/92A patent/SG39192G/en unknown
- 1992-07-02 HK HK491/92A patent/HK49192A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
DK164064C (da) | 1992-09-28 |
DK293186D0 (da) | 1986-06-23 |
FI862041A (fi) | 1986-12-25 |
US4828948A (en) | 1989-05-09 |
KR870000177A (ko) | 1987-02-16 |
DK293186A (da) | 1986-12-25 |
KR940009022B1 (ko) | 1994-09-29 |
DK164064B (da) | 1992-05-04 |
EP0206159A2 (de) | 1986-12-30 |
EP0206159A3 (en) | 1988-05-11 |
FI862041A0 (fi) | 1986-05-15 |
ATE60927T1 (de) | 1991-03-15 |
HK49192A (en) | 1992-07-10 |
CA1309056C (en) | 1992-10-20 |
DE3677549D1 (de) | 1991-03-28 |
SG39192G (en) | 1992-05-22 |
EP0206159B1 (de) | 1991-02-20 |
FI82866C (sv) | 1991-04-25 |
JPS61296353A (ja) | 1986-12-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM | Patent lapsed | ||
MM | Patent lapsed |
Owner name: SIEMENS AKTIENGESELLSCHAFT |