FI59428C - Elektrod foer elektrokemiska processer - Google Patents
Elektrod foer elektrokemiska processer Download PDFInfo
- Publication number
- FI59428C FI59428C FI416/72A FI41672A FI59428C FI 59428 C FI59428 C FI 59428C FI 416/72 A FI416/72 A FI 416/72A FI 41672 A FI41672 A FI 41672A FI 59428 C FI59428 C FI 59428C
- Authority
- FI
- Finland
- Prior art keywords
- layer
- metal
- electrode
- oxides
- anode
- Prior art date
Links
- 229910052751 metal Inorganic materials 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 18
- 150000004706 metal oxides Chemical class 0.000 claims description 13
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 13
- 229910044991 metal oxide Inorganic materials 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 11
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052715 tantalum Inorganic materials 0.000 claims description 7
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 6
- 239000010953 base metal Substances 0.000 claims description 5
- 229910002804 graphite Inorganic materials 0.000 claims description 5
- 239000010439 graphite Substances 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- 239000010955 niobium Substances 0.000 claims description 5
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 5
- 229910052697 platinum Inorganic materials 0.000 claims description 5
- 229910052793 cadmium Inorganic materials 0.000 claims description 4
- 239000011572 manganese Substances 0.000 claims description 4
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 3
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 2
- DSVGQVZAZSZEEX-UHFFFAOYSA-N [C].[Pt] Chemical compound [C].[Pt] DSVGQVZAZSZEEX-UHFFFAOYSA-N 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 229910001339 C alloy Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 description 77
- 239000000243 solution Substances 0.000 description 24
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 22
- 239000002585 base Substances 0.000 description 17
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 15
- 238000005868 electrolysis reaction Methods 0.000 description 15
- 239000010936 titanium Substances 0.000 description 15
- 238000000576 coating method Methods 0.000 description 13
- 229910052719 titanium Inorganic materials 0.000 description 13
- 239000003792 electrolyte Substances 0.000 description 11
- 239000010970 precious metal Substances 0.000 description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910000510 noble metal Inorganic materials 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 229910010068 TiCl2 Inorganic materials 0.000 description 3
- 239000010405 anode material Substances 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910001936 tantalum oxide Inorganic materials 0.000 description 3
- ZWYDDDAMNQQZHD-UHFFFAOYSA-L titanium(ii) chloride Chemical compound [Cl-].[Cl-].[Ti+2] ZWYDDDAMNQQZHD-UHFFFAOYSA-L 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910000497 Amalgam Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- FRVIZQXVKAWYRM-UHFFFAOYSA-N [P].[Ba] Chemical compound [P].[Ba] FRVIZQXVKAWYRM-UHFFFAOYSA-N 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000003760 tallow Substances 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 description 2
- 229910000925 Cd alloy Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000001661 cadmium Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- WSSMOXHYUFMBLS-UHFFFAOYSA-L iron dichloride tetrahydrate Chemical compound O.O.O.O.[Cl-].[Cl-].[Fe+2] WSSMOXHYUFMBLS-UHFFFAOYSA-L 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- -1 platinum group metals Chemical class 0.000 description 1
- UUWCBFKLGFQDME-UHFFFAOYSA-N platinum titanium Chemical compound [Ti].[Pt] UUWCBFKLGFQDME-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- FWPIDFUJEMBDLS-UHFFFAOYSA-L tin(II) chloride dihydrate Chemical compound O.O.Cl[Sn]Cl FWPIDFUJEMBDLS-UHFFFAOYSA-L 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2113676A DE2113676C2 (de) | 1971-03-20 | 1971-03-20 | Elektrode für elektrochemische Prozesse |
| DE2113676 | 1971-03-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FI59428B FI59428B (fi) | 1981-04-30 |
| FI59428C true FI59428C (fi) | 1981-08-10 |
Family
ID=5802319
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI416/72A FI59428C (fi) | 1971-03-20 | 1972-02-16 | Elektrod foer elektrokemiska processer |
Country Status (15)
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS586786B2 (ja) * | 1976-03-15 | 1983-02-07 | ダイヤモンド・シヤムロツク・コ−ポレ−シヨン | 改良された電極の製造方法 |
| FR2370109A1 (fr) * | 1976-11-04 | 1978-06-02 | Rhone Poulenc Ind | Revetement d'anode |
| CA1134903A (en) * | 1979-02-12 | 1982-11-02 | Mary R. Suchanski | Electrode having mixed metal oxide catalysts |
| EP0103014A1 (en) * | 1982-03-11 | 1984-03-21 | Engelhard Corporation | PROMOTION OF Pt-Ir CATALYTIC ELECTRODES WITH LEAD, TANTALUM, RUTHENIUM AND OXYGEN |
| US4545883A (en) * | 1982-07-19 | 1985-10-08 | Energy Conversion Devices, Inc. | Electrolytic cell cathode |
| US4537674A (en) * | 1982-07-19 | 1985-08-27 | Energy Conversion Devices, Inc. | Electrolytic cell anode |
| EP0107934B1 (en) * | 1982-10-29 | 1989-01-11 | Imperial Chemical Industries Plc | Electrodes, methods of manufacturing such electrodes and use of such electrodes in electrolytic cells |
| DE3432652A1 (de) * | 1984-09-05 | 1986-03-13 | Michael Dipl.-Chem. 8068 Pfaffenhofen Gnann | Elektrode, verfahren zu ihrer herstellung und ihre verwendung |
| FR2596776B1 (fr) * | 1986-04-03 | 1988-06-03 | Atochem | Cathode pour electrolyse et un procede de fabrication de ladite cathode |
| JP2505563B2 (ja) * | 1989-01-30 | 1996-06-12 | 石福金属興業株式会社 | 電解用電極 |
| DE3905082A1 (de) * | 1989-02-18 | 1990-08-23 | Bayer Ag | Formstabile anoden und deren verwendung bei der herstellung von alkalidichromaten und chromsaeure |
| US12114572B2 (en) | 2018-12-04 | 2024-10-08 | Sumitomo Chemical Company, Limited | Compound and thermoelectric conversion material |
| JP7148635B2 (ja) | 2018-12-04 | 2022-10-05 | 住友化学株式会社 | 化合物及び熱電変換材料 |
| CN114990531B (zh) * | 2022-06-28 | 2022-12-13 | 西安泰金工业电化学技术有限公司 | 一种电解铜箔用钛阳极的清洗及再生修复方法 |
| CN115259295A (zh) * | 2022-08-12 | 2022-11-01 | 上海纳米技术及应用国家工程研究中心有限公司 | 一种用于电催化降解间苯二酚的电极制作方法及产品和应用 |
| CN116162946B (zh) * | 2022-12-30 | 2025-07-15 | 中北大学 | 一种Co-S/NixSey/C@TiO2电极及其制备方法和应用 |
| DE102023209672B3 (de) * | 2023-10-02 | 2024-10-02 | Alantum Europe Gmbh | Elektrode für elektrochemische Zellen |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3103484A (en) * | 1959-10-10 | 1963-09-10 | Anodes for electrolytic chlorine | |
| US3616445A (en) * | 1967-12-14 | 1971-10-26 | Electronor Corp | Titanium or tantalum base electrodes with applied titanium or tantalum oxide face activated with noble metals or noble metal oxides |
| US3486940A (en) * | 1968-07-30 | 1969-12-30 | Samuel Ruben | Storage battery having a positive electrode comprising a supporting base of titanium nitride having a surface film of non-polarizing material |
| US3775284A (en) * | 1970-03-23 | 1973-11-27 | J Bennett | Non-passivating barrier layer electrodes |
| US3711382A (en) * | 1970-06-04 | 1973-01-16 | Ppg Industries Inc | Bimetal spinel surfaced electrodes |
-
1971
- 1971-03-20 DE DE2113676A patent/DE2113676C2/de not_active Expired
-
1972
- 1972-01-11 GB GB119972A patent/GB1373712A/en not_active Expired
- 1972-02-04 AT AT89272A patent/AT316589B/de not_active IP Right Cessation
- 1972-02-14 IT IT20544/72A patent/IT947554B/it active
- 1972-02-14 YU YU00358/72A patent/YU35872A/xx unknown
- 1972-02-16 FI FI416/72A patent/FI59428C/fi active
- 1972-03-15 ZA ZA721787A patent/ZA721787B/xx unknown
- 1972-03-17 SE SE7203509A patent/SE447274B/xx unknown
- 1972-03-17 CA CA137,332A patent/CA1010815A/en not_active Expired
- 1972-03-17 FR FR7210106A patent/FR2130576B1/fr not_active Expired
- 1972-03-17 NO NO870/72A patent/NO141475C/no unknown
- 1972-03-18 JP JP47027114A patent/JPS5940914B1/ja active Granted
- 1972-03-20 BE BE780928A patent/BE780928A/xx not_active IP Right Cessation
- 1972-03-20 NL NLAANVRAGE7203706,A patent/NL173662C/xx not_active IP Right Cessation
- 1972-03-20 CH CH410572A patent/CH584765A5/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| FR2130576A1 (enrdf_load_stackoverflow) | 1972-11-03 |
| NO141475B (no) | 1979-12-10 |
| GB1373712A (en) | 1974-11-13 |
| FR2130576B1 (enrdf_load_stackoverflow) | 1977-03-18 |
| IT947554B (it) | 1973-05-30 |
| DE2113676A1 (de) | 1972-10-05 |
| NL173662C (nl) | 1984-02-16 |
| CA1010815A (en) | 1977-05-24 |
| JPS5940914B1 (enrdf_load_stackoverflow) | 1984-10-03 |
| DE2113676C2 (de) | 1985-09-12 |
| NL7203706A (enrdf_load_stackoverflow) | 1972-09-22 |
| AT316589B (de) | 1974-07-25 |
| YU35872A (en) | 1982-02-28 |
| FI59428B (fi) | 1981-04-30 |
| BE780928A (fr) | 1972-07-17 |
| ZA721787B (en) | 1972-12-27 |
| CH584765A5 (enrdf_load_stackoverflow) | 1977-02-15 |
| NO141475C (no) | 1989-05-24 |
| SE447274B (sv) | 1986-11-03 |
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