FI115134B - Förfarande för tillverkning av ett dopat glasmaterial - Google Patents
Förfarande för tillverkning av ett dopat glasmaterial Download PDFInfo
- Publication number
- FI115134B FI115134B FI20021269A FI20021269A FI115134B FI 115134 B FI115134 B FI 115134B FI 20021269 A FI20021269 A FI 20021269A FI 20021269 A FI20021269 A FI 20021269A FI 115134 B FI115134 B FI 115134B
- Authority
- FI
- Finland
- Prior art keywords
- starting materials
- glass material
- glass
- gas flow
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- 239000000463 material Substances 0.000 title claims abstract description 59
- 239000011521 glass Substances 0.000 title claims description 59
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000002245 particle Substances 0.000 claims abstract description 34
- 238000000034 method Methods 0.000 claims abstract description 31
- 239000000126 substance Substances 0.000 claims abstract description 7
- 239000007789 gas Substances 0.000 claims description 64
- 239000007858 starting material Substances 0.000 claims description 27
- 238000009833 condensation Methods 0.000 claims description 18
- 230000005494 condensation Effects 0.000 claims description 18
- 230000001590 oxidative effect Effects 0.000 claims description 17
- 230000008569 process Effects 0.000 claims description 13
- 230000003647 oxidation Effects 0.000 claims description 10
- 238000007254 oxidation reaction Methods 0.000 claims description 10
- 239000002243 precursor Substances 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- 239000002019 doping agent Substances 0.000 claims description 7
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 7
- 150000002910 rare earth metals Chemical class 0.000 claims description 7
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000000470 constituent Substances 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 239000001569 carbon dioxide Substances 0.000 claims description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 2
- 229910052779 Neodymium Inorganic materials 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 239000011574 phosphorus Substances 0.000 claims description 2
- 239000005049 silicon tetrachloride Substances 0.000 claims description 2
- IEXRMSFAVATTJX-UHFFFAOYSA-N tetrachlorogermane Chemical compound Cl[Ge](Cl)(Cl)Cl IEXRMSFAVATTJX-UHFFFAOYSA-N 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 1
- 150000002484 inorganic compounds Chemical class 0.000 claims 1
- 150000002894 organic compounds Chemical class 0.000 claims 1
- 239000000376 reactant Substances 0.000 abstract 4
- 229910052691 Erbium Inorganic materials 0.000 description 15
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 15
- 238000005275 alloying Methods 0.000 description 13
- 239000000835 fiber Substances 0.000 description 12
- 239000007788 liquid Substances 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 239000012071 phase Substances 0.000 description 12
- 238000002156 mixing Methods 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 239000000443 aerosol Substances 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000013307 optical fiber Substances 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- -1 Yb 2 O 3 Inorganic materials 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 238000007496 glass forming Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000005373 porous glass Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000004071 soot Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910001868 water Inorganic materials 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010285 flame spraying Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 239000008263 liquid aerosol Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000008521 reorganization Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- GXMNGLIMQIPFEB-UHFFFAOYSA-N tetraethoxygermane Chemical compound CCO[Ge](OCC)(OCC)OCC GXMNGLIMQIPFEB-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/003—Titanates
- C01G23/006—Alkaline earth titanates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/006—Compounds containing, besides zirconium, two or more other elements, with the exception of oxygen or hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/1005—Forming solid beads
- C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
- C03B2201/36—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers doped with rare earth metals and aluminium, e.g. Er-Al co-doped
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Geology (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Catalysts (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Claims (9)
1. Förfarande för tillverkning av ett dopat glasmaterial för att användas särskilt i ljusförstärkande optiska vägledare, i vilket förfarande väsent- 5 ligen alla glasmaterialet bildande utgängsämnen, bade glasmaterialets basämnen (B) och dopande ämnen (D) bringas i ett ängformigt reduce-rat tillständ tili en gasfas och därefter att reagera med varandra för att bilda glaspartiklar (P), kännetecknat av, att sagda i ett ängformigt och reducerat tillständ befintliga utgängsämnen (B, D) dopas tillsam- 10 mans som en gasströmning (BD) av utgängsämnen, vilken gasström-ning (BD) vidare kompenseras snabbt sä, att väsentligen alla beständsdelar av utgängsämnena (B, D) när väsentligen samtidigt ett övermättningstillständ och säledes bildar i samma sammanhang glaspartiklar (P) sä, att kemiska fasbalanser inte hinner uppnäs. 15
2. Förfarande enligt patentkrav 1, kännetecknat av, att den snabba kondenseringen av utgängsämnena (B, D) tili glaspartiklar (P) ästad-koms med snabb oxidation av utgängsämnena (B, D). 20
3. Förfarande enligt patentkrav 2, kännetecknat av, att sagda snabba oxidation och kondensering av utgängsämnena (B, D) ästadkoms , , genom att dopa i gasströmningen (BD) av utgängsämnena en eller flera strälar (O) av oxiderande gaser, företrädesvis strälar av oxygen och/eller koldioxid. 25
4. Förfarande enligt patentkrav 3, kännetecknat av, att sagda en eller flera strälar (O) av oxiderande gaser dopas i gasströmningen (BD) av utgängsämnena pä ett sätt som alstrar stark turbulens och blandning. 30
5. Förfarande enligt patentkrav 3, kännetecknat av, att bildningen av glaspartiklar (P) effektiveras genom att införa sagda en eller flera strälar (O) av oxiderande gaser i gasströmningen (BD) av utgängsämnena kallare än sagda gasströmning. 35
6. Förfarande enligt patentkrav 1, kännetecknat av, att den snabba kondenseringen av utgängsämnena (B, D) tili glaspartiklar (P) ästad- 115134 koms och/eller effektiveras genom att utvidga gasströmningen (BD) av utgängsämnena adiabatiskt.
7. Förfarande enligt patentkrav6, kännetecknat av, att gasström-5 ningen (BD) av utgängsämnena leds genom ett Lavall-munstycke (LR) eller dylikt.
8. Förfarande enligt nägot av de föregäende patentkraven, kännetecknat av att som basämnet (B) för glasmaterialet används en 10 oorganisk eller organisk förening av kisel eller germanium, säsom kiseltetraklorid, germaniumtetraklorid, TEOS (eng. Tetraethylorto-silicate) eller GEOS (eng. tetraethoxygermanium).
9. Förfarande enligt nägot av de föregäende patentkraven, känne-15 tecknat av, att som det dopande ämnet (D) för glasmaterialet används erbium, neodym, nägon annan sällsynt jordmetall, alumin, fosfor, bor och/eller fluor. 1 I * » » *
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20021269A FI115134B (sv) | 2002-06-28 | 2002-06-28 | Förfarande för tillverkning av ett dopat glasmaterial |
| EP03735740A EP1539648B1 (en) | 2002-06-28 | 2003-06-27 | A method for the preparation of doped oxide material |
| PCT/FI2003/000522 WO2004002907A1 (en) | 2002-06-28 | 2003-06-27 | A method for the preparation of doped oxide material |
| CNB03815238XA CN1301925C (zh) | 2002-06-28 | 2003-06-27 | 制备掺杂氧化物材料的方法 |
| US10/518,006 US7624596B2 (en) | 2002-06-28 | 2003-06-27 | Method for the preparation of doped oxide material |
| AT03735740T ATE348079T1 (de) | 2002-06-28 | 2003-06-27 | Verfahren zur herstellung von dotiertem oxidmaterial |
| DE60310420T DE60310420T2 (de) | 2002-06-28 | 2003-06-27 | Verfahren zur herstellung von dotiertem oxidischen material |
| JP2004516824A JP2005531481A (ja) | 2002-06-28 | 2003-06-27 | ドープされた酸化物材料の調製方法 |
| AU2003238120A AU2003238120A1 (en) | 2002-06-28 | 2003-06-27 | A method for the preparation of doped oxide material |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20021269A FI115134B (sv) | 2002-06-28 | 2002-06-28 | Förfarande för tillverkning av ett dopat glasmaterial |
| FI20021269 | 2002-06-28 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| FI20021269A0 FI20021269A0 (sv) | 2002-06-28 |
| FI20021269A FI20021269A (sv) | 2003-12-29 |
| FI115134B true FI115134B (sv) | 2005-03-15 |
Family
ID=8564253
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI20021269A FI115134B (sv) | 2002-06-28 | 2002-06-28 | Förfarande för tillverkning av ett dopat glasmaterial |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7624596B2 (sv) |
| EP (1) | EP1539648B1 (sv) |
| JP (1) | JP2005531481A (sv) |
| CN (1) | CN1301925C (sv) |
| AT (1) | ATE348079T1 (sv) |
| AU (1) | AU2003238120A1 (sv) |
| DE (1) | DE60310420T2 (sv) |
| FI (1) | FI115134B (sv) |
| WO (1) | WO2004002907A1 (sv) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040132101A1 (en) | 2002-09-27 | 2004-07-08 | Xencor | Optimized Fc variants and methods for their generation |
| US20090010920A1 (en) | 2003-03-03 | 2009-01-08 | Xencor, Inc. | Fc Variants Having Decreased Affinity for FcyRIIb |
| FI116619B (sv) * | 2004-07-02 | 2006-01-13 | Liekki Oy | Förfarande och anordning för att tillverka optiskt material, samt optisk vågledare |
| US20070116896A1 (en) * | 2005-11-23 | 2007-05-24 | Samsung Electro-Mechanics Co., Ltd. | Method for manufacturing front scattering film having no wavelength dependency |
| FI121336B (sv) * | 2006-03-27 | 2010-10-15 | Beneq Oy | Hydrofob glasyta |
| FR2939246B1 (fr) * | 2008-12-02 | 2010-12-24 | Draka Comteq France | Fibre optique amplificatrice et procede de fabrication |
| GB2478307A (en) | 2010-03-02 | 2011-09-07 | Heraeus Quartz Uk Ltd | Manufacture of silica glass |
| CN102626614B (zh) * | 2012-03-21 | 2013-12-25 | 陕西科技大学 | 一种光催化型光导材料的制备方法 |
| GB201520539D0 (en) | 2015-11-23 | 2016-01-06 | Immunocore Ltd & Adaptimmune Ltd | Peptides |
| GB201520542D0 (en) | 2015-11-23 | 2016-01-06 | Immunocore Ltd & Adaptimmune Ltd | Peptides |
| GB201520548D0 (en) | 2015-11-23 | 2016-01-06 | Immunocore Ltd & Adaptimmune Ltd | Peptides |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3698936A (en) * | 1969-12-19 | 1972-10-17 | Texas Instruments Inc | Production of very high purity metal oxide articles |
| US3737292A (en) * | 1972-01-03 | 1973-06-05 | Corning Glass Works | Method of forming optical waveguide fibers |
| US4212663A (en) * | 1978-01-26 | 1980-07-15 | Corning Glass Works | Reactants delivery system for optical waveguide manufacturing |
| US4278458A (en) | 1979-02-07 | 1981-07-14 | Bell Telephone Laboratories, Incorporated | Optical fiber fabrication method and apparatus |
| CA1166527A (en) * | 1979-09-26 | 1984-05-01 | Shiro Takahashi | Method and apparatus for producing multi-component glass fiber preform |
| US4501602A (en) | 1982-09-15 | 1985-02-26 | Corning Glass Works | Process for making sintered glasses and ceramics |
| US5188648A (en) * | 1985-07-20 | 1993-02-23 | U.S. Philips Corp. | Method of manufacturing optical fibres |
| JPS6283324A (ja) | 1985-10-07 | 1987-04-16 | Kogyo Kaihatsu Kenkyusho | 光学ガラスの製造方法 |
| US5059230A (en) * | 1990-01-22 | 1991-10-22 | At&T Bell Laboratories | Fabrication of doped filament optical fibers |
| US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
| JP2669976B2 (ja) * | 1991-09-24 | 1997-10-29 | 国際電信電話株式会社 | 光増幅器用エルビウムド−プファイバ |
| JPH05105471A (ja) | 1991-10-11 | 1993-04-27 | Fujikura Ltd | 光フアイバ母材の製造方法 |
| KR100342189B1 (ko) * | 1995-07-12 | 2002-11-30 | 삼성전자 주식회사 | 휘발성복합체를사용한희토류원소첨가광섬유제조방법 |
| DE19725955C1 (de) * | 1997-06-19 | 1999-01-21 | Heraeus Quarzglas | Verfahren zur Herstellung eines Quarzglasrohlings und dafür geeignete Vorrichtung |
| FI116469B (sv) | 1998-10-05 | 2005-11-30 | Liekki Oy | Flamsprutningsförfarande och -anordning för tillverkning av en flerkomponentglas |
| US20020005051A1 (en) * | 2000-04-28 | 2002-01-17 | Brown John T. | Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same |
-
2002
- 2002-06-28 FI FI20021269A patent/FI115134B/sv not_active IP Right Cessation
-
2003
- 2003-06-27 CN CNB03815238XA patent/CN1301925C/zh not_active Expired - Lifetime
- 2003-06-27 AT AT03735740T patent/ATE348079T1/de not_active IP Right Cessation
- 2003-06-27 EP EP03735740A patent/EP1539648B1/en not_active Expired - Lifetime
- 2003-06-27 US US10/518,006 patent/US7624596B2/en active Active
- 2003-06-27 WO PCT/FI2003/000522 patent/WO2004002907A1/en active IP Right Grant
- 2003-06-27 DE DE60310420T patent/DE60310420T2/de not_active Expired - Lifetime
- 2003-06-27 JP JP2004516824A patent/JP2005531481A/ja active Pending
- 2003-06-27 AU AU2003238120A patent/AU2003238120A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| ATE348079T1 (de) | 2007-01-15 |
| DE60310420D1 (de) | 2007-01-25 |
| EP1539648B1 (en) | 2006-12-13 |
| EP1539648A1 (en) | 2005-06-15 |
| AU2003238120A1 (en) | 2004-01-19 |
| WO2004002907A1 (en) | 2004-01-08 |
| CN1301925C (zh) | 2007-02-28 |
| JP2005531481A (ja) | 2005-10-20 |
| FI20021269A0 (sv) | 2002-06-28 |
| DE60310420T2 (de) | 2007-09-20 |
| FI20021269A (sv) | 2003-12-29 |
| US20050241341A1 (en) | 2005-11-03 |
| CN1665747A (zh) | 2005-09-07 |
| US7624596B2 (en) | 2009-12-01 |
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