ES557671A0 - Procedimiento pra la obtencion de acetales o cetales ciclicos de beta-cetoesteres o -amidas. - Google Patents

Procedimiento pra la obtencion de acetales o cetales ciclicos de beta-cetoesteres o -amidas.

Info

Publication number
ES557671A0
ES557671A0 ES557671A ES557671A ES557671A0 ES 557671 A0 ES557671 A0 ES 557671A0 ES 557671 A ES557671 A ES 557671A ES 557671 A ES557671 A ES 557671A ES 557671 A0 ES557671 A0 ES 557671A0
Authority
ES
Spain
Prior art keywords
ketals
cytical
cetoesteres
amidas
beta
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES557671A
Other languages
English (en)
Other versions
ES8801814A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of ES8801814A1 publication Critical patent/ES8801814A1/es
Publication of ES557671A0 publication Critical patent/ES557671A0/es
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D319/00—Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D319/04—1,3-Dioxanes; Hydrogenated 1,3-dioxanes
    • C07D319/06—1,3-Dioxanes; Hydrogenated 1,3-dioxanes not condensed with other rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
    • C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
    • C07D317/14—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D317/30—Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Compounds That Contain Two Or More Ring Oxygen Atoms (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
ES557671A 1985-05-15 1987-08-14 Procedimiento pra la obtencion de acetales o cetales ciclicos de beta-cetoesteres o -amidas. Expired ES8801814A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH208985 1985-05-15

Publications (2)

Publication Number Publication Date
ES8801814A1 ES8801814A1 (es) 1988-02-16
ES557671A0 true ES557671A0 (es) 1988-02-16

Family

ID=4225635

Family Applications (3)

Application Number Title Priority Date Filing Date
ES554919A Expired ES8802224A1 (es) 1985-05-15 1986-05-13 Procedimiento para la obtencion de acetales o cetales ciclicos de b-cetoesteres o-amidas
ES557672A Expired ES8801869A1 (es) 1985-05-15 1987-08-14 Procedimiento para la obtencion de imagagenes positivas empleando acetales o cetales ciclicos de beta-cetoesteres o amidas.
ES557671A Expired ES8801814A1 (es) 1985-05-15 1987-08-14 Procedimiento pra la obtencion de acetales o cetales ciclicos de beta-cetoesteres o -amidas.

Family Applications Before (2)

Application Number Title Priority Date Filing Date
ES554919A Expired ES8802224A1 (es) 1985-05-15 1986-05-13 Procedimiento para la obtencion de acetales o cetales ciclicos de b-cetoesteres o-amidas
ES557672A Expired ES8801869A1 (es) 1985-05-15 1987-08-14 Procedimiento para la obtencion de imagagenes positivas empleando acetales o cetales ciclicos de beta-cetoesteres o amidas.

Country Status (6)

Country Link
US (2) US4737426A (es)
EP (1) EP0202196B1 (es)
JP (2) JPH0811753B2 (es)
CA (1) CA1281728C (es)
DE (1) DE3662397D1 (es)
ES (3) ES8802224A1 (es)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3730783A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3730785A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3730787A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3810631A1 (de) * 1988-03-29 1989-10-12 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial mit hohem waermestand
DE58900825D1 (de) * 1988-06-13 1992-03-26 Ciba Geigy Ag Ungesaettigte beta-ketoesteracetale und ihre anwendungen.
JPH02101462A (ja) * 1988-10-11 1990-04-13 Matsushita Electric Ind Co Ltd パターン形成材料
DE3837438A1 (de) * 1988-11-04 1990-05-10 Basf Ag Strahlungsempfindliches gemisch
DE3837513A1 (de) * 1988-11-04 1990-05-10 Basf Ag Strahlungsempfindliches gemisch
DE3841437A1 (de) * 1988-12-09 1990-06-13 Basf Ag Strahlungsempfindliches gemisch
US5220037A (en) * 1989-07-22 1993-06-15 Basf Aktiengesellschaft Sulfonium salts and use thereof
DE3930086A1 (de) * 1989-09-09 1991-03-21 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
EP0502819A1 (de) * 1991-03-01 1992-09-09 Ciba-Geigy Ag Säurekatalytisch vernetzbare Copolymere
EP0501919A1 (de) * 1991-03-01 1992-09-02 Ciba-Geigy Ag Strahlungsempfindliche Zusammensetzungen auf der Basis von Polyphenolen und Acetalen
JPH07140666A (ja) * 1993-06-04 1995-06-02 Internatl Business Mach Corp <Ibm> マイクロリトグラフィックレジスト組成物、酸不安定化合物、マイクロリトグラフィックレリーフ画像形成方法及び酸感知性ポリマー組成物
US6143472A (en) * 1998-11-18 2000-11-07 Wako Pure Chemical Industries, Ltd. Resist composition and a method for formation of a pattern using the composition
US5998092A (en) * 1998-05-27 1999-12-07 Clariant International, Ltd. Water soluble negative-working photoresist composition
JP3299214B2 (ja) 1999-03-12 2002-07-08 松下電器産業株式会社 パターン形成材料及びパターン形成方法
US20030009005A1 (en) * 2000-03-02 2003-01-09 Uta Glufke Acetoacetylated diamines and polyamines
KR100975793B1 (ko) * 2002-10-23 2010-08-16 에이제토 엘렉토로닉 마티리알즈 가부시키가이샤 화학 증폭 포지티브형 감광성 수지 조성물
JP2006058430A (ja) * 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4511383B2 (ja) * 2005-02-23 2010-07-28 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
ES2416337T3 (es) 2005-11-22 2013-07-31 Segetis, Inc. Cetales de glicerol levulinato y su uso
CN102239156B (zh) * 2008-09-25 2014-10-15 塞格提斯有限公司 缩酮酯衍生物
CN102459219A (zh) * 2009-06-22 2012-05-16 赛格提斯公司 缩酮化合物及其用途
DE102010009024A1 (de) 2010-02-24 2011-08-25 Siemens Aktiengesellschaft, 80333 HF-Resonatorkavität und Beschleuniger
CA2792018A1 (en) 2010-05-10 2011-11-17 Segetis, Inc. Fragrant formulations, methods of manufacture thereof and articles comprising the same
CN103069343B (zh) * 2010-08-12 2015-09-09 赛格提斯有限公司 羧基酯缩酮除去组合物、其制造方法及应用
BR112013002991A2 (pt) 2010-08-12 2016-08-16 Segetis Inc composições de revestimento de látex incluindo carboxiéster cetal coalescentes, métodos de fabricação e usos dos mesmos
US8632612B2 (en) 2010-09-07 2014-01-21 Segetis, Inc. Compositions for dyeing keratin fibers
CN103097604A (zh) 2010-09-13 2013-05-08 赛格提斯有限公司 织物软化剂组合物及其制造方法
WO2012054505A2 (en) 2010-10-18 2012-04-26 Segetis, Inc. Water reducible coating compositions including carboxy ester ketals, methods of manufacture, and uses thereof
KR20140009179A (ko) * 2010-11-11 2014-01-22 세게티스, 인코포레이티드. 폴리케탈 부가물, 그의 제조방법 및 용도
EP2638037A4 (en) * 2010-11-11 2015-02-18 Segetis Inc POLY-HYDROXYKETALESTER ADDUCTS, MANUFACTURING METHOD AND USES THEREOF
US20130087073A1 (en) * 2011-10-11 2013-04-11 Segetis, Inc. Stabilized levulinic ester ketals
WO2014047428A1 (en) 2012-09-21 2014-03-27 Segetis, Inc. Cleaning, surfactant, and personal care compositions
AU2013352172A1 (en) 2012-11-29 2015-06-11 Gfbiochemicals Limited Carboxy ester ketals, methods of manufacture, and uses thereof
EP4412987A1 (en) * 2021-11-26 2024-08-14 Arxada AG Acetoacetate based ketals

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1017979A (en) * 1963-12-02 1966-01-26 Shell Int Research Improvements in or relating to the preparation of chloro-acetoacetamides and to substituted dioxolan derivatives of acetic acid esters as intermediates in said preparation
US3515552A (en) * 1966-09-16 1970-06-02 Minnesota Mining & Mfg Light-sensitive imaging sheet and method of using
US3536489A (en) * 1966-09-16 1970-10-27 Minnesota Mining & Mfg Heterocyclic iminoaromatic-halogen containing photoinitiator light sensitive compositions
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3991033A (en) * 1975-01-30 1976-11-09 E. I. Du Pont De Nemours & Company Photosensitive and degradable polyoxymethylene polymers and their application in imaging
CH621416A5 (es) * 1975-03-27 1981-01-30 Hoechst Ag
JPS51127078A (en) * 1975-04-28 1976-11-05 Nippon Chem Ind Co Ltd:The A process for preparing beta-ethylenedioxy- phenyl propionic acid esters
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse
DE2829512A1 (de) * 1978-07-05 1980-01-17 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
DE2829511A1 (de) * 1978-07-05 1980-01-24 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
JPS55118030A (en) * 1979-03-06 1980-09-10 Fuji Photo Film Co Ltd Photopolymerizable composition
US4294909A (en) * 1979-12-26 1981-10-13 E. I. Du Pont De Nemours And Company Photosensitive negative-working toning process
US4356252A (en) * 1979-12-26 1982-10-26 E. I. Du Pont De Nemours And Company Photosensitive negative-working tonable element
US4339567A (en) * 1980-03-07 1982-07-13 Ciba-Geigy Corporation Photopolymerization by means of sulphoxonium salts
NL8001885A (nl) * 1980-03-31 1981-11-02 Akzo Nv Intiator-systeem voor door straling hardbare composities.
US4383025A (en) * 1980-07-10 1983-05-10 Ciba-Geigy Corporation Photopolymerization by means of sulfoxonium salts
US4398014A (en) * 1980-11-04 1983-08-09 Ciba-Geigy Corporation Sulfoxonium salts and their use as polymerization catalysts
US4371605A (en) * 1980-12-09 1983-02-01 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
US4510290A (en) * 1982-01-11 1985-04-09 Ciba Geigy Corporation Acid-curable composition containing a masked curing catalyst, and a process for the curing thereof
GB2120263B (en) * 1982-05-17 1985-07-31 Ciba Geigy Ag A process for curing acid-curable abrasive compositions
US4505858A (en) * 1982-10-12 1985-03-19 Ciba-Geigy Corporation Process for producing 3,4,9,10-tetrathioperylene and 3,4,9,10-tetraselenoperylene

Also Published As

Publication number Publication date
CA1281728C (en) 1991-03-19
JP2620589B2 (ja) 1997-06-18
JPS61277679A (ja) 1986-12-08
ES8801814A1 (es) 1988-02-16
EP0202196A2 (de) 1986-11-20
JPH0822127A (ja) 1996-01-23
ES554919A0 (es) 1988-04-16
US4737426A (en) 1988-04-12
ES8801869A1 (es) 1988-02-16
ES8802224A1 (es) 1988-04-16
US4806448A (en) 1989-02-21
DE3662397D1 (en) 1989-04-20
EP0202196B1 (de) 1989-03-15
ES557672A0 (es) 1988-02-16
EP0202196A3 (en) 1987-10-28
JPH0811753B2 (ja) 1996-02-07

Similar Documents

Publication Publication Date Title
ES557671A0 (es) Procedimiento pra la obtencion de acetales o cetales ciclicos de beta-cetoesteres o -amidas.
ES555050A0 (es) Procedimiento para la obtencion de aril-ciclopropil-oxiranos
ES539781A0 (es) Procedimiento para la obtencion de 5-amino-fenil-pirazoles sustituidos
ES552397A0 (es) Procedimiento para la obtencion de poli-hidro piridazo diacepinas, triacepinas o diazocinas
ES540597A0 (es) Procedimiento para la obtencion de piridonas.
ES544341A0 (es) Procedimiento para la obtencion de heteroariloxiacetamidas
ES542207A0 (es) Procedimiento para la obtencion de tetrahidrofuran-2-ilmeti-laminas
ES531103A0 (es) Procedimiento para la obtencion de benzofuranonas
ES545967A0 (es) Procedimiento para la obtencion de poliarilensulfuro
ES550219A0 (es) Procedimiento para la obtencion de aminopolieteres alcoxi- lados
ES549255A0 (es) Procedimiento para la obtencion de halogeno-hidroxi-flavonas
MX155867A (es) Procedimiento para la preparacion de glioxal,de alquilglioxales y de sus acetales
ES526891A0 (es) Procedimiento para la obtencion de benzofuranonas
ES546560A0 (es) Procedimiento para la obtencion de 1-(2-oxiaminocarbonilfe- nilsulfonil)-3-heteroaril-ureas
ES543820A0 (es) Procedimiento para la obtencion de piperacinil-oxo-quinoli- nas
ES530257A0 (es) Procedimiento para la obtencion de azolilmetilcicloalcanos
ES549266A0 (es) Procedimiento para la obtencion de n-halo-carbonil-fenilhi- drazinas substituidas
ES545081A0 (es) Procedimiento para la obtencion de acidos quinolona- o bien naftiridona-carboxilicos
ES554606A0 (es) Procedimiento para la obtencion de piridiletil-dihidropiridinas
ES546681A0 (es) Procedimiento para la obtencion de fenilsulfonilazoles sus- tituidos
ES546549A0 (es) Procedimiento para la obtencion de fluoralcoxifenilsulfonil-guanidinas
ES546561A0 (es) Procedimiento para la obtencion de 1-(2-oxiaminosulfonilfe- nilsulfonil)-3-heteroaril-ureas
ES549429A0 (es) Procedimiento para la obtencion de acemetacina.
ES546192A0 (es) Procedimiento para la obtencion de benzotiazolsulfenamidas
ES540412A0 (es) Procedimiento para la obtencion de oxiranos sustituidos

Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 20010402