ES557672A0 - Procedimiento para la obtencion de imagagenes positivas empleando acetales o cetales ciclicos de beta-cetoesteres o amidas. - Google Patents

Procedimiento para la obtencion de imagagenes positivas empleando acetales o cetales ciclicos de beta-cetoesteres o amidas.

Info

Publication number
ES557672A0
ES557672A0 ES557672A ES557672A ES557672A0 ES 557672 A0 ES557672 A0 ES 557672A0 ES 557672 A ES557672 A ES 557672A ES 557672 A ES557672 A ES 557672A ES 557672 A0 ES557672 A0 ES 557672A0
Authority
ES
Spain
Prior art keywords
cetoesters
amides
beta
procedure
positive images
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES557672A
Other languages
English (en)
Other versions
ES8801869A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of ES8801869A1 publication Critical patent/ES8801869A1/es
Publication of ES557672A0 publication Critical patent/ES557672A0/es
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D319/00—Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D319/04—1,3-Dioxanes; Hydrogenated 1,3-dioxanes
    • C07D319/06—1,3-Dioxanes; Hydrogenated 1,3-dioxanes not condensed with other rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
    • C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
    • C07D317/14—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D317/30—Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Compounds That Contain Two Or More Ring Oxygen Atoms (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
ES557672A 1985-05-15 1987-08-14 Procedimiento para la obtencion de imagagenes positivas empleando acetales o cetales ciclicos de beta-cetoesteres o amidas. Expired ES8801869A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH208985 1985-05-15

Publications (2)

Publication Number Publication Date
ES8801869A1 ES8801869A1 (es) 1988-02-16
ES557672A0 true ES557672A0 (es) 1988-02-16

Family

ID=4225635

Family Applications (3)

Application Number Title Priority Date Filing Date
ES554919A Expired ES8802224A1 (es) 1985-05-15 1986-05-13 Procedimiento para la obtencion de acetales o cetales ciclicos de b-cetoesteres o-amidas
ES557672A Expired ES8801869A1 (es) 1985-05-15 1987-08-14 Procedimiento para la obtencion de imagagenes positivas empleando acetales o cetales ciclicos de beta-cetoesteres o amidas.
ES557671A Expired ES8801814A1 (es) 1985-05-15 1987-08-14 Procedimiento pra la obtencion de acetales o cetales ciclicos de beta-cetoesteres o -amidas.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
ES554919A Expired ES8802224A1 (es) 1985-05-15 1986-05-13 Procedimiento para la obtencion de acetales o cetales ciclicos de b-cetoesteres o-amidas

Family Applications After (1)

Application Number Title Priority Date Filing Date
ES557671A Expired ES8801814A1 (es) 1985-05-15 1987-08-14 Procedimiento pra la obtencion de acetales o cetales ciclicos de beta-cetoesteres o -amidas.

Country Status (6)

Country Link
US (2) US4737426A (es)
EP (1) EP0202196B1 (es)
JP (2) JPH0811753B2 (es)
CA (1) CA1281728C (es)
DE (1) DE3662397D1 (es)
ES (3) ES8802224A1 (es)

Families Citing this family (38)

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DE3730785A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3730783A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3730787A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3810631A1 (de) * 1988-03-29 1989-10-12 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial mit hohem waermestand
EP0347381B1 (de) * 1988-06-13 1992-02-12 Ciba-Geigy Ag Ungesättigte beta-Ketoesteracetale und ihre Anwendungen
JPH02101462A (ja) * 1988-10-11 1990-04-13 Matsushita Electric Ind Co Ltd パターン形成材料
DE3837513A1 (de) * 1988-11-04 1990-05-10 Basf Ag Strahlungsempfindliches gemisch
DE3837438A1 (de) * 1988-11-04 1990-05-10 Basf Ag Strahlungsempfindliches gemisch
DE3841437A1 (de) * 1988-12-09 1990-06-13 Basf Ag Strahlungsempfindliches gemisch
US5220037A (en) * 1989-07-22 1993-06-15 Basf Aktiengesellschaft Sulfonium salts and use thereof
DE3930086A1 (de) * 1989-09-09 1991-03-21 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
EP0502819A1 (de) * 1991-03-01 1992-09-09 Ciba-Geigy Ag Säurekatalytisch vernetzbare Copolymere
EP0501919A1 (de) * 1991-03-01 1992-09-02 Ciba-Geigy Ag Strahlungsempfindliche Zusammensetzungen auf der Basis von Polyphenolen und Acetalen
JPH07140666A (ja) * 1993-06-04 1995-06-02 Internatl Business Mach Corp <Ibm> マイクロリトグラフィックレジスト組成物、酸不安定化合物、マイクロリトグラフィックレリーフ画像形成方法及び酸感知性ポリマー組成物
US6143472A (en) * 1998-11-18 2000-11-07 Wako Pure Chemical Industries, Ltd. Resist composition and a method for formation of a pattern using the composition
US5998092A (en) * 1998-05-27 1999-12-07 Clariant International, Ltd. Water soluble negative-working photoresist composition
JP3299214B2 (ja) 1999-03-12 2002-07-08 松下電器産業株式会社 パターン形成材料及びパターン形成方法
AU2001260093A1 (en) * 2000-03-02 2001-09-12 Lonza A.G. Acetoacetylated diamines and polyamines
KR100975793B1 (ko) * 2002-10-23 2010-08-16 에이제토 엘렉토로닉 마티리알즈 가부시키가이샤 화학 증폭 포지티브형 감광성 수지 조성물
JP2006058430A (ja) * 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4511383B2 (ja) * 2005-02-23 2010-07-28 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
IN263389B (es) * 2005-11-22 2014-01-31 Segetis Inc
US8575367B2 (en) 2008-09-25 2013-11-05 Segetis, Inc. Ketal ester derivatives
WO2010151558A1 (en) * 2009-06-22 2010-12-29 Segetis, Inc. Ketal compounds and uses thereof
DE102010009024A1 (de) 2010-02-24 2011-08-25 Siemens Aktiengesellschaft, 80333 HF-Resonatorkavität und Beschleuniger
CA2792018A1 (en) 2010-05-10 2011-11-17 Segetis, Inc. Fragrant formulations, methods of manufacture thereof and articles comprising the same
JP5805764B2 (ja) * 2010-08-12 2015-11-10 セゲティス インコーポレーテッドＳｅｇｅｔｉｓ，Ｉｎｃ カルボキシエステルケタール除去組成物、それらの製造方法及びそれらの使用
BR112013002991A2 (pt) 2010-08-12 2016-08-16 Segetis Inc composições de revestimento de látex incluindo carboxiéster cetal coalescentes, métodos de fabricação e usos dos mesmos
WO2012033813A2 (en) 2010-09-07 2012-03-15 Segetis, Inc. Compositions for dyeing keratin fibers
US8188030B2 (en) 2010-09-13 2012-05-29 Segetis, Inc. Fabric softener compositions and methods of manufacture thereof
CN103154158B (zh) 2010-10-18 2017-04-05 Gf生化有限公司 包含羧基酯缩酮的水可稀释型涂料组合物、其生产方法和用途
US9187598B2 (en) * 2010-11-11 2015-11-17 Segetis, Inc. Polyhydroxy ketal ester adducts, methods of manufacture and uses thereof
EP2638096A4 (en) * 2010-11-11 2014-05-28 Segetis Inc POLYCETAL ADDITION PRODUCTS, METHODS OF MANUFACTURE AND USE THEREOF
US20130087073A1 (en) * 2011-10-11 2013-04-11 Segetis, Inc. Stabilized levulinic ester ketals
US9458414B2 (en) 2012-09-21 2016-10-04 Gfbiochemicals Limited Cleaning, surfactant, and personal care compositions
AU2013352172A1 (en) 2012-11-29 2015-06-11 Gfbiochemicals Limited Carboxy ester ketals, methods of manufacture, and uses thereof
WO2023094654A1 (en) * 2021-11-26 2023-06-01 Arxada Ag Acetoacetate based ketals

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1017979A (en) * 1963-12-02 1966-01-26 Shell Int Research Improvements in or relating to the preparation of chloro-acetoacetamides and to substituted dioxolan derivatives of acetic acid esters as intermediates in said preparation
US3515552A (en) * 1966-09-16 1970-06-02 Minnesota Mining & Mfg Light-sensitive imaging sheet and method of using
US3536489A (en) * 1966-09-16 1970-10-27 Minnesota Mining & Mfg Heterocyclic iminoaromatic-halogen containing photoinitiator light sensitive compositions
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3991033A (en) * 1975-01-30 1976-11-09 E. I. Du Pont De Nemours & Company Photosensitive and degradable polyoxymethylene polymers and their application in imaging
CH621416A5 (es) * 1975-03-27 1981-01-30 Hoechst Ag
JPS51127078A (en) * 1975-04-28 1976-11-05 Nippon Chem Ind Co Ltd:The A process for preparing beta-ethylenedioxy- phenyl propionic acid esters
DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
DE2829511A1 (de) * 1978-07-05 1980-01-24 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
DE2829512A1 (de) * 1978-07-05 1980-01-17 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
JPS55118030A (en) * 1979-03-06 1980-09-10 Fuji Photo Film Co Ltd Photopolymerizable composition
US4356252A (en) * 1979-12-26 1982-10-26 E. I. Du Pont De Nemours And Company Photosensitive negative-working tonable element
US4294909A (en) * 1979-12-26 1981-10-13 E. I. Du Pont De Nemours And Company Photosensitive negative-working toning process
US4339567A (en) * 1980-03-07 1982-07-13 Ciba-Geigy Corporation Photopolymerization by means of sulphoxonium salts
NL8001885A (nl) * 1980-03-31 1981-11-02 Akzo Nv Intiator-systeem voor door straling hardbare composities.
US4383025A (en) * 1980-07-10 1983-05-10 Ciba-Geigy Corporation Photopolymerization by means of sulfoxonium salts
US4398014A (en) * 1980-11-04 1983-08-09 Ciba-Geigy Corporation Sulfoxonium salts and their use as polymerization catalysts
US4371605A (en) * 1980-12-09 1983-02-01 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
US4510290A (en) * 1982-01-11 1985-04-09 Ciba Geigy Corporation Acid-curable composition containing a masked curing catalyst, and a process for the curing thereof
GB2120263B (en) * 1982-05-17 1985-07-31 Ciba Geigy Ag A process for curing acid-curable abrasive compositions
US4505858A (en) * 1982-10-12 1985-03-19 Ciba-Geigy Corporation Process for producing 3,4,9,10-tetrathioperylene and 3,4,9,10-tetraselenoperylene

Also Published As

Publication number Publication date
ES8801869A1 (es) 1988-02-16
EP0202196A2 (de) 1986-11-20
CA1281728C (en) 1991-03-19
JP2620589B2 (ja) 1997-06-18
DE3662397D1 (en) 1989-04-20
US4737426A (en) 1988-04-12
ES8802224A1 (es) 1988-04-16
ES8801814A1 (es) 1988-02-16
JPH0822127A (ja) 1996-01-23
ES557671A0 (es) 1988-02-16
JPS61277679A (ja) 1986-12-08
EP0202196B1 (de) 1989-03-15
ES554919A0 (es) 1988-04-16
US4806448A (en) 1989-02-21
EP0202196A3 (en) 1987-10-28
JPH0811753B2 (ja) 1996-02-07

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