ES393737A1 - Dispositivo semiconductor de memoria. - Google Patents

Dispositivo semiconductor de memoria.

Info

Publication number
ES393737A1
ES393737A1 ES393737A ES393737A ES393737A1 ES 393737 A1 ES393737 A1 ES 393737A1 ES 393737 A ES393737 A ES 393737A ES 393737 A ES393737 A ES 393737A ES 393737 A1 ES393737 A1 ES 393737A1
Authority
ES
Spain
Prior art keywords
regions
control electrode
insulating layer
erasing
writing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES393737A
Other languages
English (en)
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NCR Voyix Corp
National Cash Register Co
Original Assignee
NCR Corp
National Cash Register Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NCR Corp, National Cash Register Co filed Critical NCR Corp
Publication of ES393737A1 publication Critical patent/ES393737A1/es
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/23Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using electrostatic storage on a common layer, e.g. Forrester-Haeff tubes or William tubes
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/04Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam
    • G11C13/048Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam using other optical storage elements
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0466Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C7/00Arrangements for writing information into, or reading information out from, a digital store
    • G11C7/005Arrangements for writing information into, or reading information out from, a digital store with combined beam-and individual cell access
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/10Screens on or from which an image or pattern is formed, picked up, converted or stored
    • H01J29/36Photoelectric screens; Charge-storage screens
    • H01J29/39Charge-storage screens
    • H01J29/44Charge-storage screens exhibiting internal electric effects caused by particle radiation, e.g. bombardment-induced conductivity
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J31/00Cathode ray tubes; Electron beam tubes
    • H01J31/08Cathode ray tubes; Electron beam tubes having a screen on or from which an image or pattern is formed, picked up, converted, or stored
    • H01J31/58Tubes for storage of image or information pattern or for conversion of definition of television or like images, i.e. having electrical input and electrical output
    • H01J31/60Tubes for storage of image or information pattern or for conversion of definition of television or like images, i.e. having electrical input and electrical output having means for deflecting, either selectively or sequentially, an electron ray on to separate surface elements of the screen
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B99/00Subject matter not provided for in other groups of this subclass
    • H10B99/22Subject matter not provided for in other groups of this subclass including field-effect components

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
ES393737A 1970-08-03 1971-07-29 Dispositivo semiconductor de memoria. Expired ES393737A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US6057270A 1970-08-03 1970-08-03

Publications (1)

Publication Number Publication Date
ES393737A1 true ES393737A1 (es) 1973-08-16

Family

ID=22030356

Family Applications (1)

Application Number Title Priority Date Filing Date
ES393737A Expired ES393737A1 (es) 1970-08-03 1971-07-29 Dispositivo semiconductor de memoria.

Country Status (15)

Country Link
US (1) US3721962A (US06373033-20020416-M00071.png)
JP (1) JPS5131067B1 (US06373033-20020416-M00071.png)
AT (1) AT316898B (US06373033-20020416-M00071.png)
AU (1) AU441498B2 (US06373033-20020416-M00071.png)
BE (1) BE770816A (US06373033-20020416-M00071.png)
BR (1) BR7104911D0 (US06373033-20020416-M00071.png)
CA (1) CA950116A (US06373033-20020416-M00071.png)
CH (1) CH539914A (US06373033-20020416-M00071.png)
DK (1) DK136388B (US06373033-20020416-M00071.png)
ES (1) ES393737A1 (US06373033-20020416-M00071.png)
FR (1) FR2101189B1 (US06373033-20020416-M00071.png)
GB (1) GB1323631A (US06373033-20020416-M00071.png)
NL (1) NL7110702A (US06373033-20020416-M00071.png)
SE (1) SE371319B (US06373033-20020416-M00071.png)
ZA (1) ZA714756B (US06373033-20020416-M00071.png)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2168937B1 (US06373033-20020416-M00071.png) * 1972-01-27 1976-07-23 Bailey Controle Sa
US3975598A (en) * 1973-05-17 1976-08-17 Westinghouse Electric Corporation Random-access spoken word electron beam digitally addressable memory
US4122530A (en) * 1976-05-25 1978-10-24 Control Data Corporation Data management method and system for random access electron beam memory
US4190849A (en) * 1977-09-19 1980-02-26 Motorola, Inc. Electronic-beam programmable semiconductor device structure
DE3032306A1 (de) * 1980-08-27 1982-04-08 Siemens AG, 1000 Berlin und 8000 München Monolithisch integrierte schaltung mit zu- und/oder abschaltbaren schaltungsteilen
DE3032295A1 (de) * 1980-08-27 1982-04-01 Siemens AG, 1000 Berlin und 8000 München Monolithisch integrierter festwertspeicher
US4450537A (en) * 1981-08-19 1984-05-22 Siemens Aktiengesellschaft Monolithically integrated read-only memory
JPS58147295U (ja) * 1982-03-30 1983-10-03 富士通電装株式会社 プリント板実装用放熱器
US4491762A (en) * 1982-06-30 1985-01-01 International Business Machines Corporation Flat storage CRT and projection display
US4764818A (en) * 1986-02-03 1988-08-16 Electron Beam Memories Electron beam memory system with improved high rate digital beam pulsing system
US5391909A (en) * 1992-10-13 1995-02-21 Hughes Aircraft Company Detection of electron-beam scanning of a substrate
US10381101B2 (en) * 2017-12-20 2019-08-13 Micron Technology, Inc. Non-contact measurement of memory cell threshold voltage
CN113129942A (zh) * 2020-01-14 2021-07-16 长鑫存储技术有限公司 集成电路结构和存储器
FR3119580B1 (fr) 2021-02-08 2022-12-23 Psa Automobiles Sa Vehicule electrique equipe d’un boitier electronique

Also Published As

Publication number Publication date
BR7104911D0 (pt) 1973-05-10
NL7110702A (US06373033-20020416-M00071.png) 1972-02-07
FR2101189B1 (US06373033-20020416-M00071.png) 1976-05-28
JPS5131067B1 (US06373033-20020416-M00071.png) 1976-09-04
SE371319B (US06373033-20020416-M00071.png) 1974-11-11
GB1323631A (en) 1973-07-18
AT316898B (de) 1974-07-25
AU3151971A (en) 1973-01-25
AU441498B2 (en) 1973-11-01
DK136388B (da) 1977-10-03
CA950116A (en) 1974-06-25
ZA714756B (en) 1972-04-26
FR2101189A1 (US06373033-20020416-M00071.png) 1972-03-31
CH539914A (de) 1973-07-31
BE770816A (fr) 1971-12-16
DK136388C (US06373033-20020416-M00071.png) 1978-03-06
US3721962A (en) 1973-03-20

Similar Documents

Publication Publication Date Title
ES393737A1 (es) Dispositivo semiconductor de memoria.
US4417264A (en) Electrically alterable, nonvolatile floating gate memory device
KR830002397A (ko) 전류교체가 가능한 비소멸성 반도체 기억장치
KR880002181A (ko) 반도체 기억장치
KR880009380A (ko) 불휘발성 반도체메모리
JPS5678170A (en) Semiconductor memory
ES396463A1 (es) Elemento binario de memoria.
KR980006291A (ko) 강유전체 메모리
JPH0746515B2 (ja) デコ−ダ回路
US4479203A (en) Electrically erasable programmable read only memory cell
ES309288A3 (es) Un dispositivo electrico de estado solido.
US3911464A (en) Nonvolatile semiconductor memory
JPS63500908A (ja) 不揮発性メモリ−・セル
KR930000816B1 (ko) 불휘발성 반도체메모리
ES319914A1 (es) Un dispositivo transitor de efecto de campo de barrera aislada.
GB1288966A (US06373033-20020416-M00071.png)
ES315030A1 (es) Un dispositivo semiconductor de efecto de campo de portal aislado.
KR880013174A (ko) 불휘발성반도체기억장치
KR940022843A (ko) 고속동작 및 저전원공급전원에 적합한 쎌구조를 가지는 불휘발성 반도체 집적회로
KR970063753A (ko) 불 휘발성 메모리 셀과 그 프로그래밍 방법
US3653002A (en) Nonvolatile memory cell
US3631308A (en) Mos semiconductor device operable with a positive or negative voltage on the gate electrode and method therefor
GB2058451A (en) Semiconductor memory device
JP2769018B2 (ja) 半導体記憶装置
KR910001986A (ko) 전위고정용 전극을 구비한 불휘발성 반도체기억장치