ES349643A1 - Procedimiento de formacion de mascaras para su empleo en lafabricacion de semiconductores. - Google Patents
Procedimiento de formacion de mascaras para su empleo en lafabricacion de semiconductores.Info
- Publication number
- ES349643A1 ES349643A1 ES349643A ES349643A ES349643A1 ES 349643 A1 ES349643 A1 ES 349643A1 ES 349643 A ES349643 A ES 349643A ES 349643 A ES349643 A ES 349643A ES 349643 A1 ES349643 A1 ES 349643A1
- Authority
- ES
- Spain
- Prior art keywords
- mask
- interim
- photo
- patterns
- masks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US63778167A | 1967-05-11 | 1967-05-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES349643A1 true ES349643A1 (es) | 1969-04-01 |
Family
ID=24557342
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES349643A Expired ES349643A1 (es) | 1967-05-11 | 1968-01-23 | Procedimiento de formacion de mascaras para su empleo en lafabricacion de semiconductores. |
Country Status (5)
| Country | Link |
|---|---|
| DE (1) | DE1622949A1 (xx) |
| ES (1) | ES349643A1 (xx) |
| FR (1) | FR1586821A (xx) |
| GB (1) | GB1200811A (xx) |
| NL (1) | NL6802396A (xx) |
-
1968
- 1968-01-02 GB GB33968A patent/GB1200811A/en not_active Expired
- 1968-01-23 ES ES349643A patent/ES349643A1/es not_active Expired
- 1968-01-29 FR FR1586821D patent/FR1586821A/fr not_active Expired
- 1968-02-20 NL NL6802396A patent/NL6802396A/xx unknown
- 1968-03-19 DE DE19681622949 patent/DE1622949A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| NL6802396A (xx) | 1968-11-12 |
| GB1200811A (en) | 1970-08-05 |
| FR1586821A (xx) | 1970-03-06 |
| DE1622949A1 (de) | 1971-01-14 |
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| ES349643A1 (es) | Procedimiento de formacion de mascaras para su empleo en lafabricacion de semiconductores. | |
| GB1143611A (xx) | ||
| US3673018A (en) | Method of fabrication of photomasks | |
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| KR940010508B1 (ko) | 미세패턴 형성방법 | |
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| JPS55135837A (en) | Manufacture of photomask | |
| JPS5655950A (en) | Photographic etching method | |
| JPS58204532A (ja) | パタ−ン形成方法 | |
| JPS5680130A (en) | Manufacture of semiconductor device | |
| JPS5610930A (en) | Manufacture of semiconductor device | |
| JPS5317075A (en) | Production of silicon mask for x-ray exposure | |
| JPS5656630A (en) | Manufacture of semiconductor element | |
| GB1334377A (en) | Method of photographic transfer | |
| JPH0283545A (ja) | 波長選択型フォトマスク |